DLA MIL-PRF-19500 633 D-2013 SEMICONDUCTOR DEVICE FIELD EFFECT RADIATION HARDENED TRANSISTORS P-CHANNEL SILICON TYPES 2N7403 AND 2N7404 JANSD AND JANSR.pdf
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1、 MIL-PRF-19500/633D 10 December 2013 SUPERSEDING MIL-PRF-19500/633C 3 June 2008 PERFORMANCE SPECIFICATION SHEET * SEMICONDUCTOR DEVICE, FIELD EFFECT RADIATION HARDENED TRANSISTORS, P-CHANNEL SILICON, TYPES 2N7403 AND 2N7404, JANSD AND JANSR This specification is approved for use by all Departments a
2、nd Agencies of the Department of Defense. The requirements for acquiring the product described herein shall consist of this specification sheet and MIL-PRF-19500. 1. SCOPE 1.1 Scope. This specification covers the performance requirements for a P-channel, enhancement-mode, MOSFET, radiation hardened
3、(total dose and single event characterization), power transistor. One level of product assurance is provided for each device type as specified in MIL-PRF-19500. 1.2 Physical dimensions. See figure 1 (similar to TO-254). 1.3 Maximum ratings. TA= +25oC, unless otherwise specified. Type PT(1) TC= +25C
4、PTTA= +25C VDSVDGVGSRJCMax ID1(2) (3) TC=+25C ID2TC= +100C IS (2) IDMTJand TSTG2N7403 W 125 W 50 V dc -100 V dc -100 V dc 20 C/W 1.00 A dc 22 A dc 14 A dc 22 A (pk) 66 C -55 to 2N7404 -200 -200 20 1.00 15 9 15 45 +150 (1) Derate linearly 1.0 W/oC for TC +25oC;(2) The following formula derives the ma
5、ximum theoretical IDlimit. IDis limited by package and internal wires and may be limited by pin diameter: (3) See figure 2, maximum drain current graphs. AMSC N/A FSC 5961 INCH-POUND ( ) ( ) Tat )on (Rx RT- T= IJMDSJCCJMD* Comments, suggestions, or questions on this document should be addressed to D
6、LA Land and Maritime, ATTN: VAC, P.O. Box 3990, Columbus, OH 43218-3990, or emailed to Semiconductordla.mil. Since contact information can change, you may want to verify the currency of this address information using the ASSIST Online database at https:/assist.dla.mil. The documentation and process
7、conversion measures necessary to comply with this document shall be completed by 10 February 2014. Provided by IHSNot for ResaleNo reproduction or networking permitted without license from IHS-,-,-MIL-PRF-19500/633D 2 Dimensions Ltr Inches Millimeters Min Max Min Max BL .530 .550 13.46 13.97 CH .249
8、 .260 6.32 6.60 LD .035 .045 0.89 1.14 LL .510 .570 12.95 14.48 LO .150 BSC 3.81 BSC LS .150 TYP 3.81 TYP MHD .139 .149 3.53 3.78 MHO .665 .685 16.89 17.40 TL .790 .800 20.07 20.32 TT .040 .050 1.02 1.27 TW .535 .545 13.59 13.84 Term 1 Drain Term 2 Source Term 3 Gate NOTES: 1. Dimensions are in inch
9、es. 2. Millimeters are given for general information only. 3. All terminals are isolated from case. 4. Die to base is BeO isolated, terminals to case ceramic (AL2O3) isolated. 5. In accordance with ASME Y14.5M, diameters are equivalent to x symbology. FIGURE 1. Physical dimensions (similar to TO-254
10、). Provided by IHSNot for ResaleNo reproduction or networking permitted without license from IHS-,-,-MIL-PRF-19500/633D 3 1.4 Primary electrical characteristics at TC= +25C. Type Min V(BR)DSSVGS= 0 ID= 1.0 mA dc VGS(TH)1VDS VGSID= 1.0 mA dc Max I DSS1VGS= 0 VGS= 80 percent of rated VDSMax r DS(on)(1
11、) VGS= -12 V IAS = IDMTJ= 25oC at ID2TJ= 125oC at ID22N7403 2N7404 V dc -100 -200 V dc Min Max -2.0 -6.0 A dc 25 0.140 0.290 0.217 0.513 A (pk) 66 45 (1) Pulsed (see 4.5.1). 2. APPLICABLE DOCUMENTS 2.1 General. The documents listed in this section are specified in sections 3, 4, or 5 of this specifi
12、cation. This section does not include documents cited in other sections of this specification or recommended for additional information or as examples. While every effort has been made to ensure the completeness of this list, document users are cautioned that they must meet all specified requirement
