IEEE 62659-2015 en Nanomanufacturing C Large scale manufacturing for nanoelectronics.pdf

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1、IEC/IEEE 62659 Edition 1.0 2015-09 INTERNATIONAL STANDARD Nanomanufacturing Large scale manufacturing for nanoelectronics IEC/IEEE62659:2015-09(en) THIS PUBLICATION IS COPYRIGHT PROTECTED Copyright 2015 IEC, Geneva, Switzerland Copyright 2015 IEEE All rights reserved. Unless otherwise specified, no

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12、rge scale manufacturing for nanoelectronics INTERNATIONAL ELECTROTECHNICAL COMMISSION ICS 07.030; 25.020 ISBN 978-2-8322-2915-6 Warning! Make sure that you obtained this publication from an authorized distributor. Registered trademark of the International Electrotechnical Commission 2 IEC/IEEE 62659

13、:2015 IEC/IEEE 2015 CONTENTS FOREWORD . 3 INTRODUCTION . 5 1 Scope 6 2 Normative references 6 3 Terms and definitions 6 4 Abbreviations 8 5 Nanomaterials incorporation into electronics fabrication 9 5.1 General . 9 5.2 Raw materials acquisition . 10 5.3 Materials processing . 11 5.4 Design 11 5.5 Fa

14、brication 11 5.6 Test 11 5.7 End-use 11 6 Safety and environmental issues . 11 Bibliography 12 Figure 1 Relationship between bottom-up, top-down and hybrid device fabrication processes for nanoelectronics over length scales . 9 Table 1 Bottom-up process for nanoelectronics 9 Table 2 Top-down process

15、 for nanoelectronics 9 Table 3 Comparison of CMOS processes with exemplary CNT electronics process 10 IEC/IEEE 62659:2015 3 IEC/IEEE 2015 INTERNATIONAL ELECTROTECHNICAL COMMISSION _ NANOMANUFACTURING LARGE SCALE MANUFACTURING FOR NANOELECTRONICS FOREWORD 1) The International Electrotechnical Commiss

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37、at a later date. 1A list of IEEE participants can be found at the following URL: http:/standards.ieee.org/downloads/62659/62659-2015/62659-2015_wg-participants.pdf IEC/IEEE 62659:2015 5 IEC/IEEE 2015 INTRODUCTION In order to fully benefit from the cost, performance, and flexibility of new electronic

38、s products manufactured on a large-scale, industries accustomed to the purchase, use, and engineering of continuum materials need to grow to embrace appropriate new practices at the nanoscale. The purpose of this International Standard is to enable the quick, low-risk adoption of nanomaterials into

39、large-scale electronics manufacturing. In addition a best set of common practices for use by semiconductor fabricators will be delineated. The description of nanomaterials to be incorporated into the electronics process can be described in terms of: composition (material), density, purity, size/dime

40、nsions, properties such as electrical characteristics (conductive, non-conductive, and semiconductive), associated media (delivery medium), fabrication, surface functionalization, particle size distribution, surface area, shape, and degree of aggregation and agglomeration, etc. These standards for t

41、he characterization of nanomaterials also provide an opportunity to help ensure consistency in metrics and measurement methods when specifying or producing nanomaterials for electronics applications. This is important when multiple vendors or technology partners are involved. 6 IEC/IEEE 62659:2015 I

42、EC/IEEE 2015 NANOMANUFACTURING LARGE SCALE MANUFACTURING FOR NANOELECTRONICS 1 Scope This International Standard provides a framework for introducing nanoelectronics into large scale, high volume production in semiconductor manufacturing facilities through the incorporation of nanomaterials (e.g. ca

43、rbon nanotubes, graphene, quantum dots, etc.). Since semiconductor manufacturing facilities need to incorporate practices that maintain high yields, there are very strict requirements for how manufacturing is performed. Nanomaterials represent a potential contaminant in semiconductor manufacturing f

44、acilities and need to be introduced in a structured and methodical way. This International Standard provides steps employed to facilitate the introduction of nanomaterials into the semiconductor manufacturing facilities. This sequence is described below under the areas of raw materials acquisition,

45、materials processing, design, IC fabrication, testing, and end-use. These activities represent the major stages of the supply chain in semiconductor manufacturing facilities. 2 Normative references The following documents, in whole or in part, are normatively referenced in this document and are indi

46、spensable for its application. For dated references, only the edition cited applies. For undated references, the latest edition of the referenced document (including any amendments) applies. None. 3 Terms and definitions For the purposes of this document, the following terms and definitions apply. 3

47、.1 nanoscale size range from approximately 1 nm to 100 nm Note 1 to entry: Properties that are not extrapolations from a larger size will typically, but not exclusively, be exhibited in this size range. For such properties the size limits are considered approximate. Note 2 to entry: The lower limit

48、in this definition (approximately 1 nm) is introduced to avoid single and small groups of atoms from being designated as nano-objects or elements of nanostructures, which might be implied by the absence of a lower limit. SOURCE: ISO/TS 80004-1:2010, 2.1 3.2 nanotechnology application of scientific k

49、nowledge to manipulate and control matter in the nanoscale (3.1) in order to make use of size- and structure-dependent properties and phenomena, as distinct from those associated with individual atoms or molecules or with bulk materials Note 1 to entry: Manipulation and control includes material synthesis. SOURCE: ISO/TS 80004-1:2010, 2.3 IEC/IEEE 62659:2015 7 IEC/IEEE 2015 3.3 nanoelectronics electronic devices that incorporate nanoscale (3.1) materials, processes and properties