DIN ISO 10110-14-2008 Optics and photonics - Preparation of drawings for optical elements and systems - Part 14 Wavefront deformation tolerance (ISO 10110-14 2007) English version .pdf

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1、December 2008DEUTSCHE NORM English price group 10No part of this standard may be reproduced without prior permission ofDIN Deutsches Institut fr Normung e. V., Berlin. Beuth Verlag GmbH, 10772 Berlin, Germany,has the exclusive right of sale for German Standards (DIN-Normen).ICS 01.100.20; 37.020!$TV

2、b“1495163www.din.deDDIN ISO 10110-14Optics and photonics Preparation of drawings for optical elements and systems Part 14: Wavefront deformation tolerance (ISO 10110-14:2007)English version of DIN ISO 10110-14:2008-12Optik und Photonik Erstellung von Zeichnungen fr optische Elemente und Systeme Teil

3、 14: Toleranzen fr Wellenfrontdeformationen (ISO 10110-14:2007)Englische Fassung DIN ISO 10110-14:2008-12supersedesDIN ISO 10110-14:2004-02www.beuth.deDocument comprises 15 pages14999-4:2008-12,Together with DIN ISO2 Contents Page National foreword 2 National Annex NA (informative) Bibliography 3 In

4、troduction.5 1 Scope 6 2 Normative references 6 3 Terms and definitions .6 4 Specification of tolerances for wavefront deformation.7 4.1 General7 4.2 Units 7 4.3 Wavelength.7 4.4 Target aberrations .7 4.5 Cemented (or optically contacted) elements7 5 Indication in drawings.8 5.1 General8 5.2 Code nu

5、mber9 5.3 Form of the indication .9 5.4 Location. 10 5.5 Indication of illumination . 11 5.6 Specification of the image point location 12 5.7 Indication of target aberrations. 12 6 Examples of tolerance indications . 12 Bibliography. 15 National foreword This standard has been prepared by Technical

6、Committee ISO/TC 172 “Optics and photonics”, Subcommittee SC 1 “Fundamental standards” (Secretariat: DIN, Germany). The responsible German body involved in its preparation was the Normenausschuss Feinmechanik und Optik (Optics and Precision Mechanics Standards Committee), Technical Committee NA 027-

7、01-02 AA Grund-normen der Optik. DIN ISO 10110-14 is part of a series of standards dealing with the preparation of drawings for optical elements and systems (see Bibliography). Attention is drawn to the fact that the DIN ISO 10110 series replaces a similar series of German standards, the DIN 3140 se

8、ries, which differs from the ISO standards in terms of structure and presentation. DIN ISO 10110 Supplement 1 lists the differences between the DIN ISO 10110 standards series and the DIN 3140 series. The DIN Standards corresponding to the International Standards referred to in this document are as f

9、ollows: ISO 10110-1 DIN ISO 10110-1 ISO 14999-4 DIN ISO 14999-4 DIN ISO 10110-14:2008-12 3 Amendments a) Some terms have been modified: “sagitta error” has been replaced by “sagitta deviation”, “rotationally symmetric irregularity” has been replaced by “rotationally invariant irregularity”, “rms wav

10、efront asymmetry” has been replaced by “rms rotationally varying wavefront deviation”. b) Subclause 4.2 “Units”: The unit “nanometre” or “nm” has been introduced where appropriate in the text. c) The following clauses/subclauses have been transferred to ISO 14999-4 or have been deleted: Clause 3: Te

11、rms and definitions Clause 5: Non-circular test areas Annex A: Digital interferogram analysis (deleted) Annex B: Visual interferogram analysis d) International Standard ISO 10110-14:2007 has been adopted. Previous editions DIN ISO 10110-14: 2004-02 National Annex NA (informative) Bibliography DIN EN

12、 ISO 7944, Optics and optical instruments Reference wavelengths DIN ISO 10110-1, Optics and photonics Preparation of drawings for optical elements and systems Part 1: General DIN ISO 10110-2, Optics and optical instruments Preparation of drawings for optical elements and systems Part 2: Material imp

13、erfections Stress birefringence DIN ISO 10110-3, Optics and optical instruments Preparation of drawings for optical elements and systems Part 3: Material imperfections; Bubbles and inclusions DIN ISO 10110-4, Optics and optical instruments Preparation of drawings for optical elements and systems Par

14、t 4: Material imperfections; Inhomogenity and striae DIN ISO 10110-5, Optics and photonics Preparation of drawings for optical elements and systems Part 5: Surface form tolerances DIN ISO 10110-5 Supplement 1, Optics and optical instruments Preparation of drawings for optical elements and systems Pa

