ASTM F1190-1999(2005) Standard Guide for Neutron Irradiation of Unbiased Electronic Components《未加偏压的电子元件的中子照射标准指南》.pdf
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1、Designation: F 1190 99 (Reapproved 2005)Standard Guide forNeutron Irradiation of Unbiased Electronic Components1This standard is issued under the fixed designation F 1190; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, the year of
2、 last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon (e) indicates an editorial change since the last revision or reapproval.1. Scope1.1 This guide strictly applies only to the exposure ofunbiased silicon (SI) or gallium arsenide (GaAs) semiconduc-tor c
3、omponents (integrated circuits, transistors, and diodes) toneutron radiation from a nuclear reactor source to determinethe permanent damage in the components. Validated 1-MeVdamage functions codified in National Standards are notcurrently available for other semiconductor materials.1.2 Elements of t
4、his guide with the deviations noted mayalso be applicable to the exposure of semiconductors com-prised of other materials except that validated 1-MeV damagefunctions codified in National standards are not currentlyavailable.1.3 Only the conditions of exposure are addressed in thisguide. The effects
5、of radiation on the test sample should bedetermined using appropriate electrical test methods.1.4 This guide addresses those issues and concerns pertain-ing to irradiations with reactor spectrum neutrons.1.5 System and subsystem exposures and test methods arenot included in this guide.1.6 This guide
6、 is applicable to irradiations conducted withthe reactor operating in either the pulsed or steady-state mode.The range of interest for neutron fluence in displacementdamage semiconductor testing range from approximately 109to 1016n/cm2.1.7 This guide does not address neutron-induced single ormultipl
7、e neutron event effects or transient annealing.1.8 This guide provides an alternative to Test Method1017.3, Neutron Displacement Testing, a component of MIL-STD-883 and MIL-STD-750. The Department of Defense hasrestricted use of these MIL-STDs to programs existing in 1995and earlier.1.9 This standar
8、d does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2. Referenced Documents2.1 ASTM
9、 Standards:2E 170 Terminology Relating to Radiation Measurementsand DosimetryE 264 Test Method for Determining Fast-Neutron ReactionRates by Radioactivation of NickelE 265 Test Method for Measuring Reaction Rates andFast-Neutron Fluences by Radioactivation of Sulfur32E 668 Practice for Application o
10、f Thermoluminescence Do-simetry (TLD) Systems for Determining Absorbed Dose inRadiation-Hardness Testing of Electronic DevicesE 720 Guide for Selection and Use of Neutron-ActivationFoils for Determining Neutron Spectra Employed inRadiation-Hardness Testing of ElectronicsE 721 Method for Determining
11、Neutron Energy Spectrawith Neutron-Activation Foils for Radiation-HardnessTesting of ElectronicsE 722 Practice for Characterizing Neutron Energy FluenceSpectra in Terms of an Equivalent Monoenergetic NeutronFluence for Radiation-Hardness Testing of ElectronicsE 1249 Practice for Minimizing Dosimetry
12、 Errors in Radia-tion Hardness Testing of Silicon Electronic Devices UsingCo-60 SourcesE 1250 Test Method for Application of Ionization Cham-bers to Assess the Low Energy Gamma Component ofCobalt-60 Irradiators Used in Radiation-Hardness Testingof Silicon Electronic DevicesE 1854 Practice for Ensuri
13、ng Test Consistency in Neutron-Induced Displacement Damage of Electronic PartsF 980 Guide for the Measurement of Rapid Annealing ofNeutron-Induced Displacement Damage in SemiconductorDevices.F 1892 Guide for Ionizing Radiation (Total Dose) EffectsTesting of Semiconductor Devices2.2 Other Documents:2
14、.2.1 The Department of Defense publishes every fewyears a compendium of nuclear reactor facilities that may besuitable for neutron irradiation of electronic components:1This guide is under the jurisdiction of ASTM Committee F01 on Electronicsand is the direct responsibility of Subcommittee F01.11 on
15、 Quality and HardnessAssurance.Current edition approved Jan. 1, 2005. Published January 2005. Originallyapproved in 1988. Last previous edition approved in 1999 as F 1190 99.2For referenced ASTM standards, visit the ASTM website, www.astm.org, orcontact ASTM Customer Service at serviceastm.org. For
16、Annual Book of ASTMStandards volume information, refer to the standards Document Summary page onthe ASTM website.1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.DASIAC SR-94-009, April 1996, Guide to Nuclear Weap-ons Effects Simulati
17、on Facilities and Techniques32.3 The Office of the Federal Register, National Archivesand Records Administration publishes several documents thatdelineate the regulatory requirements for handling and trans-porting radioactive semiconductor components:Code of Federal Regulations: Title 10 (Energy), P
18、art 20,Standards for Protection Against Radiation4Code of Federal Regulations: Title 10 (Energy), Part 30,Rules of General Applicability to Domestic Licensing ofByproduct Material4Code of Federal Regulations: Title 49 (Transportation),Parts 100 to 17743. Terminology3.1 1 MeV equivalent fluencethis e
19、xpression is used bythe radiation-hardness testing community to refer to the char-acterization of an incident neutron energy fluence spectrum,F(E), in terms of the fluence of monoenergetic neutrons at 1MeV energy required to produce the same displacementdamage in a specified irradiated material as F
20、(E) (see PracticeE 722 for details).3.1.1 DiscussionHistorically, the material has been as-sumed to be silicon (Si). The emergence of gallium arsenide(GaAs) as a significant alternate semiconductor material,whose radiation damage effects mechanisms differ substan-tially from Si based devices, requir
21、es that future use of the 1MeV equivalent fluence expression include the explicit speci-fication of the irradiation semiconductor material.3.2 silicon damage equivalent (SDE)expression synony-mous with “1 MeV equivalent fluence in silicon.”3.3 equivalent monoenergetic neutron fluence(Feq,Eref, mat.)
22、an equivalent monoenergetic neutron fluencethat characterizes an incident energy-fluence spectrum, F(E),in terms of the fluence of monoenergetic neutrons at a specificenergy, Eref, required to produce the same displacementdamage in a specified irradiated material, mat (see PracticeE 722 for details)
23、.3.3.1 DiscussionThe appropriate expressions for com-monly used 1 MeV equivalent fluence are Feq, 1 MeV, Siforsilicon semiconductor devices and Feq, 1 MeV, GaAsfor galliumarsenide based devices. See Practice E 722 for a more thoroughtreatment of the meaning and significant limitations imposedon the
24、use of these expressions.4. Summary of Guide4.1 Evaluation of neutron radiation-induced damage insemiconductor components and circuits requires that the fol-lowing steps be taken:4.1.1 Select a suitable reactor facility where the radiationenvironment and exposure geometry desired are both availablea
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