ASTM F1192-2000(2006) Standard Guide for the Measurement of Single Event Phenomena (SEP) Induced by Heavy Ion Irradiation of Semiconductor Devices《半导体器件重离子照射感应产生的单件信号现象的测量标准指南》.pdf
《ASTM F1192-2000(2006) Standard Guide for the Measurement of Single Event Phenomena (SEP) Induced by Heavy Ion Irradiation of Semiconductor Devices《半导体器件重离子照射感应产生的单件信号现象的测量标准指南》.pdf》由会员分享,可在线阅读,更多相关《ASTM F1192-2000(2006) Standard Guide for the Measurement of Single Event Phenomena (SEP) Induced by Heavy Ion Irradiation of Semiconductor Devices《半导体器件重离子照射感应产生的单件信号现象的测量标准指南》.pdf(11页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: F 1192 00 (Reapproved 2006)Standard Guide for theMeasurement of Single Event Phenomena (SEP) Induced byHeavy Ion Irradiation of Semiconductor Devices1This standard is issued under the fixed designation F 1192; the number immediately following the designation indicates the year oforigina
2、l adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon (e) indicates an editorial change since the last revision or reapproval.This standard has been approved for use by agencies of the Department of Defe
3、nse.1. Scope1.1 This guide defines the requirements and procedures fortesting integrated circuits and other devices for the effects ofsingle event phenomena (SEP) induced by irradiation withheavy ions having an atomic number Z $ 2. This descriptionspecifically excludes the effects of neutrons, proto
4、ns, and otherlighter particles that may induce SEP via another mechanism.SEP includes any manifestation of upset induced by a singleion strike, including soft errors (one or more simultaneousreversible bit flips), hard errors (irreversible bit flips), latchup(permanent high conducting state), transi
5、ents induced in com-binatorial devices which may introduce a soft error in nearbycircuits, power field effect transistor (FET) burn-out and gaterupture. This test may be considered to be destructive becauseit often involves the removal of device lids prior to irradiation.Bit flips are usually associ
6、ated with digital devices and latchupis usually confined to bulk complementary metal oxide semi-conductor, (CMOS) devices, but heavy ion induced SEP is alsoobserved in combinatorial logic programmable read onlymemory, (PROMs), and certain linear devices that may re-spond to a heavy ion induced charg
7、e transient. Power transitorsmay be tested by the procedure called out in Method 1080 ofMIL STD 750.1.2 The procedures described here can be used to simulateand predict SEP arising from the natural space environment,including galactic cosmic rays, planetary trapped ions and solarflares. The techniqu
8、es do not, however, simulate heavy ionbeam effects proposed for military programs. The end productof the test is a plot of the SEP cross section (the number ofupsets per unit fluence) as a function of ion LET (linear energytransfer, or ionization deposited along the ions path throughthe semiconducto
9、r). This data can be combined with thesystems heavy ion environment to estimate a system upsetrate.1.3 Although protons can cause SEP, they are not includedin this guide. A separate guide addressing proton induced SEPis being considered.1.4 The values stated in International System of Units (SI)are
10、to be regarded as standard. No other units of measurementare included in this guide.1.5 This standard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and
11、 determine the applica-bility of regulatory limitations prior to use.2. Referenced Documents2.1 Military Standard:2750 Method 10803. Terminology3.1 Definitions of Terms Specific to This Standard:3.1.1 DUTdevice under test.3.1.2 fluencethe flux integrated over time, expressed asions/cm2.3.1.3 fluxthe
12、 number of ions/s passing through a one cm2area perpendicular to the beam (ions/cm2-s).3.1.4 LETthe linear energy transfer, also known as thestopping power dE/dx, is the amount of energy deposited perunit length along the path of the incident ion, typicallyexpressed as MeV-cm2/mg.3.1.4.1 DiscussionL
13、ET values are obtained by dividingthe energy per unit track length by the density of the irradiatedmedium. Since the energy lost along the track generateselectron-hole pairs, one can also express LET as chargedeposited per unit path length (for example, picocoulombs/micron) if it is known how much e
14、nergy is required to generatean electron-hole pair in the irradiated material. (For silicon,3.62 eV is required per electron-hole pair.)A correction, important for lower energy ions in particular, is madeto allow for the loss of ion energy after it has penetrated overlayers1This guide is under the j
15、urisdiction of ASTM Committee F01 on Electronicsand is the direct responsibility of Subcommittee F01.11 on Nuclear however, in general, DUTs may be safely packed and trans-ported without delay after test.6.7 Ion Interaction Effects:6.7.1 The calculation of an effective LET (see discussion in3.1.4) h
16、inges on the thin slab approximation of the sensitivevolume, which is less likely to hold for high density, smallgeometry devices. This problem can be examined by investi-gating the device SEP response to two different ions having thesame effective LET.6.7.2 The proportion of length to width of the
17、sensitivevolume is also assumed equal to one. Rotating the device alongboth axes of symmetry during the test may provide a moremeaningful characterization.6.7.3 As geometries continue to scale down, the possibilityof multiple bit upsets increases. Hence, the nature of the ionsradial energy depositio
18、n becomes more important and itbecomes more likely that two different ions of equivalent LETdo not in fact have an equal SEP effect. In addition, the effectsof irradiating at an angle become much more complex when anion track overlaps two cells. The frequency of such overlap-ping upsets likewise dep
19、ends on the tracks radial energydeposition.6.7.4 Another assumption is that the ions energy depositionis in equilibrium at the device sensitive volume after the ionstrikes the device. This may not always be the case with a topsurface irradiation. One can investigate this possibility byirradiating th
20、e back of the device with highly energetic ions ofadequate range. In the latter case, it is known that the ionsenergy deposition will be in equilibrium when the ion reachesthe sensitive volumes located near the surface.6.7.5 Use of ions having adequate range is also important.Lower energy heavy ions
21、 lose LET as they slow down byattaching electrons and also show a contraction in the width ofthe radial energy deposition.7. Apparatus and Radiation Sources7.1 Particle Radiation SourcesThe choice of radiationsources is important. Hence source selection guidelines aregiven here. A test covering the
22、full range of LET values (bothhigh and low Z ions) will require an accelerator. Cost,availability, lead times, and ion/energy capabilities are allimportant considerations in selecting a facility for a given test.Three source types are commonly used for conducting SEPexperiments, each of which has sp
23、ecific advantages and disad-vantages. The selection of a proper source that meets the testobjectives in a cost-effective manner depends on test objectivesand device appraisal (see 8.1.).7.1.1 The three source types used for heavy ion SEPmeasurement are as follows:7.1.1.1 CyclotronsCyclotrons provide
24、 the greatest flex-ibility of test options because they can supply a number ofdifferent ions (including alpha particles) at a finite number ofdifferent energies. The maximum available ion energy of theheavy ion machines is usually greater than the energy (;2MeV/nucleon) corresponding to the maximum
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