DLA SMD-5962-96613 REV B-1997 MICROCIRCUIT DIGITAL RADIATION HARDENED CMOS GATED J-K MASTER-SLAVE FLIP-FLOP MONOLITHIC SILICON《抗辐射互补金属氧化物半导体J-K双稳态多谐振荡器硅单片电路数字微电路》.pdf
《DLA SMD-5962-96613 REV B-1997 MICROCIRCUIT DIGITAL RADIATION HARDENED CMOS GATED J-K MASTER-SLAVE FLIP-FLOP MONOLITHIC SILICON《抗辐射互补金属氧化物半导体J-K双稳态多谐振荡器硅单片电路数字微电路》.pdf》由会员分享,可在线阅读,更多相关《DLA SMD-5962-96613 REV B-1997 MICROCIRCUIT DIGITAL RADIATION HARDENED CMOS GATED J-K MASTER-SLAVE FLIP-FLOP MONOLITHIC SILICON《抗辐射互补金属氧化物半导体J-K双稳态多谐振荡器硅单片电路数字微电路》.pdf(29页珍藏版)》请在麦多课文档分享上搜索。
1、SND-5962-9bbL3 REV B W 9999796 OLL27L 733 NOTICE OF REVISION (NOR) THIS REVISION DESCRIBED BELOW HAS BEEN AUTHORIZED FOR THE DOCUMENT USTED. 1. DATE (YYMMDD) 97-07-25 ubk reporiing burden for this cdledlon is estimated lo average 2 hours per response, kiduding the time for reviewing istNc(ions, sear
2、ching existing dala 8our?8, gathering and makiteining Ihe data needed, and compleling and reviewing lhe dledian of Information. !%nd commenie regarding this kirden estimate or any other aspect oi this cdlection of infomation, duding suggestions for dudng this burden, lo Deparlmenl of Defense, Washin
3、gtion Headquarters Services, Diredorale for ifomlion Operaiions and Reports, 1215 Jeflemn Davis Highway, Suiie 1204, Atlington, VA 22202-4302, and lo the office ol hagement and add W. Revisions description column; add Changes in acmrdance wHh NOR 5962-Fl389-97. Revisions date column; add 37-07-25. R
4、evision level bb&; add w. Rev status of sheei3; for sheets 21 change from A lo 8“. Rev stetus of sheets; for sheets 22 dienge from A to 8“. Rev stetus of sheets; for sheeta 23 change from A lo 8“. Rev status of sheets; for sheets 24 change from A to 8“. Sheet 21: NOR 596243206-97 sheet 7 of Appendix
5、 A for Die Physical Dimensions for Die Ndviess change from Y1 4-1 mils“ to “20 +/i mils“ Sheet 22: NOR 5962420647 sheel 8 of Appendix A for Itvierface Maleriais for Glassivation Type change from Phosphorous doped SIW to RevisionLevelBlodc diangefmn*AmtoB“ PSG and for Assembly Related Information for
6、 Subslrale Po6ential change from Ti lo VES“ lo Fbalhg or Tied lo VW“ RevisionLevelBlodc changefrom“A“toSm Sheet 23: NOR 596243206-97 sheet 9 of Appendix A for De Physical Dimensions for Die Thiduiess change from 21 +/-i mils“ to “20 41 mils RevisionLevelBlodc changetrOm“AgtaW Sheel 24: NOR 5962-Fl20
7、6-97 sheet 1 O of Appendix A for Interface Materials for Glassivatkm Type change from Phosphorous doped SlO2“ to “PSG * and for Assembly Wted Information for SuRstraie Potential change from = Ti to VES“ lo Fbating or Ti to VOO RevisionLevelBlodf this drawing shall take precedence. 30. REQUIREMENTS 3
8、0.1 Item Requirements. The individual item requirements for device classes Q and V shall be in accordance with JllL-PRF-38535 and as specified herein or as modified in the device manufacturers Quality Management (QM) plan. The nodification in the OM plan shall not effect the form, fit or function as
9、 described herein. 30.2 Desiqn. construction and physical dimensions. The design, construction and physical dimensions shall be as specified n MIL-PRF-38535 and the manufacturers QM plan, for device classes Q and V and herein. 30.2.1 Die Physical dimensions. The die physical dimensions shall be as s
10、pecified in 10.2.4.1 and on figures A-1 and A-2. 30.2.2 Die bondinr! pad locations and electrical functions. The die bonding pad locations and electrical functions shall be as ;pecified in 10.2.4.2 and on figures A-I and A-2. 30.2.3 Interface materials. The interface materials for the die shall be a
11、s specified in 10.2.4.3 and on figures A-I and A-2. APPENDIX A APPENDIX A FORMS A PART OF SMD 5962-96613 Document No: 5962-9661 3 Revision: A Sheet: 4 of 10 NOR NO: 5962-R206-97 STANDARD MICROCIRCUIT DRAWING DEFENSE SUPPLY CENTER, COLUMBUS COLUMBUS, OHIO 4321 6-5000 I A I 18 DESC FORM 193A JUL 94 Pr
