ASTM E995-2004 Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy《螺旋电子光谱法和X射线光电光谱法中减去背景技术的标准指南》.pdf
《ASTM E995-2004 Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy《螺旋电子光谱法和X射线光电光谱法中减去背景技术的标准指南》.pdf》由会员分享,可在线阅读,更多相关《ASTM E995-2004 Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy《螺旋电子光谱法和X射线光电光谱法中减去背景技术的标准指南》.pdf(4页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: E 995 04Standard Guide forBackground Subtraction Techniques in Auger ElectronSpectroscopy and X-ray Photoelectron Spectroscopy1This standard is issued under the fixed designation E 995; the number immediately following the designation indicates the year oforiginal adoption or, in the ca
2、se of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon (e) indicates an editorial change since the last revision or reapproval.1. Scope1.1 The purpose of this guide is to familiarize the analystwith the principal background subt
3、raction techniques presentlyin use together with the nature of their application to dataacquisition and manipulation.1.2 This guide is intended to apply to background subtrac-tion in electron, X-ray, and ion-excited Auger electron spec-troscopy (AES), and X-ray photoelectron spectroscopy (XPS).1.3 T
4、his standard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2. Referenced Docume
5、nts2.1 ASTM Standards:2E 673 Terminology Relating to Surface AnalysisE 996 Practice for Reporting Data in Auger Electron Spec-troscopy and X-ray Photoelectron Spectroscopy3. Terminology3.1 DefinitionsFor definitions of terms used in this guide,refer to Terminology E 673.4. Summary of Guide4.1 Releva
6、nce to AES and XPS:4.1.1 AESThe production of Auger electrons by bombard-ment of surfaces with electron beams is also accompanied byemission of secondary and backscattered electrons. Thesesecondary and backscattered electrons create a backgroundsignal. This background signal covers the energy spectr
7、um andhas a maximum (near 10 eV for true secondaries), and a secondmaximum for elastically backscattered electrons at the energyof the incident electron beam. An additional source of back-ground is associated with Auger electrons, which are inelasti-cally scattered while traveling through the specim
8、en. Augerelectron excitation may also occur by X-ray and ion bombard-ment of surfaces.4.1.2 XPSThe production of electrons from X-ray excita-tion of surfaces may be grouped into two categoriesphotoemission of electrons and the production of Augerelectrons from the decay of the resultant core hole st
9、ates. Thesource of the background signal observed in the XPS spectrumincludes a contribution from inelastic scattering processes, andfor non-monochromatic X-ray sources, electrons produced byBremsstrahlung radiation.4.2 Various background subtraction techniques have beenemployed to diminish or remov
10、e the influence of these back-ground electrons from the shape and intensity of Augerelectron and photoelectron features. Relevance to a particularanalytical technique (AES or XPS) will be indicated in the titleof the procedure.4.3 Implementation of any of the various background tech-niques that are
11、described in this guide may depend on availableinstrumentation and software as well as the method of acqui-sition of the original signal. These subtraction methods fall intotwo general categories: (1) real-time background subtraction;and (2) post-acquisition background subtraction.5. Significance an
12、d Use5.1 Background subtraction techniques in AES were origi-nally employed as a method of enhancement of the relativelyweak Auger signals to distinguish them from the slowlyvarying background of secondary and backscattered electrons.Interest in obtaining useful information from the Auger peakline s
13、hape, concern for greater quantitative accuracy fromAuger spectra, and improvements in data gathering techniques,have led to the development of various background subtractiontechniques.5.2 Similarly, the use of background subtraction techniquesin XPS has evolved mainly from the interest in the deter
14、mina-tion of chemical states (binding energy values), greater quan-titative accuracy from the XPS spectra, and improvements in1This guide is under the jurisdiction of ASTM Committee E42 on SurfaceAnalysis and is the direct responsibility of Subcommittee E42.03 on Auger ElectronSpectroscopy and XPS.C
15、urrent edition approved July 1, 2004. Published August 2004. Originallyapproved in 1984. Last previous edition approved in 1997 as E 995 97.2For referenced ASTM standards, visit the ASTM website, www.astm.org, orcontact ASTM Customer Service at serviceastm.org. For Annual Book of ASTMStandards volum
16、e information, refer to the standards Document Summary page onthe ASTM website.1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.data acquisition. Post-acquisition background subtraction isnormally applied to XPS data.5.3 The procedure
17、s outlined are popular in XPS and AES.General reviews of background subtraction techniques havebeen published (1 and 2 ).36. Apparatus6.1 Most AES and XPS instruments either already use, ormay be modified to use, one or more of the techniques that aredescribed.6.2 Background subtraction techniques t
18、ypically require adigital acquisition and digital data handling capability. Inearlier years, the attachment of analog instrumentation toexisting equipment was usually required.7. Common Procedures7.1 Linear Background Subtraction (AES and XPS)In thismethod, two arbitrarily chosen points in the spect
19、rum areselected and joined by a straight line (1). This straight line isused to approximate the true background and is subtractedfrom the original spectrum. For Auger spectra, the two pointsmay be chosen either on the high-energy side of the Auger peakto result in an extrapolated linear background o
20、r such that thepeak is positioned between the two points. For XPS spectra, thetwo points are generally chosen such that the peak is positionedbetween the two points. The intensity values at the chosenpoints may be the values at those energies or the average overa defined number of channels or energy
21、 interval.7.2 Integral (or Shirley) Background Subtraction (AES andXPS)This method, proposed by Shirley (3), employs amathematical algorithm to approximate the inelastic scatteringof electrons as they escape from the solid. The algorithm isbased on the assumption that the background is proportional
22、tothe area of the peak above the background at higher kineticenergy. This basic method has been modified to optimize therequired iterations (4), to provide for a sloping inelasticbackground (5), to provide for a background based upon theshape of the loss spectrum from an elastically backscatteredele
23、ctron (6), and to include a band gap for insulators (1).7.3 Inelastic Electron Scattering Correction (AES andXPS)This method, proposed by Tougaard (7), uses analgorithm which is based on a description of the inelasticscattering processes as the electrons leave the specimen. Thescattering cross secti
24、on which enters in the algorithm is takeneither from a simple universal formula which is approximatelyvalid for some solids, or is determined from the energyspectrum of a backscattered primary electron beam by anotheralgorithm (8). Alternatively, the parameters used in the univer-sal formula may als
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