ASTM E1523-2003 Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy《X射线光电子谱测定中电荷控制和电荷参照技术标准指南》.pdf
《ASTM E1523-2003 Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy《X射线光电子谱测定中电荷控制和电荷参照技术标准指南》.pdf》由会员分享,可在线阅读,更多相关《ASTM E1523-2003 Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy《X射线光电子谱测定中电荷控制和电荷参照技术标准指南》.pdf(6页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: E 1523 03Standard Guide toCharge Control and Charge Referencing Techniques inX-Ray Photoelectron Spectroscopy1This standard is issued under the fixed designation E 1523; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision,
2、the year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon (e) indicates an editorial change since the last revision or reapproval.1. Scope1.1 This guide acquaints the XPS user with the variouscharge control and charge shift referencing techniques
3、that areand have been used in the acquisition and interpretation ofX-ray photoelectron spectroscopy (XPS) data from surfaces ofinsulating specimens and provides information needed forreporting the methods used to customers or in the literature.1.2 This guide is intended to apply to charge control an
4、dcharge referencing techniques in XPS and is not necessarilyapplicable to electron-excited systems.1.3 SI units are standard unless otherwise noted.1.4 This standard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this st
5、andard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2. Referenced Documents2.1 ASTM Standards:E 673 Terminology Relating to Surface Analysis2E 902 Practice for Checking the Operating Characteristicsof X-Ray Photoelectro
6、n Spectrometers2E 1078 Guide for Specimen Handling in Auger ElectronSpectroscopy, X-Ray Photoelectron Spectroscopy, andSecondary Ion Mass Spectrometry2E 1829 Guide for Specimen Preparation and Mounting inSurface Analysis23. Terminology3.1 Definitions:3.1.1 See Terminology E 673 for definitions of te
7、rms used inX-ray photoelectron spectroscopy.3.1.2 SymbolsBE Binding energy, in eVBEcorrCorrected binding energy, in eVBEmeasMeasured binding energy, in eVBErefReference binding energy, ineVBEmeas,refMeasured Binding energy, ineV, of a reference lineFWHM Full width at half maximumamplitude of a peak
8、in the pho-toelectron spectrum above thebackground, in eVXPS X-ray photoelectron spectros-copyDcorrCorrection energy, to be addedto measured binding energiesfor charge correction, in eV4. Overview of Charging Effects4.1 For insulating specimen surfaces, the emission of pho-toelectrons following X-ra
9、y excitation may result in a buildupof a positive surface charge. This positive surface chargechanges the surface potential thereby shifting the measuredenergies of the photoelectron peaks to higher binding energy.This binding energy shift may reach a nearly steady-state valueof between 2 and 5 eV f
10、or spectrometers equipped withnonmonochromatic X-ray sources. The surface potentialcharge and the resulting binding energy shift is, generally,larger for spectrometers equipped with monochromatic X-raysources because of the, generally, lower flux of low-energyelectrons impinging on the specimen surf
11、ace. This lower fluxarises because focused, monochromatic X-ray beams irradiateonly a portion of the specimen and not other nearby surfaces(for example, the specimen holder) that are sources of low-energy electrons. The absence of an X-ray window in manymonochromatic X-ray sources (or a greater dist
12、ance of thespecimen from the X-ray window) also eliminates anothersource of low-energy electrons.4.2 The amount of induced surface charge, its distributionacross the specimen surface, and its dependence on experimen-tal conditions are determined by several factors includingspecimen composition, homo
13、geneity, magnitude of surfaceconductivity, total photoionization cross-section, surface to-pography, spacial distribution of the exciting X-rays, andavailability of neutralizing electrons. Charge buildup is awell-studied (1, 2)3, three dimensional phenomenon that occurs1This guide is under the juris
14、diction of ASTM Committee E42 on SurfaceAnalysis and is the direct responsibility of Subcommittee E42.03 on Auger ElectronSpectroscopy and X-ray Photoelectron Spectroscopy.Current edition approved May 10, 2003. Published July 2003. Originallyapproved in 1993. Last previous edition approved in 1997 a
15、s E 1523 97.2Annual Book of ASTM Standards, Vol 03.06.3The boldface numbers given in parentheses refer to a list of references at theend of the text.1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.along the sample surface and into th
16、e material. The presence ofparticles on or different phases in the specimen surface mayresult in an uneven distribution of charge across the surface, aphenomenon known as differential charging. Charge buildupmay also occur at phase boundaries or interface regions withinthe depth of the sample that i
17、s impacted by x-ray radiation.Some specimens undergo time-dependent changes in the levelof charging because of electron, X-ray, or thermal damage orbecause of volatilization. Such specimens may never achievesteady-state potentials.4.3 Several techniques have been developed for the purposeof controll
18、ing charge buildup and the subsequent changes insurface potential in order to obtain meaningful and reproduc-ible data from insulating specimens. These techniques areemployed during the data acquisition and are discussed in 7.1.4.4 Several techniques have been developed for the purposeof correcting
19、the binding energy shifts that result from surfacecharging. These corrections are performed after the data hasbeen accumulated and are discussed in 7.2.4.5 The use of the various charge control or charge refer-encing techniques described in this guide may depend on theavailable instrument as well as
20、 the specimen being analyzed.5. Significance and Use5.1 The acquisition of chemical information from variationsin the energy position of peaks in the XPS spectrum is ofprimary interest in the use of XPS as a surface analytical tool.Surface charging acts to shift spectral peaks independent oftheir ch
21、emical relationship to other elements on the samesurface. The desire to eliminate the influence of surfacecharging on the peak positions and peak shapes has resulted inthe development of several empirical methods designed toassist in the interpretation of the XPS peak positions, determinesurface che
22、mistry, and allow comparison of spectra of conduct-ing and nonconducting systems of the same element. It isassumed that the spectrometer is generally working properlyfor non-insulating specimens (see Practice E 902).5.2 No ideal method has been developed to deal withsurface charging (3, 4). For insu
23、lators, an appropriate choice ofany control or referencing system will depend on the nature ofthe specimen, the instruments, and the information needed. Theappropriate use of charge control and referencing techniqueswill result in more consistent, reproducible data. Researchersare strongly urged to
24、report both the control and referencingtechniques that have been used, the specific peaks and bindingenergies used as standards (if any), and the criteria applied indetermining optimum results so that the appropriate compari-sons may be made.6. Apparatus6.1 One or more of the charge compensation tec
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