DIN 50451-2-2003 en 4694 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2 Calcium (Ca) cobalt (Co) chromium (Cr) copper (Cu) .pdf
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1、ICS 29.045 Supersedes October 1990 edition.Prfung von Materialien fr die Halbleitertechnologie Bestimmung von Elementspuren in Flssigkeiten Teil 2:Calcium (Ca), Cobalt (Co), Chrom (Cr), Kupfer (Cu), Eisen (Fe),Nickel (Ni) und Zink (Zn) in Flusssure mittelsPlasma-angeregter EmissionsspektrometrieIn k
2、eeping with current practice in standards published by the International Organization for Standardization(ISO), a comma has been used throughout as the decimal marker.Ref. No. DIN 50451-2 : 2003-04English price group 06 Sales No. 010601.05DEUTSCHE NORM April 2003 No part of this translation may be r
3、eproduced without the prior permission ofDIN Deutsches Institut fr Normung e.V., Berlin. Beuth Verlag GmbH, 10772 Berlin, Germany,has the exclusive right of sale for German Standards (DIN-Normen).Translation by DIN-Sprachendienst.In case of doubt, the German-language original should be consulted as
4、the authoritative text.Determination of trace elements in liquids for usein semiconductor technologyPart 2: Determination of calcium, chromium, cobalt, copper, iron, nickeland zinc in hydrofluoric acid by plasma emission spectrometryDocument comprises 4 pages.50451-2ForewordThis standard has been pr
5、epared by Technical Committee Prfung von Prozesschemikalien fr die Halb-leitertechnologie of the Normenausschuss Materialprfung (Materials Testing Standards Committee).AmendmentsThis standard differs from the October 1990 edition in that it has been revised in form and content.Previous editionDIN 50
6、451-2: 1990-10.1 ScopeThis standard specifies a method of determining traces in hydrofluoric acid of calcium, chromium, cobalt,copper, iron, nickel and zinc, in concentrations ranging from 1 ng/g to 1 000 ng/g, by means of plasmaemission spectrometry (inductively coupled (ICP) or direct current (DCP
7、). This method may also be used toanalyze other vaporizable liquids which have a percentage recovery between 75% and 125%.The presence of these metals is of relevance in the field of semiconductor technology.2 Normative referencesThis standard incorporates, by dated or undated reference, provisions
8、from other publications. Thesenormative references are cited at the appropriate places in the text, and the titles of the publications arelisted below. For dated references, subsequent amendments to or revisions of any of these publicationsapply to this standard only when incorporated in it by amend
9、ment or revision. For undated references, thelatest edition of the publication referred to applies.DIN 8120-1 Terminology associated with weighing machines Classification Scales and balancesDIN 32645 Establishing the decision limit, detection limit and determination limit under repeatabilityconditio
10、ns in chemical analysis Terminology, methods and evaluationDIN 38406-29 German standard methods for the examination of water, waste water and sludge Cations(group E) Determination of 61 elements by inductively coupled plasma mass spectrometry(E 29)Page 2DIN 50451-2 : 2003-04DIN 51008-2 Optical emiss
11、ion spectrometry (OES) Flame and plasma systemsDIN 51401-1 Atomic absorption spectrometry (AAS) TerminologySupplement 1to DIN 51401-1 Atomic absorption spectrometry (AAS) Terminology Explanatory notesDIN EN ISO 1042 Laboratory glassware One-mark volumetric flasks (ISO 1042 : 1998)DIN EN ISO 8655-2 P
12、iston-operated volumetric apparatus Part 2: Piston pipettes(ISO 8655-2 : 2002)DIN EN ISO 14644-1 Cleanrooms and associated controlled environments Part 1: Classification of air clean-liness (ISO 14644-1 : 1999)ISO 3696 : 1987 Water for analytical laboratory use Specification and test methodsASTM D 5
13、127-99 Standard guide for ultra pure water used in the electronics and semiconductor industry1 Boumans, P.W.J.M., Line coincidence tables for inductively coupled plasma atomic emission spectrometry,vol 1. 1980: Pergamon Press.3 Concept3.1 High-purity waterFor the purposes of this standard, high-puri
14、ty water is water which has been produced by demineralizationfollowed by filtration or double distillation and which contains no more than 0,05 ng/g of the elements to bedetermined, i.e. Ca, Co, Cr, Cu, Fe, Ni and Zn.NOTE: High-purity water as defined in ISO 3696 and ASTM D 5127-99, for example, doe
15、s not meet the require-ments of this standard.4 UnitThe concentration of trace elements is to be expressed in ng/g.5 PrincipleAfter evaporating the liquid under examination to dryness under dust-free conditions, the residue is taken upin a mixture of nitric acid, sulfuric acid and high-purity water
16、and analyzed by means of plasma emissionspectrometry. The ratio of the test portion mass to the relevant test solution mass after evaporation gives theenrichment factor.6 Reagents6.1 GeneralReagents shall not contain more than 0,5 ng/g of the elements to be determined. If the purity of commerciallya
17、vailable reagents is inadequate, they shall be purified (e.g. by subboiling distillation).6.2 65% to 70% (m/m) nitric acid, HNO3.6.3 96% (m/m) sulfuric acid, H2SO4.6.4 High-purity water, as in subclause 3.1.7 Apparatus and cleaning7.1 Apparatus7.1.1 Plasma emission spectrometer, (e.g. ICP or DCP spe
18、ctrometer), with automatic sampler (cf.DIN 51008-2).7.1.2 Vessels for evaporation and blank solution preparation, (e.g. beakers or dishes), cleaned, having avolume suitable for the test portion, and of a material as specified in DIN 38406-29, for example.7.1.3 Vessels for sample changer, of a contam
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