12、ovided by IHSNot for ResaleNo reproduction or networking permitted without license from IHS-,-,-APPENDIX A APPENDIX A FORMS A PART OF SMD 5962-96613 Document No: 5962-96613 Revision: A Sheet: 5 of 10 NOR NO: 5!362-R206-97 30.2.4 Assembly related information. The assembly related information shall be
13、 as specified in 10.2.4.4 and figures A-1 and r2. 30.2.5 Truth table(s). The truth table(s) shall be as defined within paragraph 3.2.3 of the body of this document. 30.2.6 Radiation exposure circuit. The radiation exposure circuit shall be as defined within paragraph 3.2.4 of the body of this ocumen
14、t. 30.3 Electrical performance characteristics and post-irradiation Parameter limits. Unless otherwise specified herein, the lectrical performance characteristics and post-irradiation parameter limits are as specified in table I of the body of this ocument. 30.4 Electrical test requirements. The waf
15、er probe test requirements shall include functional and parametric testing sufficient 30.5 Marking. As a minimum, each unique lot of die, loaded in single or multiple stack of carriers, for shipment to a customer, ) make the packaged die capable of meeting the electrical performance requirements in
16、table I. hall be identified with the wafer lot number, the certification mark, the manufacturers identification and the PIN listed in 10.2 erein. The certification mark shall be a “QM” or “Q” as required by MIL-PRF-38535. 30.6 Certification of compliance. For device classes Q and V, a certificate of
17、 compliance shall be required from a 1ML-38535 listed manufacturer in order to supply to the requirements of this drawing (see 60.4 herein). The certificate of impliance submitted to DSCC-VA prior to listing as an approved source of supply for this appendix shall affirm that the ianufacturers produc
18、t meets, for device classes Q and V, the requirements of MIL-PRF-38535 and the requirements herein. 30.7 Certificate of conformance. A certificate of conformance as required for device classes Q and V in MIL-PRF-38535 shall 3 provided with each lot of microcircuit die delivered to this drawing. 40.
19、QUALITY ASSURANCE PROVISIONS 40.1 Samplina anu inspection. For device classes Q and V, die sampling and inspection procedures shall be in accordance ith MIL-PRF-38535 or as modified in the device manufacturers Quality Management (QM) plan. The modifications in the QM Ian shall not effect the form, f
20、it or function as described herein. 40.2 Screeninq. For device classes Q and V, screening shall be in accordance with MIL-PRF-38535, and as defined in the ianufacturers QM plan. As a minimum it shall consist of: a) Wafer Lot acceptance for Class V product using the criteria defined within MIL-STD-88
21、3 TM 5007. b) 100% wafer probe (see paragraph 30.4). c) 100% internal visual inspection to theapplicable class Q or V criteria defined within MIL-STD-883 TM2010 or the alternate procedures allowed within MIL-STD-883 TM5004. STANDARD MICROCIRCUIT DRAWING DEFENSE SUPPLY CENTER, COLUMBUS COLUMBUS, OHIO
22、 43216-5000 SIZE A 5962-96613 I SHEET19 I REVISION LEVEL A DESC FORM 193A JUL 94 Provided by IHSNot for ResaleNo reproduction or networking permitted without license from IHS-,-,-APPENDIX A APPENDIX A FORMS A PART OF SMD 5962-96613 Document No: 5962-9661 3 Revision: A Sheet: 6 of 10 NOR NO: 5962-R20
23、6-97 40.3 Conformance inspection. 40.3.1 Group E inspection. Group E inspection is required only for parts intended to be identified as radiation assured (see 3.5 herein). RHA levels for device classes Q and V shall be as specified in MIL-PRF-38535. End point electrical testing of sckaged die shall
24、be as specified in table IIA herein. Group E tests and conditions are as specified within paragraphs 4.4.4.1, 4.4.1.1, 4.4.4.2, 4.4.4.3 and 4.4.4.4. 50. DIE CARRIER 50.1 Die carrier requirements. The requirements for the die carrier shall be accordance with the manufacturers QM plan or c specified i
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