15、rt 5: Surface form tolerances Surface form tolerance inspection using testing glasses DIN ISO 10110-14:2008-12 This standard differs from DIN ISO 10110-14:2004-02 as follows: 4 DIN ISO 10110-6, Optics and optical instruments Preparation of drawings for optical elements and systems Part 6: Centring t

16、olerances DIN ISO 10110-7, Optics and photonics Preparation of drawings for optical elements and systems Part 7: Surface imperfection tolerances DIN ISO 10110-8, Optics and optical instruments Preparation of drawings for optical elements and systems Part 8: Surface texture DIN ISO 10110-9, Optics an

17、d optical instruments Preparation of drawings for optical elements and systems Part 9: Surface treatment and coating DIN ISO 10110-10, Optics and photonics Preparation of drawings for optical elements and systems Part 10: Table representing data of optical elements and cemented assemblies DIN ISO 10

18、110-11, Optics and optical instruments Preparation of drawings for optical elements and systems Part 11: Non-toleranced data DIN ISO 10110-12, Optics and photonics Preparation of drawings for optical elements and systems Part 12: Aspheric surfaces DIN ISO 10110-17, Optics and photonics Preparation o

19、f drawings for optical elements and systems Part 17: Laser irradiation damage threshold DIN ISO 10110 Supplement 1, Optics and optical instruments Preparation of drawings for optical elements and systems Comparison DIN ISO 10110 DIN 3140; index DIN ISO 14999-4, Optics and photonics Interferometric m

20、easurement of optical elements and optical systems Part 4: Interpretation and evaluation of tolerances specified in ISO 10110 DIN Taschenbuch 304, Technische Produktdokumentation Erstellung von Zeichnungen fr optische Systeme und Elemente (Technical product documentation Preparation of drawings for

21、optical elements and systems) DIN ISO 10110-14:2008-12 Introduction This part of ISO 10110 makes it possible to specify a functional tolerance for the performance (expressed as single-pass wavefront deformation) of an optical system, which may have optical power or contain powered optical elements.

22、This tolerance therefore includes the effect of surface form deformations, inhomogeneities, and possible interactions among the various individual errors. It should be noted that it is possible to specify a tolerance on the wavefront deformation only, without specifying tolerances on the individual

23、surfaces. In this case, the manufacturer must ensure that the wavefront satisfies the specified tolerance, but is not bound by tolerances on the form of the individual surfaces of the element, and is free, for instance, to allow the surface form deformations to be large provided they cancel each oth

24、er. It is also possible to supply a tolerance for the wavefront deformation, according to this part of ISO 10110, in addition to tolerances on the form of the individual surfaces and/or inhomogeneity (according to ISO 10110-5 and ISO 10110-4, respectively). In this case, the manufacturer must ensure

25、 that all of the individual tolerances (surface deformations and inhomogeneity) are upheld, as well as ensuring that the wavefront is of the specified quality. Optical elements are often tested in a “double-pass” configuration, in which the wavefront passes through or, in the case of reflective opti

26、cs, reflects from the element under test twice, as shown in ISO/TR 14999-1:2005, Figure 18. In the case of double-pass testing, the additional wavefront deformation caused by the second transmission through the element must be accounted for when comparing the measurement results with the specified t

27、olerances. If the wavefront is not severely deformed by passing once through the element under test, and reflects from a high quality mirror, so that it returns through the identical portion of the test element to the interferometer, then the observed deformation of the wavefront is twice the (singl

28、e-pass) wavefront deformation (defined in 3.2.3 of ISO 14999-4:2007). That is, the wavefront deformation is one-half the observed wavefront deformation. If the wavefront is severely deformed by the element under test, then the individual rays do not pass through the same positions in the element und

29、er test on their return path, and the wavefront deformation is not exactly twice that of the single path case. If the measurement wavelength is not the specification wavelength, care must be taken. At least the wavefront deformation is to be recalculated. 5 DIN ISO 10110-14:2008-12 Optics and photon

30、ics Preparation of drawings for optical elements and systems Part 14: Wavefront deformation tolerance 1 Scope The ISO 10110 series applies to the presentation of design and functional requirements for optical elements and assemblies in technical drawings used for manufacturing and inspection. This p

31、art of ISO 10110 gives rules for the indication of the permissible deformation of a wavefront transmitted through or, in the case of reflective optics, reflected from an optical element or assembly. The deformation of the wavefront refers to its departure from the desired shape. The tilt of the wave

32、front with respect to a given reference surface is excluded from the scope of this part of ISO 10110. There is no requirement that a tolerance for wavefront deformation be indicated. If such a tolerance is specified, it does not take precedence over a tolerance for the surface form according to ISO

