ANSI IT9.14-1992 Imaging Media (Photographic Film and Papers) - Method for Determining the Resistance of Photographic Emulsions to Wet Abrasion (IS&T)《成象媒介(照相软片和照相纸).感光乳剂耐湿磨性的测定方法》.pdf

《ANSI IT9.14-1992 Imaging Media (Photographic Film and Papers) - Method for Determining the Resistance of Photographic Emulsions to Wet Abrasion (IS&T)《成象媒介(照相软片和照相纸).感光乳剂耐湿磨性的测定方法》.pdf》由会员分享，可在线阅读，更多相关《ANSI IT9.14-1992 Imaging Media (Photographic Film and Papers) - Method for Determining the Resistance of Photographic Emulsions to Wet Abrasion (IS&T)《成象媒介(照相软片和照相纸).感光乳剂耐湿磨性的测定方法》.pdf（14页珍藏版）》请在麦多课文档分享上搜索。

1、American National Standards Institute11 West 42nd StreetNew York, New York10036ANSI/NAPM IT9.14-1992ANSI/NAPM IT9.14-1992for Imaging Materials Photographic Films and Papers Method for Determining theResistance of PhotographicEmulsions to Wet AbrasionANSI/NAPM IT9.14-1992 (R1997)Reaffirmation and red

2、esignation of ANSI IT9.14-1992American National Standard for Imaging Materials Photographic Films and Papers Method for Determining the Resistance ofPhotographic Emulsions to Wet AbrasionSecretariatNational Association of Photographic Manufacturers, Inc.Approved July 6, 1992Reaffirmed May 13, 1997Am

3、erican National Standards Institute, Inc.AmericanNationalStandardApproval of an American National Standard requires verification by ANSIthat the requirements for due process, consensus, and other criteria forapproval have been met by the standards developer.Consensus is established when, in the judg

4、ment of the ANSI Board ofStandards Review, substantial agreement has been reached by directlyand materially affected interests. Substantial agreement means much morethan a simple majority, but not necessarily unanimity. Consensus requiresthat all views and objections be considered, and that a concer

5、ted effort bemade toward their resolution.The use of American National Standards is completely voluntary; their existence does not in any respect preclude anyone, whether he has approvedthe standards or not, from manufacturing, marketing, purchasing, or usingproducts, processes, or procedures not co

6、nforming to the standards.The American National Standards Institute does not develop standards andwill in no circumstances give an interpretation of any American NationalStandard. Moreover, no person shall have the right or authority to issue aninterpretation of an American National Standard in the

7、name of the AmericanNational Standards Institute. Requests for interpretations should be ad-dressed to the secretariat or sponsor whose name appears on the title pageof this standard.CAUTION NOTICE: This American National Standard may be revised orwithdrawn at any time. The procedures of the America

8、n National StandardsInstitute require that action be taken periodically to reaffirm, revise, or withdraw this standard. Purchasers of American National Standards mayreceive current information on all standards by calling or writing the AmericanNational Standards Institute.Published byAmerican Nation

9、al Standards Institute11 West 42nd Street, New York, New York 10036Copyright 1992 by American National Standards InstituteAll rights reserved.No part of this publication may be reproduced in anyform, in an electronic retrieval system or otherwise,without prior written permission of the publisher.Pri

10、nted in the United States of AmericaAPS1.5C992/18ContentsPageiForeword ii0 Introduction .11 Scope22 Normative reference.23 Test method.24 Reportings.55 Interpretation .5Figure1 Test apparatus for mushiness.3AnnexA Bibliography.6Foreword (This foreword is not part of American National Standard ANSI/N

11、APM IT9.14-1992 (R1997)This standard is a description of a standard test method to evaluate theresistance of photographic gelatin emulsions to abrasion when wet. Resultsare generally referred to as either “wet abrasion resistance” or “mushiness.”This test procedure was first standardized in 1972 by

12、American NationalStandards Committee on Photographic Processing, PH4, and was pub-lished in American National Standard Method for determining the resis-tance of photographic films to abrasion during processing, ANSI PH4.35-1972. This test method has since been transferred to the jurisdiction ofNAPM

13、Technical Committee IT9.The current revision was modified to include photographic paper emulsionsas well as film emulsions, and the test apparatus was made less specific toa particular design.This standard contains one annex which is informative and is not consid-ered part of this standard.Suggestio

14、ns for the improvement of this standard will be welcome. Theyshould be sent to the National Association of Photographic Manufacturers,Inc., 550 Mamaroneck Avenue, Harrison, NY 10528.This standard was processed and approved for submittal to ANSI by NAPMTechnical Committee IT9 on the Physical Properti

15、es and Permanence ofImaging Media. Committee approval of the standard does not necessarilyimply that all committee members voted for its approval. At the time thisstandard was approved, the IT9 Committee had the following members:Peter Z. Adelstein, ChairmanThomas C. Bagg, Vice-ChairmanA. Tulsi Ram,

