BS EN 62431-2008 Reflectivity of electromagnetic wave absorbers in millimetre wave frequency - Measurement methods《毫米波频中电磁波吸收器的反射率 测量方法》.pdf

《BS EN 62431-2008 Reflectivity of electromagnetic wave absorbers in millimetre wave frequency - Measurement methods《毫米波频中电磁波吸收器的反射率 测量方法》.pdf》由会员分享，可在线阅读，更多相关《BS EN 62431-2008 Reflectivity of electromagnetic wave absorbers in millimetre wave frequency - Measurement methods《毫米波频中电磁波吸收器的反射率 测量方法》.pdf（62页珍藏版）》请在麦多课文档分享上搜索。

1、Reflectivity of electromagneticwave absorbers in millimetrewave frequency MeasurementmethodsBS EN 62431:2008raising standards worldwideNO COPYING WITHOUT BSI PERMISSION EXCEPT AS PERMITTED BY COPYRIGHT LAWBSI British StandardsLicensed Copy: Wang Bin, ISO/EXCHANGE CHINA STANDARDS, 19/06/2009 02:32, U

2、ncontrolled Copy, (c) BSINational forewordThis British Standard is the UK implementation of EN 62431:2008. It is identical to IEC 62431:2008. It supersedes DD IEC/PAS 62431:2005 which iswithdrawn.The UK participation in its preparation was entrusted by Technical CommitteeEPL/46, Cables, wires and wa

3、veguides, radio frequency connectors and accessories for communication and signalling, to Subcommittee EPL/46/2,Radio frequency connectors and waveguides.A list of organizations represented on this committee can be obtained onrequest to its secretary.This publication does not purport to include all

4、the necessary provisions of acontract. Users are responsible for its correct application. BSI 2009ISBN 978 0 580 58258 5ICS 17.220.20; 33.120.10Compliance with a British Standard cannot confer immunity fromlegal obligations.Amendments issued since publicationAmd. No. Date Text affectedBRITISH STANDA

5、RDBS EN 62431:2008This British Standard was published under the authority of the StandardsPolicy and Strategy Committee on February 2009.2 8Licensed Copy: Wang Bin, ISO/EXCHANGE CHINA STANDARDS, 19/06/2009 02:32, Uncontrolled Copy, (c) BSIEUROPEAN STANDARD EN 62431 NORME EUROPENNE EUROPISCHE NORM De

6、cember 2008 CENELEC European Committee for Electrotechnical Standardization Comit Europen de Normalisation Electrotechnique Europisches Komitee fr Elektrotechnische Normung Central Secretariat: rue de Stassart 35, B - 1050 Brussels 2008 CENELEC - All rights of exploitation in any form and by any mea

7、ns reserved worldwide for CENELEC members. Ref. No. EN 62431:2008 E ICS 19.080; 17.020; 29.120.10 English version Reflectivity of electromagnetic wave absorbers in millimetre wave frequency - Measurement methods (IEC 62431:2008) Rflectivit des absorbeurs dondes lectromagntiques dans la plage des frq

8、uences millimtriques - Mthodes de mesure (CEI 62431:2008) Verfahren zur Messung des Reflexionsvermgens von Absorbern fr elektromagnetische Wellen im Millimeterwellen-Frequenzbereich (IEC 62431:2008) This European Standard was approved by CENELEC on 2008-11-01. CENELEC members are bound to comply wit

9、h the CEN/CENELEC Internal Regulations which stipulate the conditions for giving this European Standard the status of a national standard without any alteration. Up-to-date lists and bibliographical references concerning such national standards may be obtained on application to the Central Secretari

10、at or to any CENELEC member. This European Standard exists in three official versions (English, French, German). A version in any other language made by translation under the responsibility of a CENELEC member into its own language and notified to the Central Secretariat has the same status as the o

11、fficial versions. CENELEC members are the national electrotechnical committees of Austria, Belgium, Bulgaria, Cyprus, the Czech Republic, Denmark, Estonia, Finland, France, Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, the Netherlands, Norway, Poland, Portu

