ASTM F1513-1999(2011) Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications《用于电子薄膜的纯铝(非合金)材料标准规范》.pdf

《ASTM F1513-1999(2011) Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications《用于电子薄膜的纯铝(非合金)材料标准规范》.pdf》由会员分享，可在线阅读，更多相关《ASTM F1513-1999(2011) Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications《用于电子薄膜的纯铝(非合金)材料标准规范》.pdf（2页珍藏版）》请在麦多课文档分享上搜索。

1、Designation: F1513 99 (Reapproved 2011)Standard Specification forPure Aluminum (Unalloyed) Source Material for ElectronicThin Film Applications1This standard is issued under the fixed designation F1513; the number immediately following the designation indicates the year oforiginal adoption or, in th

2、e case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 This specification covers pure aluminum metal (unal-loyed) for use in evaporation sour

3、ces and sputtering targets.This material is intended as a raw material for electronicapplications. The material is used as-supplied in some cases(for example, as e-beam evaporation sources). In other in-stances it may be remelted, alloyed, cast and processed by thepurchaser to make finished products

4、 (for example, sputteringtargets).1.2 This specification sets purity grade levels, physicalattributes, analytical methods, and packaging.1.3 The values stated in SI units are to be regarded asstandard. No other units of measurement are included in thisstandard.2. Referenced Documents2.1 ASTM Standar

5、ds:2D1971 Practices for Digestion of Water Samples for Deter-mination of Metals by Flame Atomic Absorption, GraphiteFurnace Atomic Absorption, Plasma Emission Spectros-copy, or Plasma Mass Spectrometry3. Terminology3.1 material lotmaterial melted and cast from one cru-cible charge.4. Classification4

6、.1 Grades of aluminum are defined in Table 1. Impuritycontents are reported in parts per million by weight (wt ppm).4.2 Purity and total metallic impurity levels are based uponelements listed in Table 2.5. Ordering Information5.1 Orders for pure aluminum source material shall includethe following:5.

7、1.1 Grade (4.1),5.1.2 Configuration (8.1 and 8.2),5.1.3 Whether or not certification is required (12.1), and5.1.4 Whether or not a sample representative of the finishedproduct is required to be provided by the supplier to thepurchaser.6. Impurities6.1 The minimum suite of metallic impurity elements

8、to beanalyzed is defined in Table 2. Acceptable analysis methodsand detection limits are specified in Section 11. Elements notdetected will be counted and reported as present at thedetection limit. Additional elements may be analyzed andreported, as agreed upon between the supplier and the pur-chase

9、r, but these shall not be counted in defining the gradedesignation.6.2 Nonmetalic elements to be analyzed and reported are C,H, O, N, and S.6.3 Acceptable limits and analytical techniques for particu-lar elements in critical applications shall be as agreed uponbetween the supplier and the purchaser.

10、1This specification is under the jurisdiction of ASTM Committee F01 onElectronics and is the direct responsibility of Subcommittee F01.17 on SputterMetallization.Current edition approved June 1, 2011. Published June 2011. Originallypublished in 1994. Last previous edition approved in 2003 as F151394

11、 (2003).DOI: 10.1520/F1513-99R11.2For referenced ASTM standards, visit the ASTM website, www.astm.org, orcontact ASTM Customer Service at serviceastm.org. For Annual Book of ASTMStandards volume information, refer to the standards Document Summary page onthe ASTM website.TABLE 1 Aluminum GradesGrade

12、 Purity, %Maximum Metallic ImpurityContent (by weight), ppm6N 99.9999 15N5 99.9995 55N 99.999 10TABLE 2 Minimum Suite of Metallic Elements to be AnalyzedAntimony Gold SilverArsenic Iron SodiumBeryllium Lithium ThoriumBoron Magnesium TinCalcium Manganese TitaniumCerium Nickel UraniumCesium Phosphorus

13、 VanadiumChromium Potassium ZincCopper Silicon Zirconium1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.6.4 Fluorine and chlorine may be important impurities insome applications. Acceptable limits and analytical techniquesshall be ag

