ASTM F1893-2018 Guide for Measurement of Ionizing Dose-Rate Survivability and Burnout of Semiconductor Devices《半导体器件电离剂量率存活率和燃尽测量指南》.pdf
《ASTM F1893-2018 Guide for Measurement of Ionizing Dose-Rate Survivability and Burnout of Semiconductor Devices《半导体器件电离剂量率存活率和燃尽测量指南》.pdf》由会员分享,可在线阅读,更多相关《ASTM F1893-2018 Guide for Measurement of Ionizing Dose-Rate Survivability and Burnout of Semiconductor Devices《半导体器件电离剂量率存活率和燃尽测量指南》.pdf(7页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: F1893 11F1893 18Guide forMeasurement of Ionizing Dose-Rate Survivability andBurnout of Semiconductor Devices1This standard is issued under the fixed designation F1893; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, th
2、e year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 This guide defines the detailed requirements for testing semiconductor devices for short-pulse high dose-rat
3、e ionization-induced survivability and burnout failure. The test facility shall be capable of providing the necessary dose rates to perform themeasurements. Typically, large flash X-ray (FXR) machines operated in the photon mode, or FXR e-beam facilities are utilizedbecause of their high dose-rate c
4、apabilities. Electron Linear Accelerators (LINACs) may be used if the dose rate is sufficient. Twomodes of test are described: (1) A survivability test, and ( 2) A burnout failure level test.1.2 The values stated in International System of Units (SI) are to be regarded as standard. No other units of
5、 measurement areincluded in this standard.1.3 This international standard was developed in accordance with internationally recognized principles on standardizationestablished in the Decision on Principles for the Development of International Standards, Guides and Recommendations issuedby the World T
6、rade Organization Technical Barriers to Trade (TBT) Committee.2. Referenced Documents2.1 ASTM Standards:2E170 Terminology Relating to Radiation Measurements and DosimetryE668 Practice for Application of Thermoluminescence-Dosimetry (TLD) Systems for Determining Absorbed Dose inRadiation-Hardness Tes
7、ting of Electronic DevicesE1894 Guide for Selecting Dosimetry Systems for Application in Pulsed X-Ray SourcesF526 Test Method for Using Calorimeters for Total Dose Measurements in Pulsed Linear Accelerator or Flash X-ray Machines2.2 ISO/ASTM Standard:251275 Practice for Use of a Radiochromic Film Do
8、simetry System3. Terminology3.1 Definitions:3.1.1 burnout failure level testa test performed to determine the maximum dose-rate level the device survives and theminmum dose-rate level where the device experiences burnout.3.1.1.1 DiscussionIn such a test, semiconductor devices are exposed to a series
9、 of irradiations of increasing dose-rate levels. The maximum dose rateat which the device survives is determined for worst-case bias conditions. The burnout failure level test is always a destructive test.3.1.2 dose ratethe amount of energy absorbed per unit mass of a material per unit time during e
10、xposure to the radiation field(typically, expressed in units of Gy(material)/s). For pulsed radiation sources, dose rate typically refers to the peak dose rate duringthe pulse.3.1.3 dose rate induced latchupregenerative device action in which a parasitic region (for example, a four (4) layer p-n-p-n
11、or n-p-n-p path) is turned on by the photocurrent generated by a pulse of ionizing radiation, and remains on for an indefinite period1 This guide is under the jurisdiction of Committee F01on Electronics, and is the direct responsibility of Subcommittee F01.11 on Nuclear and Space Radiation Effects.C
12、urrent edition approved Jan. 1, 2011March 1, 2018. Published January 2011April 2018. Originally approved in 1998. Last previous edition approved in 20032011 asF1893-98(2003).F1893-11. DOI: 10.1520/F1893-11.10.1520/F1893-18.2 For referencedASTM standards, visit theASTM website, www.astm.org, or conta
13、ctASTM Customer Service at serviceastm.org. For Annual Book of ASTM Standardsvolume information, refer to the standards Document Summary page on the ASTM website.This document is not an ASTM standard and is intended only to provide the user of an ASTM standard an indication of what changes have been
14、 made to the previous version. Becauseit may not be technically possible to adequately depict all changes accurately, ASTM recommends that users consult prior editions as appropriate. In all cases only the current versionof the standard as published by ASTM is to be considered the official document.
15、Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States1of time after the photocurrent subsides. The device will remain latched as long as the power supply delivers voltage greater thanthe holding voltage and current greater than the holding
16、current. Latchup disrupts normal circuit operation in some portion of thecircuit, and may also cause catastrophic failure due to local heating of semiconductor regions, metallization or bond wires.3.1.4 failure conditiona device is considered to have undergone burnout failure if the device experienc
17、es one of the followingconditions.(1) functional failurea device failure where the device under test, (DUT) fails functional tests following exposure.(2) parametric failurea device failure where the device under test, (DUT) fails parametric measurements after exposure.3.1.4.1 DiscussionFunctional or
18、 parametric failures may be caused by total ionizing dose mechanisms. See interferences for additional discussion.3.1.5 high dose-rate burnoutpermanent damage to a semiconductor device caused by abnormally large currents flowing injunctions and resulting in a discontinuity in the normal current flow
19、 in the device.3.1.5.1 DiscussionThis effect strongly depends on the mode of operation and bias conditions. Temperature may also be a factor in damage to thedevice should latchup occur prior to failure. Latchup is known to be temperature dependent.3.1.6 ionizing dose rate responsethe transient chang
20、es which occur in the operating parameters or in the output signal of anoperating device when exposed to an ionizing radiation pulse. See Terminology E170 for a definition of ionization. Within thisstandard, the scope of the dose rate response is restricted to consideration of linear microcircuits.3
21、.1.7 ionizing radiation effectsthe changes in the electrical parameters of a microelectronic device resulting fromradiation-induced trapped charge. These are also sometimes referred to as “total dose effects.”3.1.8 latchup windowa latchup window is the phenomenon in which a device exhibits latchup i
22、n a specific range of dose rates.Above and below this range, the device does not latchup. A device may exhibit more than one latchup window. This phenomenonhas been observed for some complementary metal-oxide semiconductor (CMOS) logic devices, oxide sidewall logic devices andlarge scale integration
23、 (LSI) memories and may occur in other devices.3.1.9 survivability testA“pass/fail” test performed to determine the status of the device after being exposed to a predetermineddose-rate level. The survivability test is usually considered a destructive test.4. Summary of Guide4.1 Semiconductor devices
24、 are tested for burnout during and after exposure to an ionizing high dose-rate radiation pulse. Themeasurement is deemed as a survivability test when the test criteria is a pass/fail measurement at a predetermined dose-rate level,or deemed as a burnout failure level test when the maximum passing do
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