EN 62047-13-2012 en Semiconductor devices - Micro-electromechanical devices - Part 13 Bend- and shear - type test methods of measuring adhesive strength for MEMS structures《半导体器件 微.pdf
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1、raising standards worldwideNO COPYING WITHOUT BSI PERMISSION EXCEPT AS PERMITTED BY COPYRIGHT LAWBSI Standards PublicationSemiconductor devices Micro-electromechanical devicesPart 13: Bend- and shear- type test methods of measuring adhesive strength for MEMS structuresBS EN 62047-13:2012National for
2、ewordThis British Standard is the UK implementation of EN 62047-13:2012. It isidentical to IEC 62047-13:2012.The UK participation in its preparation was entrusted to Technical CommitteeEPL/47, Semiconductors.A list of organizations represented on this committee can be obtained onrequest to its secre
3、tary.This publication does not purport to include all the necessary provisions of acontract. Users are responsible for its correct application. The British Standards Institution 2012Published by BSI Standards Limited 2012ISBN 978 0 580 69450 9ICS 31.080.99Compliance with a British Standard cannot co
4、nfer immunity fromlegal obligations.This British Standard was published under the authority of the StandardsPolicy and Strategy Committee on 31 May 2012.Amendments issued since publicationAmd. No. Date Text affectedBRITISH STANDARDBS EN 62047-13:2012EUROPEAN STANDARD EN 62047-13 NORME EUROPENNE EURO
5、PISCHE NORM April 2012 CENELEC European Committee for Electrotechnical Standardization Comit Europen de Normalisation Electrotechnique Europisches Komitee fr Elektrotechnische Normung Management Centre: Avenue Marnix 17, B - 1000 Brussels 2012 CENELEC - All rights of exploitation in any form and by
6、any means reserved worldwide for CENELEC members. Ref. No. EN 62047-13:2012 E ICS 31.080.99 English version Semiconductor devices - Micro-electromechanical devices - Part 13: Bend- and shear- type test methods of measuring adhesive strength for MEMS structures (IEC 62047-13:2012) Dispositifs semicon
7、ducteurs - Dispositifs microlectromcaniques - Partie 13: Mthodes dessais de types courbure et cisaillement de mesure de la rsistance dadhrence pour les structures MEMS (CEI 62047-13:2012) Halbleiterbauelemente - Bauelemente der Mikrosystemtechnik - Teil 13: Biege- und Scherprfverfahren zur Messung d
8、er Haftfestigkeit bei MEMS-Strukturen (IEC 62047-13:2012) This European Standard was approved by CENELEC on 2012-04-03. CENELEC members are bound to comply with the CEN/CENELEC Internal Regulations which stipulate the conditions for giving this European Standard the status of a national standard wit
9、hout any alteration. Up-to-date lists and bibliographical references concerning such national standards may be obtained on application to the CEN-CENELEC Management Centre or to any CENELEC member. This European Standard exists in three official versions (English, French, German). A version in any o
10、ther language made by translation under the responsibility of a CENELEC member into its own language and notified to the CEN-CENELEC Management Centre has the same status as the official versions. CENELEC members are the national electrotechnical committees of Austria, Belgium, Bulgaria, Croatia, Cy
11、prus, the Czech Republic, Denmark, Estonia, Finland, France, Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, the Netherlands, Norway, Poland, Portugal, Romania, Slovakia, Slovenia, Spain, Sweden, Switzerland, Turkey and the United Kingdom. BS EN 62047-13:2012
12、EN 62047-13:2012 - 2 - Foreword The text of document 47F/109/FDIS, future edition 1 of IEC 62047-13, prepared by SC 47F, “Micro-electromechanical systems“, of IEC TC 47, “Semiconductor devices“ was submitted to the IEC-CENELEC parallel vote and approved by CENELEC as EN 62047-13:2012. The following
13、dates are fixed: latest date by which the document has to be implemented at national level by publication of an identical national standard or by endorsement (dop) 2013-01-03 latest date by which the national standards conflicting with the document have to be withdrawn (dow) 2015-04-03 Attention is
14、drawn to the possibility that some of the elements of this document may be the subject of patent rights. CENELEC and/or CEN shall not be held responsible for identifying any or all such patent rights. Endorsement notice The text of the International Standard IEC 62047-13:2012 was approved by CENELEC
15、 as a European Standard without any modification. BS EN 62047-13:2012- 3 - EN 62047-13:2012 Annex ZA (normative) Normative references to international publications with their corresponding European publications The following documents, in whole or in part, are normatively referenced in this document
16、 and are indispensable for its application. For dated references, only the edition cited applies. For undated references, the latest edition of the referenced document (including any amendments) applies. NOTE When an international publication has been modified by common modifications, indicated by (
17、mod), the relevant EN/HD applies. Publication Year Title EN/HD Year IEC 62047-2 2006 Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing methods of thin film materials EN 62047-2 2006 BS EN 62047-13:2012 2 62047-13 IEC:2012 CONTENTS 1 Scope . 5 2 Normative references .
18、5 3 Terms and definitions . 5 4 Test method . 6 4.1 General . 6 4.2 Data analysis 7 5 Test equipment . 8 5.1 General . 8 5.2 Actuator 8 5.3 Force measurement sensor . 8 5.4 Alignment system 8 5.5 Recorder . 8 6 Test pieces . 9 6.1 Design of test pieces . 9 6.2 Preparation of test pieces 9 7 Test con
19、ditions . 9 7.1 Method for gripping . 9 7.2 Speed of testing 9 7.3 Alignment of test piece 9 7.4 Test environment. 10 8 Test report 10 Annex A (informative) Technical background . 11 Bibliography 14 Figure 1 Columnar test pieces . 6 Figure 2 Adhesive strength test method . 7 Figure 3 Alignment betwe
20、en columnar test piece and loading tool 10 Figure A.1 Example of the RRT results (see 1) 11 Figure A.2 Effects of aspect ratio of columnar test piece on the stress condition in bend type test (see 2) . 12 Figure A.3 Effects of knife edge angle of loading tool and aspect ratio of columnar test piece
21、on the stress condition in bend test . 13 BS EN 62047-13:201262047-13 IEC:2012 5 SEMICONDUCTOR DEVICES MICRO-ELECTROMECHANICAL DEVICES Part 13: Bend - and shear - type test methods of measuring adhesive strength for MEMS structures 1 Scope This part of IEC 62047 specifies the adhesive testing method
22、 between micro-sized elements and a substrate using the columnar shape of the specimens. This international standard can be applied to adhesive strength measurement of microstructures, prepared on a substrate, with width and thickness of 1 m to 1 mm, respectively. Micro-sized elements of MEMS device
23、s are made up of laminated fine pattern films on a substrate, which are fabricated by deposition, plating, and/or coating with photolithography. MEMS devices include a large number of interfaces between dissimilar materials, at which delamination occasionally occurs during fabrication or in operatio
24、n. Combination of the materials at the junction determines the adhesive strength; moreover, defects and residual stress in the vicinity of the interface, which are changing by processing condition, strongly affect the adhesive strength. This standard specifies the adhesive testing method for micro-s
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