12、gal, Romania, Slovakia, Slovenia, Spain, Sweden, Switzerland and the United Kingdom. BS EN 62431:2008Licensed Copy: Wang Bin, ISO/EXCHANGE CHINA STANDARDS, 19/06/2009 02:32, Uncontrolled Copy, (c) BSIEN 62431:2008 2 Foreword The text of document 46F/65/CDV, future edition 1 of IEC 62431, prepared by

13、 SC 46F, R.F. and microwave passive components, of IEC TC 46, Cables, wires, waveguides, R.F. connectors, R.F. and microwave passive components and accessories, was submitted to the IEC-CENELEC Parallel Unique Acceptance Procedure and was approved by CENELEC as EN 62431 on 2008-11-01. The following

14、dates were fixed: latest date by which the EN has to be implemented at national level by publication of an identical national standard or by endorsement (dop) 2009-08-01 latest date by which the national standards conflicting with the EN have to be withdrawn (dow) 2011-11-01 Annex ZA has been added

15、by CENELEC. _ Endorsement notice The text of the International Standard IEC 62431:2008 was approved by CENELEC as a European Standard without any modification. _ BS EN 62431:2008Licensed Copy: Wang Bin, ISO/EXCHANGE CHINA STANDARDS, 19/06/2009 02:32, Uncontrolled Copy, (c) BSI 3 EN 62431:2008 Annex

16、ZA (normative) Normative references to international publications with their corresponding European publications The following referenced documents are indispensable for the application of this document. For dated references, only the edition cited applies. For undated references, the latest edition

17、 of the referenced document (including any amendments) applies. NOTE When an international publication has been modified by common modifications, indicated by (mod), the relevant EN/HD applies. Publication Year Title EN/HD Year ISO/IEC 17025 - 1)General requirements for the competence of testing and

18、 calibration laboratories EN ISO/IEC 17025 2005 2)1)Undated reference. 2)Valid edition at date of issue. BS EN 62431:2008Licensed Copy: Wang Bin, ISO/EXCHANGE CHINA STANDARDS, 19/06/2009 02:32, Uncontrolled Copy, (c) BSI 2 62431 IEC:2008(E) CONTENTS FOREWORD.5 1 Scope.7 2 Normative references .7 3 T

19、erms, definitions and acronyms 7 3.1 Terms and definitions 7 3.2 Acronyms and symbols10 4 Specimen .12 4.1 Specimen specification12 4.2 Reference metal plate .12 4.2.1 Material and thickness.12 4.2.2 Surface roughness 12 4.2.3 Flatness 12 4.2.4 Size and shape12 4.3 Reference specimen for calibration

20、 .12 5 Specimen holder 13 6 Measurement equipment 13 6.1 Type of network analyzer 13 6.2 Antenna 13 6.2.1 Horn antenna.13 6.2.2 Lens antenna.13 6.3 Amplifier13 6.4 Cable 14 7 Measurement condition 14 7.1 Temperature and environment.14 7.2 Warming up of measurement equipment14 7.3 Electromagnetic env

21、ironment 14 8 Calibration of measurement system and measurement conditions 14 8.1 Calibration of measurement system.14 8.2 Measurement conditions14 8.2.1 Dynamic range 14 8.2.2 Setting up of the network analyzer for keeping adequate dynamic range.14 9 Horn antenna method .15 9.1 Measurement system 1

22、5 9.1.1 Configuration of the measurement system .15 9.1.2 Horn antenna.16 9.1.3 Specimen holder16 9.1.4 Mounting of the specimen18 9.1.5 Antenna stand .18 9.2 Measurement conditions18 9.2.1 Measurement environment 18 9.2.2 Measuring distance .18 9.2.3 Size of specimen .18 9.3 Measurement procedures