14、reed upon between the supplier and the purchaser.7. Grain Size7.1 Grain size and measurement method for grain size shallbe agreed upon between the supplier and the purchaser.8. Dimensions8.1 Each product shall conform to an appropriate engineer-ing drawing, as agreed upon between the supplier and th

15、epurchaser.8.2 Nominal dimensions, tolerances, and other attributesshall be agreed upon between the supplier and the purchaser.9. Workmanship, Finish, and Appearance9.1 Workmanship, finish, and appearance shall be agreedupon between the supplier and the purchaser.9.2 Surface must be free of any cont

16、aminates such as moldrelease, dirt, or oils that could adversely effect the purity of thematerial when remelted, unless otherwise agreed upon betweensupplier and purchaser.10. Sampling10.1 Analyses for impurities shall be performed on asamples that are representative of the suppliers finishedmateria

17、l lots.11. Analytical Methods11.1 Analysis for impurities in 6.2 and Table 2 shall beperformed as follows:11.1.1 Alkalies (Potassium, Lithium, Sodium)Atomic ab-sorption (AA), glow discharge mass spectrometer (GDMS) orany other technique with a minimum detection limit (mdl) of0.05 wt. ppm. Use Practi

18、ces D1971, as applicable, for samplepreparation.11.1.2 Carbon, Oxygen, and SulfurFusion and gasextraction/infrared spectroscopy or GDMS; mdl 10 wt. ppm.11.1.3 NitrogenFusion and gas extraction/thermal con-ductivity analysis; mdl 5 wt. ppm.11.1.4 HydrogenFusion and gas extraction/thermal con-ductivit

19、y; mdl 0.3 wt. ppm.11.1.5 All OthersAA, inductively coupled plasma (ICP)emission spectroscopy, spark source mass spectroscopy(SSMS), or GDMS; mdl 0.01 wt. ppm for 6N grade, 0.1 wt.ppm for 5N5 and 5N grade. Use Practices D1971, as appli-cable, for sample preparation.11.1.6 Other analytical techniques

20、 may be used providedthey can be proved equivalent to the methods specified, andhave minimum detection limits of the specified methods.12. Certification12.1 When required by the purchaser, a certificate ofanalysis/compliance that represents the finished material lotshall be provided for each lot by

21、the supplier.12.2 The certificate of analysis/compliance shall state themanufacturers or suppliers name, the suppliers lot number,the grade level (Section 4), impurity levels (Section 6), methodof analysis (Section 11), and any other information as agreedupon between the supplier and the purchaser.1

22、2.3 Impurity levels are to be reported in the certificate ofanalysis/compliance using actual analytical (not “typical”)results for the material lot. All impurity levels, except uraniumand thorium, shall be reported in wt. ppm. Uranium andthorium are ordinarily controlled at very low levels in thisma

23、terial and may be reported in parts per billion by weight (wt.ppb). Nondetected trace impurities shall be reported as presentat the mdl concentrations (6.1).13. Packaging and Package Marking13.1 Each piece shall be enclosed in a shipping carton thatinsures product integrity during shipment.14. Keywo

24、rds14.1 aluminum; coating; evaporation; sputtering; targets;thin films; vacuum coatingASTM International takes no position respecting the validity of any patent rights asserted in connection with any item mentionedin this standard. Users of this standard are expressly advised that determination of t

25、he validity of any such patent rights, and the riskof infringement of such rights, are entirely their own responsibility.This standard is subject to revision at any time by the responsible technical committee and must be reviewed every five years andif not revised, either reapproved or withdrawn. Yo

26、ur comments are invited either for revision of this standard or for additional standardsand should be addressed to ASTM International Headquarters. Your comments will receive careful consideration at a meeting of theresponsible technical committee, which you may attend. If you feel that your comment

27、s have not received a fair hearing you shouldmake your views known to the ASTM Committee on Standards, at the address shown below.This standard is copyrighted by ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959,United States. Individual reprints (single or mul

28、tiple copies) of this standard may be obtained by contacting ASTM at the aboveaddress or at 610-832-9585 (phone), 610-832-9555 (fax), or serviceastm.org (e-mail); or through the ASTM website(www.astm.org). Permission rights to photocopy the standard may also be secured from the ASTM website (www.astm.org/COPYRIGHT/).F1513 99 (2011)2