16、 SecretaryiiOrganization Represented Name of RepresentativeAnacomp, Inc. .Donald H. KlosterboerAssociation for Information and Image Management Jean M. BaronasMarilyn Courtot (Alt.)Association of Reproduction Materials Manufacturers, Inc.Philip NowersFirst Image Management CompanyWilliam E. NealeGen

17、ealogical Society of Utah.Eric EricksonBrent Reber (Alt.)Herbert J. White, II (Alt.)Image Permanence Institute James M. ReillyDouglas Nishimura (Alt.)International Business Machines Corporation.Milap C. A. MathurCharles F. Touchton (Alt.)International Society of Photogrammetry and RemoteSensing.Lanc

18、e H. BassageLight Impressions Corporation .Dennis InchRon Emerson (Alt.)National Association of Photographic Manufacturers, Inc. Thomas J. HuttemannDavid F. Kopperl (Alt.)A. Tulsi Ram (Alt.)Harry IwanoPeter KrauseGilbert G. LeiterThomas Berthiaume (Alt.)Walter Fontani (Alt.)Robert L. SeyfertKenneth

19、M. Smith (Alt.)iiiNational Information Standards Organization (liaison) Carolyn MorrowNational Optical Astronomy Observatories .William E. SchoeningProfessional Photographers of America, Inc.Robert M. OpferSmithsonian Institution Eugene OstroffSociety for Imaging Science and Technology .Peter Z. Ade

20、lsteinU. S. Department of Commerce N.I.S.T.Thomas C. BaggCharles M. Gutman (Alt.)U. S. Department of Defense Logistics Agency .James G. WilliamsU. S. Department of the Navy. .Maurice J. StumpJoyce Pezick (Alt.)U. S. General Services Administration Federal Supply and Services .Georgia L. ApostolouU.

21、S. Library of Congress Robert E. McCombBasil Manns (Alt.)U. S. National Archives and Records Administration.Alan R. CalmesSteven Puglia (Alt.)Individual MemberKlaus B. HendriksOrganization Represented Name of Representative0 IntroductionThe gelatin emulsion of photographic materialsmay be damaged by

22、 abrasion during process-ing, if the emulsion is rubbed against any sta-tionary part of a processing machine. Abrasioncan also occur when film or paper is processedin a tray by hand and the gelatin layers are softenough to be gouged by foreign particles, cor-ners, or fingernails.When wet, emulsions

23、are usually more susceptible to abrasion than when dry. Wetemulsions and gelatin backings are also moresusceptible to abrasion than the support materials. The test method in this standard isapplicable only to such wet emulsions orgelatin layers. For dry scratch resistance seeAmerican National Standa

24、rd for ImagingMaterials Processed Photographic Film Methods for Determining Scratch Resistance,ANSI/NAPM IT9.22-1996.Photographic emulsions and gelatin layersshow physical changes with time. The resis-tance of these layers to wet abrasion dependson the inherent properties built-in at manufac-ture an

25、d the treatment received in the drystate prior to processing, as the temperatureat which a gelatin layer is stored and its mois-ture content during storage may affect itsresistance to wet abrasion.The susceptibility to abrasion during process-ing depends not only on the inherent charac-teristics of

26、the emulsion, but also on the typesof processing solutions, temperatures, andimmersion times. These are described inParker, J. T. and Sugden, L. J. Determiningthe resistance of photographic emulsions todamage during processing. PhotographicScience and Engineering, 7:41-47; Jan-Feb1963. In determinin

27、g emulsion resistance toabrasion, these factors must be carefully con-trolled.The results of wet abrasion, or mushinesstests, are most significant if consideration isgiven to the final usage of the particular mate-rial. For instance, some films are viewed whilewet, although usually films and photogr

28、aphicprints are dried prior to viewing or other fur-ther use. Some materials may show less abra-sion damage when examined after drying,than when examined wet. The most appropri-ate rating method must be chosen, and it mustbe clearly stated in the results.This test method provides an excellent meanso

29、f comparing emulsions of different ages,types, processing solutions, processingimmersion times and temperatures, and theeffects of post-processing treatments.However, many factors are involved in theequipment and technique in either continuous,tank, or tray processing which cannot be con-sidered in

30、a test procedure. Analysis of abra-sion resistance in a particular processing sys-tem can only be made in the processing sys-tem under consideration. This test method hasalso been used to measure the change in thephysical integrity of the gelatin-emulsion layerafter normal or accelerated aging. For

31、thispurpose, the wet abrasion (mushiness) ismeasured when the emulsion is immersed indistilled water.1American National Standardfor Imaging Materials Photographic Films and Papers Method for Determining theResistance of PhotographicEmulsions to Wet AbrasionAMERICAN NATIONAL STANDARD ANSI/NAPM IT9.14

32、-1992 (R1997)it can be lowered onto the specimen andthereby scribe a line on it when the specimentray travels along under the stylus.2)The sty-lus shall make perpendicular contact with thespecimen in the tray of solution. A 0.38-mm(0.015-in) radius stylus should be used foremulsions on photographic

