Chapter 2 Field-Effect Transistors(FETs).ppt
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1、SJTU Zhou Lingling,1,Chapter 2 Field-Effect Transistors(FETs),SJTU Zhou Lingling,2,Outline,Introduction Device Structure and Physical Operation Current-Voltage Characteristics MOSFET Circuit at DC The MOSFET as an amplifier Biasing in MOS Amplifier Circuits Small-signal Operation and Models Single-S
2、tage MOS amplifier The MOSFET Internal Capacitance and High-Frequency Model The depletion-type MOSFET,SJTU Zhou Lingling,3,Introduction,Characteristics Far more useful than two-terminal device Voltage between two terminals can control the current flows in third terminal Quite small Low power Simple
3、manufacturing process,SJTU Zhou Lingling,4,Introduction,Classification of MOSFET MOSFET P channel Enhancement type Depletion type N channel Enhancement type Depletion type JFET P channel N channel Widely used in IC circuits,SJTU Zhou Lingling,5,Device Structure and Physical Operation,Device structur
4、e of the enhancement NMOS Physical operation p channel device,SJTU Zhou Lingling,6,Device Structure of the Enhancement-Type NMOS,Perspective view Four terminals Channel length and width,SJTU Zhou Lingling,7,Device Structure of the Enhancement-Type NMOS,Cross-section view.L = 0.1 to 3 mm W = 0.2 to 1
5、00 mm Tox= 2 to 50 nm,SJTU Zhou Lingling,8,Physical Operation,Creating an n channel Drain current controlled by vDS Drain current controlled by vGS,SJTU Zhou Lingling,9,Creating a Channel for Current Flow,The enhancement-type NMOS transistor with a positive voltage applied to the gate.An n channel i
6、s induced at the top of the substrate beneath the gate. Inversion layer Threshold voltage,SJTU Zhou Lingling,10,Drain Current Controlled by Small Voltage vDS,An NMOS transistor with vGS Vt and with a small vDS applied. The channel depth is uniform. The device acts as a resistance. The channel conduc
7、tance is proportional to effective voltage. Drain current is proportional to (vGS Vt) vDS.,SJTU Zhou Lingling,11,vDS Increased,Operation of the enhancement NMOS transistor as vDS is increased. The induced channel acquires a tapered shape. Channel resistance increases as vDS is increased. Drain curre
8、nt is controlled by both of the two voltages.,SJTU Zhou Lingling,12,Channel Pinched Off,Channel is pinched off Inversion layer disappeared at the drain point Drain current isnt disappeared Drain current is saturated and only controlled by the vGS Triode region and saturation region Channel length mo
9、dulation,SJTU Zhou Lingling,13,Drain Current Controlled by vGS,vGS creates the channel. Increasing vGS will increase the conductance of the channel. At saturation region only the vGS controls the drain current. At subthreshold region, drain current has the exponential relationship with vGS,SJTU Zhou
10、 Lingling,14,p Channel Device,Two reasons for readers to be familiar with p channel device Existence in discrete-circuit. More important is the utilization of CMOS circuits. Structure of p channel device The substrate is n type and the inversion layer is p type. Carrier is hole. Threshold voltage is
11、 negative. All the voltages and currents are opposite to the ones of n channel device. Physical operation is similar to that of n channel device.,SJTU Zhou Lingling,15,Complementary MOS or CMOS,The PMOS transistor is formed in n well. Another arrangement is also possible in which an n-type body is u
12、sed and the n device is formed in a p well. CMOS is the most widely used of all the analog and digital IC circuits.,SJTU Zhou Lingling,16,Current-Voltage Characteristics,Circuit symbol Output characteristic curves Channel length modulation Characteristics of p channel device Body effect Temperature
13、effects and Breakdown Region,SJTU Zhou Lingling,17,Circuit Symbol,Circuit symbol for the n-channel enhancement-type MOSFET. Modified circuit symbol with an arrowhead on the source terminal to distinguish it from the drain and to indicate device polarity (i.e., n channel). (c) Simplified circuit symb
14、ol to be used when the source is connected to the body or when the effect of the body on device operation is unimportant.,SJTU Zhou Lingling,18,Output Characteristic Curves,An n-channel enhancement-type MOSFET with vGS and vDS applied and with the normal directions of current flow indicated. The iDv
15、DS characteristics for a device with kn (W/L) = 1.0 mA/V2.,SJTU Zhou Lingling,19,Output Characteristic Curves,Three distinct region Cutoff region Triode region Saturation region Characteristic equations Circuit model,SJTU Zhou Lingling,20,Cutoff Region,Biased voltageThe transistor is turned off.Oper
16、ating in cutoff region as a switch.,SJTU Zhou Lingling,21,Triode Region,Biased voltageThe channel depth from uniform to tapered shape. Drain current is controlled not only by vDS but also by vGS,SJTU Zhou Lingling,22,Triode Region,Assuming that the drain-t-source voltage is sufficiently small.The MO
17、S operates as a linear resistance,SJTU Zhou Lingling,23,Saturation Region,Biased voltageThe channel is pinched off. Drain current is controlled only by vGSDrain current is independent of vDS and behaves as an ideal current source.,SJTU Zhou Lingling,24,Saturation Region,The iDvGS characteristic for
18、an enhancement-type NMOS transistor in saturation Vt = 1 V, kn W/L = 1.0 mA/V2 Square law of iDvGS characteristic curve.,SJTU Zhou Lingling,25,Relative Levels of the Terminal Voltages,The relative levels of the terminal voltages of the enhancement NMOS transistor for operation in the triode region a
19、nd in the saturation region.,SJTU Zhou Lingling,26,Channel Length Modulation,Explanation for channel length modulation Pinched point moves to source terminal with the voltage vDS increased. Effective channel length reduced Channel resistance decreased Drain current increases with the voltage vDS inc
20、reased. Current drain is modified by the channel length modulation,SJTU Zhou Lingling,27,Channel Length Modulation,The MOSFET parameter VA depends on the process technology and, for a given process, is proportional to the channel length L.,SJTU Zhou Lingling,28,Channel Length Modulation,MOS transist
21、ors dont behave an ideal current source due to channel length modulation. The output resistance is finite.The output resistance is inversely proportional to the drain current.,SJTU Zhou Lingling,29,Large-Signal Equivalent Circuit Model,Large-signal equivalent circuit model of the n-channel MOSFET in
22、 saturation, incorporating the output resistance ro. The output resistance models the linear dependence of iD on vDS,SJTU Zhou Lingling,30,Characteristics of p Channel Device,Circuit symbol for the p-channel enhancement-type MOSFET. Modified symbol with an arrowhead on the source lead. Simplified ci
23、rcuit symbol for the case where the source is connected to the body.,SJTU Zhou Lingling,31,Characteristics of p Channel Device,The MOSFET with voltages applied and the directions of current flow indicated. The relative levels of the terminal voltages of the enhancement-type PMOS transistor for opera
24、tion in the triode region and in the saturation region.,SJTU Zhou Lingling,32,Characteristics of p Channel Device,Large-signal equivalent circuit model of the p-channel MOSFET in saturation, incorporating the output resistance ro. The output resistance models the linear dependence of iD on vDS,SJTU
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