ASTM B507-2014 Standard Practice for Design of Articles to Be Electroplated on Racks《机架上电镀件设计的标准实施规程》.pdf
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1、Designation: B507 86 (Reapproved 2008)1B507 14Standard Practice forDesign of Articles to Be Electroplated on Racks1This standard is issued under the fixed designation B507; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, the year o
2、f last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1 NOTEThe units statement in subsection 1.2 was corrected editorially in April 2008.1. Scope1.1 This practice covers design info
3、rmation for parts to be electroplated on racks. The recommendations contained herein arenot mandatory, but are intended to give guidance toward good practice.1.2 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.1.3 This standar
4、d does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibilityof the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatorylimitations prior to use.2. Significance and Use2.1 When a
5、n article is to be electroplated, it is necessary to consider not only the characteristics of the electroplating process,but also the design of the part to minimize electroplating and finishing costs and solution dragout as well as to improve appearanceand functionality. It is often possible during
6、the design and engineering stages to make small adjustments in shape that will resultin considerable benefit toward a better quality part at a lower cost.2.2 The specific property of an electroplating process that would require some attention to the details of optional designs, is thethrowing power
7、of the electroplating solution. This term describes the properties of the solution as it relates to the solutionelectrical resistance and solution capacitance at the cathode and overall efficiency of the electrolyte system. Throwing power isdefined as the improvement of the coating distribution over
8、 the primary current distribution on an electrode (usually cathode) ina given solution, under specified conditions.3. Current Distribution and Throwing Power3.1 The apparent current during practical electroplating is never uniform over the surface of the product. Even parallel plateshave a nonunifor
9、m distribution of current when freely suspended in a bath as shown in Fig. 1. In this example, the current linestend to concentrate as corners, and edges (high-current density) of the part. Consequently more metal is deposited at thehigh-current density areas than at the low-current density areas.4.
10、 Relative Throwing Powers of Different Electrolytes4.1 Throwing power is not the same for all metals and all electroplating baths. Table 1 lists the commonly used electroplatingprocesses. They are arranged according to decreasing throwing power.4.2 A Rochelle-type copper electroplating solution has
11、excellent throwing power compared to the poor throwing power of achromic acid solution used to deposit chromium. The widely used Watts-type nickel bath has fair throwing power.5. Geometric Factors Determining Deposit Distribution5.1 Since a metal deposits preferentially at protuberances, such as sha
12、rp corners, edges, fins, and ribs, these should be roundedto a radius of at least 0.4 and preferably 0.8 mm to avoid excessive buildup. Contouring a base corner in a depression is alsorecommended to avoid thickness deficiency at the location.1 This practice is under the jurisdiction ofASTM Committee
13、 B08 on Metallic and Inorganic Coatingsand is the direct responsibility of Subcommittee B08.01 on AncillaryActivities.Current edition approved April 1, 2008May 1, 2014. Published April 2008June 2014. Originally approved in 1970. Last previous edition approved in 20032008 asB507 86 (2003).(2008)1. DO
14、I: 10.1520/B0507-86R08E01.10.1520/B0507-14.This document is not an ASTM standard and is intended only to provide the user of an ASTM standard an indication of what changes have been made to the previous version. Becauseit may not be technically possible to adequately depict all changes accurately, A
15、STM recommends that users consult prior editions as appropriate. In all cases only the current versionof the standard as published by ASTM is to be considered the official document.Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States15.2 T
16、he width-to-depth ratio of a depression or recess should be held to more than three as shown in Fig. 2. Otherwise, a specialFIG. 1 Current Density Distribution and Typical Electrodeposit (filled area)TABLE 1 Relative Throwing Powers of Common ElectroplatingBathsBath/Metal RankingRochell copper (cyan
17、ide based) ExcellentCyanide cadmium ExcellentCyanide gold GoodCyanide silver GoodAlkaline tin GoodCyanide zinc GoodAlkaline non cyanide zinc GoodFluoborate lead GoodAll chloride nickel FairTin nickel FairSulfamate nickel FairWatts nickelA FairBright nickel FairAcid chloride zinc FairNickel-iron Fair
18、Chloride iron FairPyrophosphate copper FairAcid copper FairTrivalent chromium PoorHexavalent chromium PoorA Used for examples illustrated by Figs. 4-5.NOTE 1Ratio should be a minimum of threeFIG. 2 Width-to-Depth Ratio of a RecessB507 142auxiliary anode must be employed inside the recess to promote
19、more uniform current distribution. An auxiliary anode is usuallymade of the depositing metal and is placed close to the low-current density areas to enhance metal deposition at those regions.5.3 All sharp edges and base angles of a recess should be rounded to a radius of 0.25 times or more the depth
20、 of the recess asshown in Fig. 3. When sharp recess angles are required for a functional purpose, the electroplater cannot be expected to meet aminimum thickness at those locations unless it is specifically required.required and optional plating techniques are employed.NOTE 1Electroplating technique
21、s can be used to address uniform deposition in the recess angle.These techniques include bi-polar plating and directedflow electroplating in addition to conforming anodes.6. Examples of Distribution of Electrodeposited Nickel on Various Shapes6.1 Fig. 4 through Fig. 52 show the kind of nickel distri
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