ASTM E984-2012 red 5625 Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy《用俄歇电子能谱法鉴别化学效应和基体效应的标准指南》.pdf
《ASTM E984-2012 red 5625 Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy《用俄歇电子能谱法鉴别化学效应和基体效应的标准指南》.pdf》由会员分享,可在线阅读,更多相关《ASTM E984-2012 red 5625 Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy《用俄歇电子能谱法鉴别化学效应和基体效应的标准指南》.pdf(6页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: E984 06E984 12Standard Guide forIdentifying Chemical Effects and Matrix Effects in AugerElectron Spectroscopy1This standard is issued under the fixed designation E984; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, th
2、e year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 This guide outlines the types of chemical effects and matrix effects which are observed in Auger electron sp
3、ectroscopy.1.2 Guidelines are given for the reporting of chemical and matrix effects in Auger spectra.1.3 Guidelines are given for utilizing Auger chemical effects for identification or characterization.1.4 This guide is applicable to both electron excited and X-ray excited Auger electron spectrosco
4、py.1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibilityof the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatorylimitations prior to use.2. Referenced
5、Documents2.1 ASTM Standards:2E673 Terminology Relating to Surface Analysis (Withdrawn 2012)3E827 Practice for Identifying Elements by the Peaks in Auger Electron SpectroscopyE983 Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron SpectroscopyE996 Practice for Reporting Data in Aug
6、er Electron Spectroscopy and X-ray Photoelectron Spectroscopy2.2 Other Documents:ISO 18118:2004 Surface Chemical AnalysisAuger Electron Spectroscopy and X-ray Photoelectron SpectroscopyGuide tothe Use of Experimentally Determined Relative Sensitivity Factors for the Quantitative Analysis of Homogeno
7、us Materials3. Terminology3.1 Terms used in Auger electron spectroscopy are defined in Terminology E673.4. Significance and Use4.1 Auger electron spectroscopy is often capable of yielding information concerning the chemical and physical environment ofatoms in the near-surface region of a solid as we
8、ll as giving elemental and quantitative information. This information is manifestedas changes in the observed Auger electron spectrum for a particular element in the specimen under study compared to the Augerspectrum produced by the same element when it is in some reference form. The differences in
9、the two spectra are said to be dueto a chemical effect or a matrix effect. Despite sometimes making elemental identification and quantitative measurements moredifficult, these effects in the Auger spectrum are considered valuable tools for characterizing the environment of the near-surfaceatoms in a
10、 solid.5. Defining Auger Chemical Effects and Matrix Effects5.1 In general, Auger chemical and matrix effects may result in (a) a shift in the energy of an Auger peak, (b) a change in theshape of an Auger electron energy distribution, (c) a change in the shape of the electron energy loss distributio
11、n associated with1 This guide is under the jurisdiction of ASTM Committee E42 on Surface Analysis and is the direct responsibility of Subcommittee E42.03 on Auger ElectronSpectroscopy and X-Ray Photoelectron Spectroscopy.Current edition approved Nov. 1, 2006Nov. 1, 2012. Published November 2006Decem
12、ber 2012. Originally approved in 1984. Last previous edition approved in 20012006as E984 95 (2001).E984 06. DOI: 10.1520/E0984-06.10.1520/E0984-12.2 For referencedASTM standards, visit theASTM website, www.astm.org, or contactASTM Customer Service at serviceastm.org. For Annual Book of ASTM Standard
13、svolume information, refer to the standards Document Summary page on the ASTM website.3 The last approved version of this historical standard is referenced on www.astm.org.This document is not an ASTM standard and is intended only to provide the user of an ASTM standard an indication of what changes
14、 have been made to the previous version. Becauseit may not be technically possible to adequately depict all changes accurately, ASTM recommends that users consult prior editions as appropriate. In all cases only the current versionof the standard as published by ASTM is to be considered the official
15、 document.Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States1anAuger peak, or (d) a change in theAuger signal strengths of anAuger transition. The above changes may be due to the bondingor chemical environment of the element (chemical ef
16、fect) or to the distribution of the element or compound within the specimen(matrix effect).5.2 The Auger chemical shift is one of the most commonly observed chemical effects. A comparison can be made to the morefamiliar chemical shifts in XPS (X-ray photoelectron spectroscopy) photoelectron lines, w
17、here energy shifts are caused by changesin the ionic charge on an atom, the lattice potential at that atomic site, and the final-state relaxation energy contributed by adjacentatoms (1 and 21 and 2).4 Frequently an Auger chemical shift is larger than an XPS chemical shift (see Fig. 1) because the Au
18、gerprocess involves a two-hole final state for the atom which is more strongly influenced by extra-atomic relaxation. Coverage by gasadsorbates on metal surfaces may also cause shifts in the metal Auger peak energies (3). The magnitude of the Auger chemicalshift will usually be different from the XP
19、S photoelectron shift because the Auger process involves a two-hole final state for theatom which is moreBand bending across junctions between p- and n-type materials shift the energy levels of each material relativeto the Fermi level resulting in an apparent shift in theAuger line energies. This ef
20、fect has been observed for p-n junctions of silicon(see Fig. 2strongly) influenced(4) by extra-atomic relaxation. Frequently an Auger chemical shift isand those of heteroepitaxiallayers such as GaN/AlGaN (see Fig. 3larger) than (5an XPS chemical shift (see Fig. 1).5.2.1 Related to chemical shifts is
21、 the (modified) Auger parameter, defined as the sum of the photoelectron binding energy andthe Auger electron kinetic energy (46). Because the Auger parameter is the difference between two line energies of the sameelement of the same specimen, it is independent of any electrical charging of the spec
22、imen and spectrometer energy reference level,making it easier to identify chemical states of elements in insulating specimens. Naturally, since both photoelectron lines andAugerlines must be measured, the Auger parameter can only be used with X-ray excited spectra.5.3 The second category of chemical
23、 information from Auger spectroscopy is the Auger lineshapes observed for transitionsinvolving valence electron orbitals. Shown in Fig. 24 and Fig. 3are selectedvariations in the lineshapes for electron-excited carbonKLLfor different phases of carbon, in Fig. 5and are lineshapes for carbon KLLfor di
24、fferent chemical environments of carbon, andin Fig. 6 are lineshapes for aluminum LVV Auger transitions for different chemical states of those elements. levels of oxidation.While it is possible to relate the prominent peaks in theAuger spectrum to transitions from particular bands in the density of
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