33、film base, and a0.20 mm (0.008-in) radius stylus for emul-sions on photographic paper base; The stylus arm shall be counterbalancedso that when the stylus arm is lowered andthe stylus rests on the emulsion surface,there is no load on the stylus.3.1.2 Equipment designThe equipment may be constructed

34、in eitherof two formats: a) a constant load instrument; orb) a continuous load instrument.In the constant load instrument, the weightsare added directly to a pan and the apparatusshall be designed so that the center of gravityof the weights will be positioned directly overthe stylus. These weights s

35、hould range from 1to 210 grams. The arm may be pivoted on athreaded hinge with a knurled knob, or otherprovision for positioning the stylus laterally, sothat many parallel scribe lines can be madeon the same specimen. As an alternative, thespecimen holder can be provided with lateralpositioning and

36、a simple pivot used on the sty-lus arm.Alternatively, the continuous loading equip-ment (illustrated in figure 1) can be used.3)When the arm is lowered, the sliding weight isengaged by the carriage so that when the slid-ing carriage with the tray is moved away fromthe fulcrum of the arm, the weight

37、slides withit. This produces an increasing weight on the stylus point as the tray moves with the carriage. This weight increases from 0 to70 grams, as the carriage moves its full travelof 180 mm. To increase the range of the1 Scope1.1 This standard establishes a laboratorytest method for determining

38、 the resistance ofphotographic emulsions or gelatin backings toabrasion damage during processing.1.2 This method may be used to determinethe effects of variations in processing solu-tions, gelatin layer properties, processingsolution temperatures and times, or a combi-nation of these factors on the

39、wet scratchresistance of gelatin layers.1.3 This method is applicable in the determi-nation of the physical integrity of photographicemulsions when wet.1.4 This measurement is not applicable forevaluation of support scratch resistance.2 Normative referenceParker, J.T. and Sugden, L.J. Determining th

40、eresistance of photographic emulsions to dam-age during processing. Photographic Scienceand Engineering, 7:41-47; Jan-Feb 1963.3 Test method3.1 Apparatus3.1.1 Component partsThe apparatus shall consist of the followingelements: A specimen tray in which the specimencan be immersed in either distilled

41、 water or aprocessing solution. The tray shall be free tomove smoothly in a horizontal plane for adistance of at least 30 mm without sidewaysdisplacement. The tray may be either manu-ally operated or power driven; A spherical sapphire or diamond stylus1)mounted at the end of a pivoted arm, so thatAN

42、SI/NAPM IT9.14-1992 (R1997)21)It is very important that the stylus is smooth and has a uniform radius. Sapphire styli may be obtained froma lapidary company, such as the Moser Jewel Company, 542 Fayette Street, Perth Amboy, NJ 08862 or asupplier of phonographic equipment. Although diamond styli have

43、 low friction properties in the dry state, theyare satisfactory in this wet application. Diamond styli will wear better than sapphire in high usage circum-stances. Diamond styli that have been satisfactory are those compounded from diamond particles such asthose manufactured by Bruce Diamond Corp.,

44、Box 420, 1231 County St., Attleboro, MA 02703.2)The test apparatus for dry scratch resistance, described in ANSI/NAPM IT9.14, may be modified for this test.3)If detailed drawings are required for the construction of this apparatus, they may be purchased through theSecretariat.ANSI/NAPM IT9.14-1992 (

45、R1997)3If the continuous loading apparatus (shown infigure 1) is used, the position of the stylusshall be marked on the test specimen prior tothe movement of the tray. The distance thatthe tray moves is directly proportional to theload on the stylus caused by the slidingweight. If no evidence of abr

46、asion can be seen bytransmitted light, additional weights shall beadded above the stylus until abrasion occurs.The total weight on the stylus is the sum ofthis additional weight and that caused by thesliding weight. The maximum weight added tothe stylus shall be 150 grams. Three scratchlines shall b

47、e made for each specimen.To test a sample in a solution that is one of asequence of processing solutions, the filmshall be immersed in each of the precedingprocessing solutions for the normal timesbefore being placed in the solution in whichabrasion is to be evaluated. For example, anemulsion being

48、tested in wash water shouldreceive its usual developing, fixing, etc., priorto being placed in the wash water for abrasionby the stylus.6)3.4 RatingThe wet abrasion resistance, or mushinessvalue, is the weight in grams on the styluswhich causes it to dig into the emulsion layer.The rating may be mad

49、e by reflected, or trans-mitted light. Specimens may be rated eitherwet or after drying. It may be desirable to con-tinue the normal processing sequence to com-pletion after abrasion before rating. Thesechoices are dictated by the type of investiga-tion.On some surfaces, the stylus frequently skipsalong after the first penetration. Where nocontinuous abrasion line is found after the firstpenetration, a rating shall be made for the firstdetectable damage and another rating for theapparatus, additional weights of 50, 100, and150 grams can be screwed onto the thread