23、19 10 Dielectric lens antenna method focused beam method 20 10.1 Outline 20 BS EN 62431:2008Licensed Copy: Wang Bin, ISO/EXCHANGE CHINA STANDARDS, 19/06/2009 02:32, Uncontrolled Copy, (c) BSI62431 IEC:2008(E) 3 10.2 Measurement system 20 10.2.1 Transmitting and receiving antennas .20 10.2.2 Focused

24、beam horn antenna .21 10.2.3 Specimen size .22 10.2.4 Reference metal plate size 22 10.2.5 Specimen holder22 10.2.6 Method of fixing the specimen and the reference metal plate.23 10.3 Measurement procedures 23 11 Dielectric lens antenna method parallel beam method .25 11.1 Principle25 11.1.1 Outline

25、 25 11.1.2 Parallel EM wave beam formed using a EM wave lens.25 11.2 Measurement system 26 11.2.1 Composition of measurement system 26 11.2.2 Dielectric lens antenna 29 11.3 Specimen 29 11.3.1 General .29 11.3.2 Reference metal plate .29 11.3.3 Size of specimen .30 11.4 Measurement procedures 30 11.

26、4.1 Normal incidence.30 11.4.2 Oblique Incidence30 12 Test report31 Annex A (informative) Reflection and scattering from metal plate Horn antenna method .33 Annex B (informative) Reflectivity of reference specimens using horn antenna method38 Annex C (informative) Specifications of commercially avai

27、lable antennas 39 Annex D (normative) Calibration using VNA.42 Annex E (informative) Dynamic range and measurement errors .51 Annex F (informative) Enlargement of dynamic range Calibration by isolation .53 Annex G (informative) Relative permittivity of styrofoam and foamed polyethylene based on foam

28、 ratio 54 Annex H (informative) Calculation of Fraunhofer region Horn antenna method.55 Figure 1 Definition of reflectivity.10 Figure 2 Configuration of the measurement system normal incidence (S11).15 Figure 3 Configuration of the measurement system oblique incidence (S21) 16 Figure 4 Mounting meth

29、od of specimen17 Figure 5 The mechanism of adjusting azimuth and elevation17 Figure 6 Measurement system for normal incidence (side view).20 Figure 7 Measurement system for oblique incidence (top view)21 Figure 8 Structure of a dielectric lens antenna .22 Figure 9 Structure of specimen holder23 Figu

30、re 10 EM wave propagation using a horn antenna and a dielectric lens .26 Figure 11 Block diagram of the measurement system 27 Figure 12 A measurement system for normal incidence .28 BS EN 62431:2008Licensed Copy: Wang Bin, ISO/EXCHANGE CHINA STANDARDS, 19/06/2009 02:32, Uncontrolled Copy, (c) BSI 4

31、62431 IEC:2008(E) Figure 13 Measurement system for oblique incidence 28 Figure 14 Position of a shielding plate .29 Figure 15 Items to be mentioned in a test report 32 Figure A.1 Reflection from the reference metal plate versus measurement distance between the antenna and the metal plate33 Figure A.

32、2 Reflectivity of reference metal plate versus size34 Figure A.3 Reflectivity of reference metal plate at 40 GHz .35 Figure A.4 Reflectivity of reference metal plate with cross section of 200 mm 200 mm at 40 GHz35 Figure A.5 Analysis of reflection from a metal plate37 Figure B.1 Reflectivity of a 20

33、0 mm 200 mm silica-glass plate in millimetre wave frequency38 Figure C.1 Representative specifications of a horn antenna.39 Figure C.2 Structure of cylindrical horn antenna with dielectric lens in Table C.2, A used at 50 GHz - 75 GHz40 Figure C.3 A structure of dielectric lens and horn antenna in Ta

34、ble C.2, D.41 Figure D.1 Measurement configuration for the case of normal incidence with a directional coupler connected directly to the horn antenna42 Figure D.2 Configuration for response calibration using a reference metal plate in the case of normal incidence 43 Figure D.3 Configuration for resp

