ASTM E995-2011 5000 Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy《在俄歇电子能谱和X射线光电子能谱中应用背景消除技术的标准指南》.pdf
《ASTM E995-2011 5000 Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy《在俄歇电子能谱和X射线光电子能谱中应用背景消除技术的标准指南》.pdf》由会员分享,可在线阅读,更多相关《ASTM E995-2011 5000 Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy《在俄歇电子能谱和X射线光电子能谱中应用背景消除技术的标准指南》.pdf(5页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: E995 11Standard Guide forBackground Subtraction Techniques in Auger ElectronSpectroscopy and X-Ray Photoelectron Spectroscopy1This standard is issued under the fixed designation E995; the number immediately following the designation indicates the year oforiginal adoption or, in the case
2、 of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 The purpose of this guide is to familiarize the analystwith the principal background subtrac
3、tion techniques presentlyin use together with the nature of their application to dataacquisition and manipulation.1.2 This guide is intended to apply to background subtrac-tion in electron, X-ray, and ion-excited Auger electron spec-troscopy (AES), and X-ray photoelectron spectroscopy (XPS).1.3 The
4、values stated in SI units are to be regarded asstandard. No other units of measurement are included in thisstandard.1.4 This standard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this standard to establish appro-priate
5、 safety and health practices and determine the applica-bility of regulatory limitations prior to use.2. Referenced Documents2.1 ASTM Standards:2E673 Terminology Relating to Surface Analysis3. Terminology3.1 DefinitionsFor definitions of terms used in this guide,refer to Terminology E673.4. Summary o
6、f Guide4.1 Relevance to AES and XPS:4.1.1 AESThe production ofAuger electrons by bombard-ment of surfaces with electron beams is also accompanied byemission of secondary and backscattered electrons. Thesesecondary and backscattered electrons create a backgroundsignal. This background signal covers t
7、he complete energyspectrum and has a maximum (near 10 eV for true secondar-ies), and a second maximum for elastically backscatteredelectrons at the energy of the incident electron beam. Anadditional source of background is associated with Augerelectrons, which are inelastically scattered while trave
8、lingthrough the specimen. Auger electron excitation may alsooccur by X-ray and ion bombardment of surfaces.4.1.2 XPSThe production of electrons from X-ray excita-tion of surfaces may be grouped into two categoriesphotoemission of electrons and the production of Augerelectrons from the decay of the r
9、esultant core hole states. Thesource of the background signal observed in the XPS spectrumincludes a contribution from inelastic scattering processes, andfor non-monochromatic X-ray sources, electrons produced byBremsstrahlung radiation.4.2 Various background subtraction techniques have beenemployed
10、 to diminish or remove the influence of these back-ground electrons from the shape and intensity of Augerelectron and photoelectron features. Relevance to a particularanalytical technique (AES or XPS) will be indicated in the titleof the procedure.4.3 Implementation of any of the various background
11、sub-traction techniques that are described in this guide may dependon available instrumentation and software as well as themethod of acquisition of the original signal. These subtractionmethods fall into two general categories: (1) real-time back-ground subtraction; and (2) post-acquisition backgrou
12、nd sub-traction.5. Significance and Use5.1 Background subtraction techniques in AES were origi-nally employed as a method of enhancement of the relativelyweak Auger signals to distinguish them from the slowlyvarying background of secondary and backscattered electrons.Interest in obtaining useful inf
13、ormation from the Auger peakline shape, concern for greater quantitative accuracy fromAuger spectra, and improvements in data gathering techniques,have led to the development of various background subtractiontechniques.5.2 Similarly, the use of background subtraction techniquesin XPS has evolved mai
14、nly from the interest in the determina-tion of chemical states (from the binding-energy values forcomponent peaks that may often overlap), greater quantitative1This guide is under the jurisdiction of ASTM Committee E42 on SurfaceAnalysis and is the direct responsibility of Subcommittee E42.03 on Aug
15、er ElectronSpectroscopy and X-Ray Photoelectron Spectroscopy.Current edition approved Oct. 15, 2011. Published October 2011. Originallyapproved in 1984. Last previous edition approved in 2004 as E995 04. DOI:10.1520/E0995-11.2For referenced ASTM standards, visit the ASTM website, www.astm.org, orcon
16、tact ASTM Customer Service at serviceastm.org. For Annual Book of ASTMStandards volume information, refer to the standards Document Summary page onthe ASTM website.1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.accuracy from the XPS
17、 spectra, and improvements in dataacquisition. Post-acquisition background subtraction is nor-mally applied to XPS data.5.3 The procedures outlined in Section 7 are popular in XPSand AES; less popular procedures and rarely used proceduresare described in Sections 8 and 9, respectively. General revie
18、wsof background subtraction methods and curve-fitting tech-niques have been published (1-5).35.4 Background subtraction is usually done before peakfitting. Some commercial systems require background removal.Nevertheless, a measured spectral region consisting of one ormore peaks and background intens
19、ities due to inelastic scatter-ing, Bremsstrahlung (for XPS with unmonochromated X-raysources), and scattered primary electrons (for AES) can oftenbe satisfactorily represented by choosing functions for eachintensity component with parameters for each componentdetermined in a single least-squares fi
20、t. The choice of thebackground to be removed if required or desired before peakfitting is suggested by the experience of the analysts and thepeak complexity as noted above.6. Apparatus6.1 Most AES and XPS instruments either already use, ormay be modified to use, one or more of the techniques that ar
21、edescribed.6.2 Background subtraction techniques typically require adigital acquisition and digital data handling capability. Inearlier years, the attachment of analog instrumentation toexisting equipment was usually required.7. Common Procedures7.1 Linear Background Subtraction (AES and XPS)In this
22、method, two arbitrarily chosen points in the spectrum areselected and joined by a straight line (1 and 2). This straightline is used to approximate the true background and issubtracted from the original spectrum. For Auger spectra, thetwo points may be chosen either on the high-energy side of theAug
23、er peak to result in an extrapolated linear background orsuch that the peak is positioned between the two points. ForXPS spectra, the two points are generally chosen such that thepeak is positioned between the two points. The intensity valuesat the chosen points may be the values at those energies o
24、r theaverage over a defined number of data points or energyinterval.7.2 Integral (or Shirley) Background Subtraction (AES andXPS)This method, proposed by Shirley (6), employs amathematical algorithm to approximate the inelastic scatteringof electrons as they escape from the solid. The algorithm isba
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