ASHRAE AN-04-9-3-2004 Cooling of High Heat Density Rooms Today and in the Future《当今和未来的高热量密度的室内的制冷》.pdf
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1、AN-04-9-3 Cooling of High Heat Density Rooms Today and in the Future Lennart K. Stahl ABSTRACT Technology advances are driving the power densities of electronics to unprecedented levels. Consequently, thermal density issues for the facilities hosting the electronics have become topics of increasing
2、interest. Trends indicate that room densities for data centers and telecom central ofices willjump om less than 100 WJ to densities of over 500 WJ in the near future. This paper will identiJL several of the drivers of those trends and assess the impact on coolingsystem design for these spaces. The f
3、ocus of this paper is how high heat density rooms can be cooled using current cooling technology while lowering energy cost, and how the development ofnew cooling technology will impact high-density spaces in the future. EVALUATING THE TRENDS Two trends are converging to create a situation where the
4、 density of new equipment going into data centers and telecom central offices is so high that it is creating problems for the facility managers and engineers charged with installing and supporting new systems. Both of these trends are expected to continue in the coming years, forcing significant cha
5、nges in how data centers are cooled. The first trend is one that has marked the evolution of the computer industry since the beginning: the trend toward smaller, faster systems. The current generation of high-perfor- mance servers and switches simply pack more processing power into a smaller footpri
6、nt than previous generation systems. The impact on heat generation is obvious to cooling professionals, but often end users have the misconception that smaller systems generate less heat than larger systems. Of course, what really matters is power consumption, and it is helpful to analyze the factor
7、s that influence system power consumption, especially at the microprocessor level. The switching on and off of transistors consumes power and generates heat. So the number of transistors per processor and processor clock speed have a significant impact on proces- sor power. The third factor that con
8、tributes to density is track spacing, or how many transistors can be packed into a proces- sor without increasing its physical size. It will come as no surprise that each of these technology drivers-transistors per processor, clock speed, and track spacing-are pushing power densities higher, but the
9、 rate at which this change is occurring is startling. However, the microprocessor industry does not expect this trend to level off in the immediate future. Intel has predicted the number of transistors on their processor “should pass 200 million by 2005 and reach well in excess of 1 billion by the e
10、nd of the decade.” Projections like this have spurred the International Technology Roadmap for Semiconductors-a cooperative effort of manufacturers and government organi- zations that provides an ongoing assessment of semiconductor technology requirements-to warn that microprocessor maxi- mum power
11、will reach 170 watts by 2005. A research group dedicated to helping member compa- nies maximize the availability of business critical systems has studied this trend on a system level and documented its find- ings in Heat Density Trends in Data Processing, Computer Systems, and Telecommunications Equ
12、ipment (Uptime Insti- tute 2001). The institute found power densities had increased more than 300% from 1992 to 2002, jumping from an average of 250 WIR2 within the product footprint in 1992 to 1000 W/ fi2 in 2002 (see Figure 1). Significantly, the increase from 2000 to 2001 was 100 W/R2 within the
13、product footprint, and Lennart Stahl is a product manager at Lieben Corporation, Columbus, Ohio. 574 02004 ASHRAE. CMD HOT com yeat of Produci Announcement Figure 1 Product heat density trend chart, projections for information technology products (Uptime Institute 2001). the institute warned that, “
14、in each subsequent year the annual change gets larger.” The second trend driving increased densities has been enabled by the first: the vertical racking of systems. Like the trend toward smaller, more powerful systems, this trend is not necessarily new, but it is now reaching the point where it is t
15、hreatening to limit the adoption of new technology unless the issues of heat generation are addressed. The emergence of blade servers is an example of this. Blade servers take the trend toward miniaturization to the extreme, packing the entire server on a single board. Blade servers are being promot
16、ed for their flexibility and easier management, and IDC has projected sales of blade servers to grow from $341 million in 2003 to $3.7 billion by 2006. However, at the Information Week 2003 Spring Conference, Dell President and Chief Operating Oficer Kevin Rollins, whose company marketed blade serve
17、rs, warned that heat issues may limit the adoption of blade server technology. Kenneth Brill, executive director of the Uptime Institute, agrees, noting that, “the failure rate in the top third of server racks is three times the bottom two-thirds. Blades will further exacerbate this problem.” The co
18、nvergence of these two trends has forced data center designers to shift their focus from watts per square foot to “watts per rack” when creating cooling solutions. This is a significant shift because it represents a change from a room- based view of cooling, where the focus is removing heat from the
19、 room, to a rack-based view, with more focus on ensuring proper cooling of individual racks. OPTIMIZING CURRENT COOLING TECHNOLOGY Over the years, several approaches have been developed to optimize the performance of current cooling technology to enable existing cooling systems to better adapt to th
20、e densities of new rack-based systems. One of the most successful of these has been the “hot aisle/cold aisle” approach. Using this approach, rows of equip- Figure 2 Raised floor with hot aisle/cold aisle configuration. INCORRECT CORRECT SIDE VIEW Figure3 Diagrams of rack airflow showing egect of bl
21、anking panels. ment racks are arranged in alternating “cold aisles” and hot aisles.” A cold aisle has perforated floor tiles that allow cool- ing air to come up from under the raised floor, while a hot aisle has no perforated tiles. Equipment racks are arranged face-to- face so cooling air from the
22、cold aisle is drawn into the front of the computer hardware and exhausted out the back of the equipment rack onto the adjacent hot aisles. The objective is to separate the source of cooling air from hot air discharge, which returns to the computer room cooling unit, ensuring the air going back to th
23、e cooling unit is at a higher temperature than it would be if it was mixed with cool air (see Figure 2). Because the air entering the cooling unit is hotter, the cooling unit can remove more heat. This approach has become accepted, within limits, as a best practice in data centers design and is now
24、commonplace. Blanking panels have also been used successfully to prevent hot air from recirculating through a partially filled rack. Blanking panels fill unused spots in the rack to close what would otherwise be an open path for hot air being exhausted from the rack to pass back through the rack and
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