33、10110-5. If tolerances for both the surface form and the wavefront deformation are given, they must both be upheld. 2 Normative references The following referenced documents are indispensable for the application of this document. For dated references, only the edition cited applies. For undated refe

34、rences, the latest edition of the referenced document (including any amendments) applies. ISO 10110-1:2006, Optics and photonics Preparation of drawings for optical elements and systems Part 1: General ISO/TR 14999-2, Optics and photonics Interferometric measurement of optical elements and optical s

35、ystems Part 2: Measurement and evaluation techniques ISO 14999-4:2007, Optics and photonics Interferometric measurement of optical elements and optical systems Part 4: Interpretation and evaluation of tolerances specified in ISO 10110 3 Terms and definitions For the purposes of this document, the te

36、rms and definitions given in ISO 14999-4 apply. NOTE ISO 14999-4 provides the definitions for all the deformation functions. 6 DIN ISO 10110-14:2008-12 4 Specification of tolerances for wavefront deformation 4.1 General The tolerances for wavefront deformation are indicated by specifying the maximum

37、 permissible values of the sagitta deviation, irregularity, and/or rotationally invariant irregularity. In addition, tolerances for three root-mean-square measures of wavefront deformation (rms total, rms irregularity and rms rotationally varying wavefront deviation) may be specified. See 3.3 of ISO

38、 14999-4:2007 for definitions. NOTE 1 The sagitta deviation is meaningful only when the location of the image is specified. If the location of the image is unspecified, the sagitta deviation is defined to be zero. NOTE 2 Methods for determining the amount of sagitta deviation, irregularity and rotat

39、ionally invariant irregularity of a given wavefront are given in ISO 14999-4. It is not necessary that tolerances be specified for all types of wavefront deformation. 4.2 Units The maximum permissible values for sagitta deviation, irregularity, rotationally invariant irregularity and, if applicable,

40、 any target aberrations should be specified in units of nanometres. If wavelengths are to be used, the wavelength shall also be indicated on the drawing.N1)NOTE 1 These quantities are defined with reference to a wavefront passing once through the element under test (single-pass). If a specification

41、is to be given for one or more rms wavefront deformation types, the specification shall also be in units of nanometres or wavelengths (single-pass, see NOTE 1). NOTE 2 One “wavelength“ is 1 the wavelength (in nanometres) in which the wavefront deformation is specified. NOTE 3 The specification of a

42、tolerance for an rms deformation type requires that the optical system be analysed digitally. 4.3 Wavelength If wavelength units are to be used, the wavelength shall also be indicated on the drawing in order to reduce confusion. If none is provided, the wavelength is assumed to be 546,07 nm. 4.4 Tar

43、get aberrations Frequently, the nominal theoretical wavefront is spherical or planar. In some cases, to allow for the presence of small amounts of residual aberration in the design of an optical system, non-zero target values may be specified for polynomial aberration types. 4.5 Cemented (or optical

44、ly contacted) elementsN2)If two or more optical elements are to be cemented (or optically contacted), the wavefront deformation tolerances given for the individual elements apply also for the elements after assembly, i.e. after cementing (or optically contacting), unless otherwise specified. See 4.8

45、.3 of ISO 10110-1:2006. N1) National footnote: The test wavelength is to be given even when indicating wavefront deformation tolerances in nanometres. If not indicated, the following applies: Reference wavelength 546,07 nm as in 4.3. N2) National footnote: This clause does not have general applicati

46、on. 7 DIN ISO 10110-14:2008-12 5 Indication in drawings 5.1 General In all cases in which a tolerance for wavefront deformation is to be indicated, the optical axis of the element shall be indicated on the drawing according to 4.2 of ISO 10110-1:2006. The location of the stop surface or pupil shall

47、be indicated according to 5.3 of ISO 10110-1:2006. See Figure 1. The tolerance for wavefront deformation shall be indicated by a code number (see 5.2) and the tolerances for sagitta deviation, irregularity, rotationally invariant irregularity and rms deformation types shall be indicated as appropria

48、te (see 5.3). Wavefront deformation should be specified in nanometres. However if wavelength units are to be used, the wavelength should also be indicated. All quantities shall have their units specified. If no unit is indicated then wavelength units are implied. No provision is given for the specif

49、ication of a PV-tolerance for the total wavefront deformation (that is, including both the sagitta deviation and the irregularity). If such a specification is necessary, this information shall be given in a note on the drawing, for example: “Total wavefront deformation shall not exceed 0,25 wavelengths” or “Total wavefront deformation shall not exceed 150 nm.” NOTE Such a specification might, for example, be useful for optical elements to be used in interferometers. See Clause 6 for examples