35、onse calibration using a reference metal plate in the case of oblique incidence44 Figure D.4 Configuration for response and isolation calibration in the case of normal incidence 45 Figure D.5a Response calibration Figure D.5b Isolation calibration.45 Figure D.5 Configuration for response and isolati

36、on calibration in the case of oblique incidence 45 Figure D.6 Configuration for S111-port full calibration in the case of normal incidence 47 Figure D.7 Precision antenna positioner configuration48 Figure D.8 TRL calibration procedure.49 Figure D.9 Measurement and TRL calibration of transmission lin

37、e .50 Figure E.1 An example of receiving level of a reference metal plate and that without a specimen .51 Figure E.2 Dynamic range and measurement error of reflectivity52 Figure F.1 A method to remove spurious waves.53 Figure H.1 Fraunhofer region and antenna gain .55 Table 1 Acronyms 11 Table 2 Sym

38、bols 11 Table C.1 Antenna gain 24 dB (example A)39 Table C.2 Some specifications of antennas with dielectric lenses 40 Table G.1 Relative permittivity and foam ratio of styrofoam54 Table G.2 Relative permittivity and foam ratio of foamed polyethylene.54 BS EN 62431:2008Licensed Copy: Wang Bin, ISO/E

39、XCHANGE CHINA STANDARDS, 19/06/2009 02:32, Uncontrolled Copy, (c) BSI62431 IEC:2008(E) 5 INTERNATIONAL ELECTROTECHNICAL COMMISSION _ REFLECTIVITY OF ELECTROMAGNETIC WAVE ABSORBERS IN MILLIMETRE WAVE FREQUENCY MEASUREMENT METHODS FOREWORD 1) The International Electrotechnical Commission (IEC) is a wo

40、rldwide organization for standardization comprising all national electrotechnical committees (IEC National Committees). The object of IEC is to promote international co-operation on all questions concerning standardization in the electrical and electronic fields. To this end and in addition to other

41、 activities, IEC publishes International Standards, Technical Specifications, Technical Reports, Publicly Available Specifications (PAS) and Guides (hereafter referred to as “IEC Publication(s)”. Their preparation is entrusted to technical committees; any IEC National Committee interested in the sub

42、ject dealt with may participate in this preparatory work. International, governmental and non-governmental organizations liaising with the IEC also participate in this preparation. IEC collaborates closely with the International Organization for Standardization (ISO) in accordance with conditions de

43、termined by agreement between the two organizations. 2) The formal decisions or agreements of IEC on technical matters express, as nearly as possible, an international consensus of opinion on the relevant subjects since each technical committee has representation from all interested National Committ

44、ees. 3) IEC Publications have the form of recommendations for international use and are accepted by IEC National Committees in that sense. While all reasonable efforts are made to ensure that the technical content IEC Publications is accurate, IEC cannot be held responsible for the way in which they

45、 are used or for any misinterpretation by any end user. 4) In order to promote international uniformity, IEC National Committees undertake to apply IEC Publications transparently to the maximum extent possible in their national and regional publications. Any divergence between any IEC Publication an

46、d the corresponding national or regional publication shall be clearly indicated in the latter. 5) EC provides no marking procedure to indicate its approval and cannot be rendered responsible for any equipment declared to be in conformity with an IEC Publication. 6) All users should ensure that they

47、have the latest edition of this publication. 7) No liability shall attach to IEC or its directors, employees, servants or agents including individual experts and members of its technical committees and IEC National Committees for any personal injury, property damages or other damage of any nature wh

48、atsoever, whether direct or indirect, or for costs (including legal fees) and expenses arising out of the publication, use of, or reliance upon, this IEC Publication or any other IEC Publications. 8) Attention is drawn to the Normative references cited in this publication. Use of the referenced publ

49、ications is indispensable for the correct application of this publication. 9) Attention is drawn to the possibility that some of the elements of this IEC Publication may be the subject of patent rights. IEC shall not be held responsible for identifying any or all such patent rights. International Standard IEC 62431 has been prepared by subcommittee SC46F: RF and microwave passive compo