ASTM E984-2006 Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy《用俄歇电子能谱法鉴别化学效应和基体效应用标准指南》.pdf
《ASTM E984-2006 Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy《用俄歇电子能谱法鉴别化学效应和基体效应用标准指南》.pdf》由会员分享,可在线阅读,更多相关《ASTM E984-2006 Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy《用俄歇电子能谱法鉴别化学效应和基体效应用标准指南》.pdf(4页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: E 984 06Standard Guide forIdentifying Chemical Effects and Matrix Effects in AugerElectron Spectroscopy1This standard is issued under the fixed designation E 984; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, the yea
2、r of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon (e) indicates an editorial change since the last revision or reapproval.1. Scope1.1 This guide outlines the types of chemical effects andmatrix effects which are observed in Auger electron spectro
3、s-copy.1.2 Guidelines are given for the reporting of chemical andmatrix effects in Auger spectra.1.3 Guidelines are given for utilizingAuger chemical effectsfor identification or characterization.1.4 This guide is applicable to both electron excited andX-ray excited Auger electron spectroscopy.1.5 T
4、his standard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2. Referenced Docume
5、nts2.1 ASTM Standards:2E 673 Terminology Relating to Surface AnalysisE 827 Practice for Indentifying Elements by the Peaks inAuger Electron SpectroscopyE 983 Guide for Minimizing Unwanted Electron BeamEffects in Auger Electron SpectroscopyE 996 Practice for Reporting Data in Auger Electron Spec-tros
6、copy and X-ray Photoelectron Spectroscopy2.2 Other Documents:ISO 18118:2004 Surface Chemical AnalysisAuger Elec-tron Spectroscopy and X-ray PhotoelectronSpectroscopyGuide to the Use of Experimentally De-termined Relative Sensitivity Factors for the QuantitativeAnalysis of Homogenous Materials3. Term
7、inology3.1 Terms used in Auger electron spectroscopy are definedin Terminology E 673.4. Significance and Use4.1 Auger electron spectroscopy is often capable of yieldinginformation concerning the chemical and physical environmentof atoms in the near-surface region of a solid as well as givingelementa
8、l and quantitative information. This information ismanifested as changes in the observedAuger electron spectrumfor a particular element in the specimen under study comparedto the Auger spectrum produced by the same element when itis in some reference form. The differences in the two spectraare said
9、to be due to a chemical effect or a matrix effect.Despite sometimes making elemental identification and quan-titative measurements more difficult, these effects in the Augerspectrum are considered valuable tools for characterizing theenvironment of the near-surface atoms in a solid.5. Defining Auger
10、 Chemical Effects and Matrix Effects5.1 In general,Auger chemical and matrix effects may resultin (a) a shift in the energy of anAuger peak, (b) a change in theshape of an Auger electron energy distribution, (c) a change inthe shape of the electron energy loss distribution associatedwith an Auger pe
11、ak, or (d) a change in the Auger signalstrengths of an Auger transition. The above changes may bedue to the bonding or chemical environment of the element(chemical effect) or to the distribution of the element orcompound within the specimen (matrix effect).5.2 The Auger chemical shift is one of the
12、most commonlyobserved chemical effects. A comparison can be made to themore familiar chemical shifts in XPS (X-ray photoelectronspectroscopy) photoelectron lines, where energy shifts arecaused by changes in the ionic charge on an atom, the latticepotential at that atomic site, and the final-state re
13、laxationenergy contributed by adjacent atoms (1 and 2).3Coverage bygas adsorbates on metal surfaces may also cause shifts in the1This guide is under the jurisdiction of ASTM Committee E42 on SurfaceAnalysis and is the direct responsibility of Subcommittee E42.03 on Auger ElectronSpectroscopy and X-R
14、ay Photoelectron Spectroscopy.Current edition approved Nov. 1, 2006. Published November 2006. Originallyapproved in 1984. Last previous edition approved in 2001 as E 984 95 (2001).2For referenced ASTM standards, visit the ASTM website, www.astm.org, orcontact ASTM Customer Service at serviceastm.org
15、. For Annual Book of ASTMStandards volume information, refer to the standards Document Summary page onthe ASTM website.3The boldface numbers in parentheses refer to the references at the end of thisstandard.1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 1942
16、8-2959, United States.metal Auger peak energies (3). The magnitude of the Augerchemical shift will usually be different from the XPS photo-electron shift because the Auger process involves a two-holefinal state for the atom which is more strongly influenced byextra-atomic relaxation. Frequently an A
17、uger chemical shift islarger than an XPS chemical shift (see Fig. 1).5.2.1 Related to chemical shifts is the (modified) Augerparameter, defined as the sum of the photoelectron bindingenergy and the Auger electron kinetic energy (4). Because theAuger parameter is the difference between two line energ
18、ies ofthe same element of the same specimen, it is independent ofany electrical charging of the specimen and spectrometerenergy reference level, making it easier to identify chemicalstates of elements in insulating specimens. Naturally, sinceboth photoelectron lines andAuger lines must be measured,
19、theAuger parameter can only be used with X-ray excited spectra.5.3 The second category of chemical information fromAuger spectroscopy is the Auger lineshapes observed fortransitions involving valence electron orbitals. Shown in Fig. 2and Fig. 3 are selected lineshapes for electron-excited carbonKLL
20、and aluminum LVVAuger transitions for different chemi-cal states of those elements. While it is possible to relate theprominent peaks in the Auger spectrum to transitions fromparticular bands in the density of states (for solids) or toparticular molecular orbitals (for molecules) (5), this is not an
21、easy task. The large number of possible two-hole final states,taken together with shake-up and shake-off transitions anduncertainty on all their final energies and intensities make thejob of constructing a valence orbital density map from theAuger spectrum next to impossible for all but the simplest
22、systems. Further, some spectra exhibit a quasiatomic character(6). Accordingly, most studies use the “fingerprint” approachwhen attempting to identify unknown species based on theirAuger lineshape. Of course reference spectra are necessary inthis approach for a positive identification. “Surface Scie
23、nceSpectra” is an international journal devoted to archivingsurface science spectra of technological and scientific interest(17)5.4 Other effects besides energy shifts and valence line-shapes may be classified as chemical effects in Auger spectros-copy. For instance, many body effects in metals, suc
24、h asplasmons, may make the lineshapes of Auger transitions ofFIG. 1 Comparison of X-ray Excited Cd MNN Auger and 3dPhotoelectron Energy Shifts for Cd Metal, CdO, and CdF2(Ref 13)FIG. 2 Carbon KLL Auger Spectra for Mo2C, SiC, Graphite, andDiamond (Ref 14)(a) Almost no Oxidation (b) Partial Oxidation
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