ASTM E1078-2002 Standard Guide for Specimen Preparation and Mounting in Surface Analysis《表面分析中试样制备和安装程序的标准指南》.pdf
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1、Designation: E 1078 02Standard Guide forSpecimen Preparation and Mounting in Surface Analysis1This standard is issued under the fixed designation E 1078; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, the year of last revision. A
2、number in parentheses indicates the year of last reapproval. Asuperscript epsilon (e) indicates an editorial change since the last revision or reapproval.1. Scope1.1 This guide covers specimen preparation and mountingprior to, during, and following surface analysis and applies tothe following surfac
3、e analysis disciplines:1.1.1 Auger electron spectroscopy (AES),1.1.2 X-ray photoelectron spectroscopy (XPS and ESCA),and1.1.3 Secondary ion mass spectrometry, (SIMS).1.1.4 Although primarily written for AES, XPS, and SIMS,these methods will also apply to many surface sensitiveanalysis methods, such
4、as ion scattering spectrometry, lowenergy electron diffraction, and electron energy loss spectros-copy, where specimen handling can influence surface sensitivemeasurements.1.2 This standard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibilit
5、y of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2. Referenced Documents2.1 ASTM Standards:E 673 Terminology Relating to Surface Analysis2E 983 Guide for Minimizing Unwanted Electron BeamEffec
6、ts in Auger Electron Spectroscopy2E 1127 Guide for Depth Profiling in Auger Electron Spec-troscopy2E 1829 Guide for Handling Specimens Prior to SurfaceAnalysis23. Terminology3.1 DefinitionsFor definitions of surface analysis termsused in this guide, see Terminology E 673.4. Significance and Use4.1 P
7、roper preparation and mounting of specimens is par-ticularly critical for surface analysis. Improper preparation ofspecimens can result in alteration of the surface compositionand unreliable data. Specimens should be handled carefully soas to avoid the introduction of spurious contaminants in thepre
8、paration and mounting process. The goal must be topreserve the state of the surface so that the analysis remainsrepresentative of the original.4.2 Auger electron spectroscopy (AES), X-ray photoelec-tron spectroscopy (XPS or ESCA), and secondary ion massspectrometry (SIMS) are sensitive to surface la
9、yers that aretypically a few nanometers (nm) thick. Such thin layers can besubject to severe perturbations caused by specimen handling(1)3or surface treatments that may be necessary prior tointroduction into the analytical chamber. In addition, specimenmounting techniques have the potential to affec
10、t the intendedanalysis.4.3 This guide describes methods that the surface analystmay need to minimize the effects of specimen preparationwhen using any surface-sensitive analytical technique. Alsodescribed are methods to mount specimens so as to ensure thatthe desired information is not compromised.4
11、.4 Guide E 1829 describes the handling of surface sensi-tive specimens and, as such, complements this guide.5. General Requirements5.1 Although the handling techniques for AES, XPS, andSIMS are basically similar, there are some differences. Ingeneral, preparation of specimens for AES and SIMS requir
12、esmore attention because of potential problems with electron orion beam damage or charging, or both. This guide will notewhen specimen preparation is significantly different among thethree techniques.5.2 The degree of cleanliness required by surface sensitiveanalytical techniques is often much great
13、er than for other formsof analysis.5.3 Specimens and mounts must never be in contact with thebare hand. Handling of the surface to be analyzed should beeliminated or minimized whenever possible. Fingerprints con-tain mobile species that may contaminate the surface ofinterest. Hand creams, skin oils
14、and other skin materials are notsuitable for high vacuum.1This guide is under the jurisdiction of ASTM Committee E42 on SurfaceAnalysis and is the direct responsibility of Subcommittee E42.03 on Auger ElectronSpectroscopy and X-Ray Photoelectron Spectroscopy.Current edition approved August 10, 2002.
15、 Published August 2003. Originallyapproved in 1990. Last previous edition approved in 1997 as E 1078 97.2Annual Book of ASTM Standards, Vol 03.06.3The boldface numbers in parentheses refer to the list of references at the end ofthis standard.1Copyright ASTM International, 100 Barr Harbor Drive, PO B
16、ox C700, West Conshohocken, PA 19428-2959, United States.5.4 Visual Inspection:5.4.1 A visual inspection should be made, possibly using anoptical microscope, prior to analysis. At a minimum, a checkshould be made for residues, particles, fingerprints, adhesives,contaminants or other foreign matter.5
17、.4.2 Features that are visually apparent outside the vacuumsystem may not be observable with the systems usual imagingmethod or through available viewports. It may be necessary tophysically mark the specimen outside the area to be analyzed(e.g., with scratches or a permanent ink marker) so that thea
18、nalysis location can be found once the specimen is inside thevacuum system.5.4.3 Changes that may occur during analysis may influencethe data interpretation. Following analysis, visual examinationof the specimen is recommended to look for possible effects ofsputtering, electron beam exposure, X-ray
19、exposure, orvacuum.6. Specimen Influences6.1 HistoryThe history of a specimen may affect thehandling of the surface before analysis. For example, aspecimen that has been exposed to a contaminating environ-ment may reduce the need for exceptional care if the surfacebecomes less reactive. Alternativel
20、y, the need for care mayincrease if the surface becomes toxic.6.1.1 If a specimen is known to be contaminated, preclean-ing may be warranted in order to expose the surface of interestand reduce the risk of vacuum system contamination. Ifprecleaning is desired, a suitable grade solvent should be used
21、that does not affect the specimen material. Note that even highpurity solvents may leave residues on a surface. Cleaning mayalso be accomplished using an appropriately filtered pressur-ized gas. In some instances, the contamination itself may be ofinterest, e.g., where a silicone release agent influ
22、ences adhe-sion. In these cases, no precleaning should be attempted.6.1.2 Special caution must be taken with specimens con-taining potential toxins.6.2 Information SoughtThe information sought can influ-ence the preparation of a specimen. If the information soughtcomes from the exterior surface of a
23、 specimen, greater care andprecautions in specimen preparation must be taken than if theinformation sought lies beneath an overlayer that must besputtered away in the analytical chamber. Furthermore, it mayalso be possible to expose the layer of interest by in-situfracture, cleaving, or other means.
24、6.3 Specimens Previously Examined by Other AnalyticalTechniquesIt is best if surface analysis measurements aremade before the specimen is analyzed by other analyticaltechniques because such specimens may become damaged ormay be exposed to surface contamination. For example,insulating specimens analy
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