13、s of documents cited in sections 3, 4, or 5 of this specification, whether or not they are listed. 2.2 Government documents. 2.2.1 Specifications, standards, and handbooks. The following specifications, standards, and handbooks form a part of this document to the extent specified herein. Unless othe
14、rwise specified, the issues of these documents are those cited in the solicitation or contract. DEPARTMENT OF DEFENSE SPECIFICATIONS MIL-PRF-19500 - Semiconductor Devices, General Specification for. DEPARTMENT OF DEFENSE STANDARDS MIL-STD-750 - Test Methods for Semiconductor Devices. * (Copies of th
15、ese documents are available online at http:/quicksearch.dla.mil/ or https:/www.assist.dla.mil/ or from the Standardization Document Order Desk, 700 Robbins Avenue, Building 4D, Philadelphia, PA 19111-5094.) 2.3 Order of precedence. In the event of a conflict between the text of this document and the
16、 references cited herein, the text of this document takes precedence. Nothing in this document, however, supersedes applicable laws and regulations unless a specific exemption has been obtained. Provided by IHSNot for ResaleNo reproduction or networking permitted without license from IHS-,-,-MIL-PRF
17、-19500/633D 4 3. REQUIREMENTS 3.1 General. The individual item requirements shall be as specified in MIL-PRF-19500 and as modified herein. 3.2 Qualification. Devices furnished under this specification shall be products that are manufactured by a manufacturer authorized by the qualifying activity for
18、 listing on the applicable qualified manufacturers list before contract award (see 4.2 and 6.3). 3.3 Abbreviations, symbols, and definitions. Abbreviations, symbols, and definitions used herein shall be as specified in MIL-PRF-19500 and as follows. nC nano coulomb. IASRated avalanche current, non-re
19、petitive. 3.4 Interface and physical dimensions. Interface and physical dimensions shall be as specified in MIL-PRF-19500, and on figure 1 (similar to TO-254) herein. 3.4.1 Lead finish and material. Lead finish shall be solderable in accordance with MIL-PRF-19500, MIL-STD-750, and herein. Where a ch
20、oice of lead finish is desired, it shall be specified in the acquisition document. Lead material shall be Kovar or Alloy 52; a copper core or plated core is permitted (see 6.2). * 3.4.2 Internal construction. Multiple chip construction shall not be permitted. 3.5 Electrical performance characteristi
21、cs. Unless otherwise specified herein, the electrical performance characteristics are as specified in paragraph 1.3, 1.4, and table I. 3.6 Electrical test requirements. The electrical test requirements shall be as specified in table I. 3.7 Electrostatic discharge protection. The devices covered by t
22、his specification require electrostatic discharge protection. 3.7.1 Handling. MOS devices must be handled with certain precautions to avoid damage due to the accumulation of static charge. However, the following handling practices are recommended (see 3.5). a. Devices should be handled on benches wi
23、th conductive handling devices. b. Ground test equipment, tools and personnel handling devices. c. Do not handle devices by the leads. d. Store devices in conductive foam or carriers. e. Avoid use of plastic, rubber or silk in MOS areas. f. Maintain relative humidity above 50 percent if practical. g
24、. Care should be exercised during test and troubleshooting to apply not more than maximum rated voltage to any lead. h. Gate must be terminated to source, R or 100 k, whenever bias voltage is applied drain to source. 3.8 Marking. Marking shall be in accordance with MIL-PRF-19500. At the option of th
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