FORD FLTM AI 103-03-2000 PHOTOOXIDATION AND FILM LOSS IN COATINGS METHOD A PHOTOOXIDATION AND FILM LOSS OF COATINGS ON SILICON DISKS《涂层中的光氧化和薄膜损失测定 方法A 硅盘上的涂层的光氧化和薄膜损失》.pdf
《FORD FLTM AI 103-03-2000 PHOTOOXIDATION AND FILM LOSS IN COATINGS METHOD A PHOTOOXIDATION AND FILM LOSS OF COATINGS ON SILICON DISKS《涂层中的光氧化和薄膜损失测定 方法A 硅盘上的涂层的光氧化和薄膜损失》.pdf》由会员分享,可在线阅读,更多相关《FORD FLTM AI 103-03-2000 PHOTOOXIDATION AND FILM LOSS IN COATINGS METHOD A PHOTOOXIDATION AND FILM LOSS OF COATINGS ON SILICON DISKS《涂层中的光氧化和薄膜损失测定 方法A 硅盘上的涂层的光氧化和薄膜损失》.pdf(5页珍藏版)》请在麦多课文档分享上搜索。
1、 FORD LABORATORY TEST METHOD AI 103-03 Date Action Revisions 2000 08 07 Editorial no technical change A. C ockman 2000 04 05 Editorial no technical change A. Cockman 1995 03 13 Printed copies are uncontrolled Page 1 of 5 Copyright 2000, Ford Global Technologies, Inc. Photooxidation and Film Loss in
2、Coatings Method A: Photooxidation and Film Loss of Coatings on Silicon Disks Application This test method determines the amount of photooxidation and film loss in coatings by measuring the changes in IR spectra after weat hering. Chemical changes occur in coatings during weathering and can be monito
3、red as a function of exposure time. This information provides a way to evaluate the durability of coatings and monitor film loss. Required Test Equipment IR Silicon Disks - 2 mm x 13 mm, available from Wilmad Glass Co., Inc., Rte. 40 and Oak Rd., Buena, NJ 08310 (609)697 - 3000. Catalog #100N9 - SP
4、- 1 (notched for alignment purposes) Glass Capillary Tubes - for applying coating on silicon disks Laboratory Oven - capable of curi ng coating Silicon Disk Holder - this will have to be custom made to align disk in IR beam Fourier Transform Infrared (FTIR) Spectrophotometer Materials and Solution R
5、equired Methylene Chloride - certified ACS grade or equivalent I. Preparation of Coating on Silicon Disks 1. For each clearcoat being studied, make free - standing coating films of varying thickness. Obtain an IR spectrum of each film and integrate the CH absorbance area (see Figure 1) to obtain the
6、 CH absorbance area/micrometer correla tion. 2. Acquire an IR background on a clean, uncoated silicon disk. Observe that the notched disk rests in the proper orientation. 3. Using a capillary tube, coat a silicon disk with a thin uniform film of coating. 4. Allow the solvent to evaporate fo r severa
7、l minutes at room temperature. FORD LABORATORY TEST METHOD AI 103-03 Page 2 of 5 Copyright 2000, Ford Global Technologies, Inc. 5. Display the IR spectrum of the coating in absorbance mode. Integrate the CH absorbance area. Convert the integrated area to film thickness in micrometers. a. If the film
8、 thickness is between 7 and 10 micromete rs, cure the coating on the silicon disk using the recommended temperature and time, unless stated otherwise in applicable Engineering Material Specification. b. If the film thickness is not between 7 and 10 micrometers, remove the uncured coating from th e s
9、ilicon disk by rinsing with methylene chloride. Repeat steps 2 4 until the film thickness is in the recommended range. 5. Obtain the IR spectrum of the coating before weathering has occurred. This will be called the “time 0“ value. II. Obtaining IR Spectra 1. Remove the silicon disks from weathering
10、 at intervals suggested by the ongoing results. Record the hours of exposure upon removal. Exposure samples from Florida should be tested at least at six month intervals, or more often if suggested by the ongoing data. 2. Obtain the IR spectra of the coatings using a clean, uncoated silicon disk as
11、an IR background. (Place the silicon disks back in the weatherometer as soon as possible to continue weathering. Silicon disks from Florida exposure need not be sent back.) Note: Absorbed water might contribute strongly to the OH, NH area resulting in a false measure of polymer - based OH, NH photoo
12、xidation products. Therefore, it is important to remove samples at the end of the dry, light cycle of the weat herometer. Alternatively you can dry samples for 15 minutes at 104 C. III. Photooxidation Rate by Monitoring OH, NH Products One way to access the photooxidation rate of a coating is to mon
13、itor the concentration of - OH (hydroxy) and - NH (amine) produc ts as weathering occurs. The concentration is expressed as the amount of - OH and - NH products per amount of film remaining. The concentration is calculated by ratioing the OH, NH area to the CH area of the FTIR spectrum. 1. Integrate
14、 the entire OH, NH, C H stretch area. (See Figure 1.) 2. Integrate the CH stretch area centered around 2900 cm - 1 . 3. Subtract the CH stretch area from the total area to obtain the OH, NH area at time t. 4. Divide the OH, NH stretch area by the CH area to obtain the concentra tion of hydroxy and a
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