ASTM F1893-2011 Guide for Measurement of Ionizing Dose-Rate Survivability and Burnout of Semiconductor Devices《测量半导体器件电离剂量率存活性和烧断的指南》.pdf
《ASTM F1893-2011 Guide for Measurement of Ionizing Dose-Rate Survivability and Burnout of Semiconductor Devices《测量半导体器件电离剂量率存活性和烧断的指南》.pdf》由会员分享,可在线阅读,更多相关《ASTM F1893-2011 Guide for Measurement of Ionizing Dose-Rate Survivability and Burnout of Semiconductor Devices《测量半导体器件电离剂量率存活性和烧断的指南》.pdf(7页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: F1893 11Guide forMeasurement of Ionizing Dose-Rate Survivability andBurnout of Semiconductor Devices1This standard is issued under the fixed designation F1893; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, the year o
2、f last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 This guide defines the detailed requirements for testingsemiconductor devices for short-pulse high dose-rateionizati
3、on-induced survivability and burnout failure. The testfacility shall be capable of providing the necessary dose ratesto perform the measurements. Typically, large flash X-ray(FXR) machines operated in the photon mode, or FXR e-beamfacilities are utilized because of their high dose-rate capabili-ties
4、. Electron LinearAccelerators (LINACs) may be used if thedose rate is sufficient. Two modes of test are described: (1)Asurvivability test, and (2) A burnout failure level test.1.2 The values stated in International System of Units (SI)are to be regarded as standard. No other units of measurementare
5、included in this standard.2. Referenced Documents2.1 ASTM Standards:2E170 Terminology Relating to Radiation Measurements andDosimetryE668 Practice for Application of Thermoluminescence-Dosimetry (TLD) Systems for DeterminingAbsorbed Dosein Radiation-Hardness Testing of Electronic DevicesE1894 Guide
6、for Selecting Dosimetry Systems for Applica-tion in Pulsed X-Ray SourcesF526 Test Method for Measuring Dose for Use in LinearAccelerator Pulsed Radiation Effects Tests2.2 ISO/ASTM Standard:251275 Practice for Use of a Radiochromic Film DosimetrySystem3. Terminology3.1 Definitions:3.1.1 burnout failu
7、re level testa test performed to deter-mine the maximum dose-rate level the device survives and theminmum dose-rate level where the device experiences burnout.3.1.1.1 DiscussionIn such a test, semiconductor devicesare exposed to a series of irradiations of increasing dose-ratelevels. The maximum dos
8、e rate at which the device survives isdetermined for worst-case bias conditions. The burnout failurelevel test is always a destructive test.3.1.2 dose ratethe amount of energy absorbed per unitmass of a material per unit time during exposure to theradiation field (typically, expressed in units of Gy
9、(material)/s).For pulsed radiation sources, dose rate typically refers to thepeak dose rate during the pulse.3.1.3 dose rate induced latchupregenerative device actionin which a parasitic region (for example, a four (4) layerp-n-p-n or n-p-n-p path) is turned on by the photocurrentgenerated by a puls
10、e of ionizing radiation, and remains on foran indefinite period of time after the photocurrent subsides.The device will remain latched as long as the power supplydelivers voltage greater than the holding voltage and currentgreater than the holding current. Latchup disrupts normalcircuit operation in
11、 some portion of the circuit, and may alsocause catastrophic failure due to local heating of semiconduc-tor regions, metallization or bond wires.3.1.4 failure conditiona device is considered to haveundergone burnout failure if the device experiences one of thefollowing conditions.(1) functional fail
12、urea device failure where the device undertest, (DUT) fails functional tests following exposure.(2) parametric failurea device failure where the deviceunder test, (DUT) fails parametric measurements after expo-sure.1This guide is under the jurisdiction of Committee F01on Electronics , and is thedire
13、ct responsibility of Subcommittee F01.11 on Nuclear and Space RadiationEffects.Current edition approved Jan. 1, 2011. Published January 2011. Originallyapproved in 1998. Last previous edition approved in 2003 as F1893-98(2003). DOI:10.1520/F1893-11.2For referenced ASTM standards, visit the ASTM webs
14、ite, www.astm.org, orcontact ASTM Customer Service at serviceastm.org. For Annual Book of ASTMStandards volume information, refer to the standards Document Summary page onthe ASTM website.1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United Stat
15、es.3.1.4.1 DiscussionFunctional or parametric failures maybe caused by total ionizing dose mechanisms. See interferencesfor additional discussion.3.1.5 high dose-rate burnoutpermanent damage to asemiconductor device caused by abnormally large currentsflowing in junctions and resulting in a discontin
16、uity in thenormal current flow in the device.3.1.5.1 DiscussionThis effect strongly depends on themode of operation and bias conditions. Temperature may alsobe a factor in damage to the device should latchup occur priorto failure. Latchup is known to be temperature dependent.3.1.6 ionizing dose rate
17、 responsethe transient changeswhich occur in the operating parameters or in the output signalof an operating device when exposed to an ionizing radiationpulse. See Terminology E170 for a definition of ionization.Within this standard, the scope of the dose rate response isrestricted to consideration
18、of linear microcircuits.3.1.7 ionizing radiation effectsthe changes in the electri-cal parameters of a microelectronic device resulting fromradiation-induced trapped charge. These are also sometimesreferred to as “total dose effects.”3.1.8 latchup windowa latchup window is the phenom-enon in which a
19、 device exhibits latchup in a specific range ofdose rates. Above and below this range, the device does notlatchup. A device may exhibit more than one latchup window.This phenomenon has been observed for some complementarymetal-oxide semiconductor (CMOS) logic devices, oxide side-wall logic and large
20、 scale integration (LSI) memories and mayoccur in other devices.3.1.9 survivability testA “pass/fail” test performed todetermine the status of the device after being exposed to apredetermined dose-rate level. The survivability test is usuallyconsidered a destructive test.4. Summary of Guide4.1 Semic
21、onductor devices are tested for burnout during andafter exposure to an ionizing high dose-rate radiation pulse.The measurement is deemed as a survivability test when thetest criteria is a pass/fail measurement at a predetermineddose-rate level, or deemed as a burnout failure level test whenthe maxim
22、um passing dose-rate level and the minimum failingdose rate level for burnout is determined experimentally.4.2 The following quantities are unspecified in this guideand must be agreed upon between the parties to the test:4.2.1 The maximum ionizing (total dose to which thedevices will be subjected du
23、ring the test),4.2.2 The maximum dose rate to which the devices will besubjected during the test, and4.2.3 The bias conditions to which the devices will besubjected during the test.5. Significance and Use5.1 The use of FXR or LINAC radiation sources for thedetermination of high dose-rate burnout in
24、semiconductordevices is addressed in this guide. The goal of this guide is toprovide a systematic approach to testing semiconductor de-vices for burnout or survivability.5.2 The different types of failure modes that are possible aredefined and discussed in this guide. Specifically, failure can bedef
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