ASTM D5544-2016 Standard Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water《在线测量高纯度水蒸发后残留的标准试验方法》.pdf
《ASTM D5544-2016 Standard Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water《在线测量高纯度水蒸发后残留的标准试验方法》.pdf》由会员分享,可在线阅读,更多相关《ASTM D5544-2016 Standard Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water《在线测量高纯度水蒸发后残留的标准试验方法》.pdf(10页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: D5544 11D5544 16Standard Test Method forOn-Line Measurement of Residue After Evaporation of High-Purity Water1This standard is issued under the fixed designation D5544; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, t
2、he year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 This test method covers the determination of dissolved organic and inorganic matter and colloidal material
3、found inhigh-purity water used in the semiconductor, and related industries. This material is referred to as residue after evaporation (RAE).The range of the test method is from 0.001 g/L(ppb) g/L (ppb) to 60 g/L (ppb).1.2 This test method uses a continuous, real time monitoring technique to measure
4、 the concentration of RAE. A pressurizedsample of high-purity water is supplied to the test methods apparatus continuously through ultra-clean fittings and tubing.Contaminants from the atmosphere are therefore prevented from entering the sample. General information on the test method anda literature
5、 review on the continuous measurement of RAE has been published.21.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.mathematical conversions to inch-pound units that are provided for information only and are not considered s
6、tandard.1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibilityof the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatorylimitations prior to use. For spec
7、ific hazards statements, see Section 8.2. Referenced Documents2.1 ASTM Standards:3D1129 Terminology Relating to WaterD2777 Practice for Determination of Precision and Bias of Applicable Test Methods of Committee D19 on WaterD3370 Practices for Sampling Water from Closed ConduitsD3864 Guide for On-Li
8、ne Monitoring Systems for Water AnalysisD3919 Practice for Measuring Trace Elements in Water by Graphite Furnace Atomic Absorption SpectrophotometryD5127 Guide for Ultra-Pure Water Used in the Electronics and Semiconductor IndustriesE1184 Practice for Determination of Elements by Graphite Furnace At
9、omic Absorption Spectrometry3. Terminology3.1 DefinitionsFor definitions of terms used in this test method, refer to Terminology D1129.3.2 Definitions of Terms Specific to This Standard:3.2.1 aerosol, nany solid or liquid particles, with a nominal size range from 10 nm to 100 m, suspended in a gas (
10、usuallyair).3.2.2 colloidal suspension, nany material in suspension (for example, silica) with a nominal particle size less than 100 nm.3.2.3 Water-based condensation particle counter (WCPC), ninstrument for detecting very small aerosol particles in a sizerange from approximately 7 nm to 2 to 3 m.1
11、This test method is under the jurisdiction of ASTM Committee D19 on Water and is the direct responsibility of Subcommittee D19.03 on Sampling Water andWater-Formed Deposits, Analysis of Water for Power Generation and Process Use, On-Line Water Analysis, and Surveillance of Water.Current edition appr
12、oved May 1, 2011June 1, 2016. Published May 2011June 2016. Originally approved in 1994. Last previous edition approved in 20052011 asD5544 05.D5544 11. DOI: 10.1520/D5544-11.10.1520/D5544-16.2 Blackford, D. B., “Use of Nonvolatile Residue Monitoring in Semiconductor Water Applications” Ultrapure Wat
13、er Journal, November 2008 pp 16-23 Published by TallOaks PublishingBlackford, D. B., “Use of Nonvolatile Residue Monitoring in Semiconductor WaterApplications” Ultrapure Water Journal, Tall Oaks Publishing, November2008, pp. 1623.3 For referencedASTM standards, visit theASTM website, www.astm.org, o
14、r contactASTM Customer Service at serviceastm.org. For Annual Book of ASTM Standardsvolume information, refer to the standards Document Summary page on the ASTM website.This document is not an ASTM standard and is intended only to provide the user of an ASTM standard an indication of what changes ha
15、ve been made to the previous version. Becauseit may not be technically possible to adequately depict all changes accurately, ASTM recommends that users consult prior editions as appropriate. In all cases only the current versionof the standard as published by ASTM is to be considered the official do
16、cument.Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States13.2.3.1 DiscussionThe WCPC cannot differentiate among particles of varying size within this size range; the counter reports the number of particleswith a size greater than that de
17、fined by the detection-efficiency curve. Detection is independent of particle composition.3.2.4 detection effciency, nin this test method, detection efficiency represents a curve relating particle size to a countersability to detect that size.3.2.5 polydisperse, adja type of size population, in this
18、 case of aerosol particles, composed of many different sizes; theopposite of monodisperse, which is a type of size distribution of just one size.3.2.6 realtime, nthe time that an event is occurring plus the response time.3.2.6.1 DiscussionIn this case, the response time is 3 to 5 min, therefore, con
19、tamination is recorded 3 to 5 min after it occurs.3.2.7 residue after evaporation, ncontaminants remaining after all water is evaporated; sometimes known as nonvolatileresidue or total dissolved and suspended solids.4. Summary of Test Method4.1 This test method consists of continuously removing a re
20、presentative sample of high-purity water from a pressurized supplyline (refer to Practices D3370, Practice C on Continual Sampling, and Practice D3864). The temperature of the incominghigh-purity water should ideally be at room temperature, but not more than 50C.Anebulizer is supplied with the high-
21、purity waterat a constant flow rate, and a source of compressed air, or nitrogen, at a constant flow rate and pressure, to generate a stable aerosolof high-purity water droplets. Under these conditions, the nebulizer produces a polydisperse size distribution of droplets with amedian size of approxim
22、ately 1 m, and a concentration of approximately 107 droplets/s, or 1012 droplets/mL4.2 The droplets are heated at 120C. . After the heating, additional compressed air or nitrogen is introduced from the supplyto prevent re-condensation and to quickly move the residue particles to the Water-based Cond
23、ensation Particle Counter (WCPC).4.3 The WCPC works as follows: Residue particles pass through a region called the Saturator (see Fig. 1) where the residueparticles are saturated with water vapor and temperature equilibrated. The residue particles and water vapor then pass into a regioncalled the Gr
24、owth Tube, where the wetted walls of the porous media are heated to raise vapor pressure. The high diffusivity of thevapor allows it to reach the center of the sample stream at a faster rate than the thermal diffusivity of the vapor can equilibrateto the higher temperatures near the walls, resulting
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