ASTM E478-2003 Standard Test Methods for Chemical Analysis of Copper Alloys《铜合金化学分析的标准试验方法》.pdf
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1、Designation: E 478 03Standard Test Methods forChemical Analysis of Copper Alloys1This standard is issued under the fixed designation E 478; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, the year of last revision. A number in pare
2、ntheses indicates the year of last reapproval. Asuperscript epsilon (e) indicates an editorial change since the last revision or reapproval.This standard has been approved for use by agencies of the Department of Defense.1. Scope1.1 These test methods cover the chemical analysis ofcopper alloys havi
3、ng chemical compositions within the follow-ing limits:2Element Concentration, %Aluminum 12.0 maxAntimony 1.0 maxArsenic 1.0 maxCadmium 1.5 maxCobalt 1.0 maxCopper 40.0 minIron 6.0 maxLead 27.0 maxManganese 6.0 maxNickel 50.0 maxPhosphorus 1.0 maxSilicon 5.0 maxSulfur 0.1 maxTin 20.0 maxZinc 50.0 max
4、1.2 The test methods appear in the following order:SectionsAluminum by the Carbamate Extraction-(Ethyl-enedinitrilo) Tetraacetate Titrimetric TestMethod 2 to 12 % 70-77Copper by the Combined ElectrodepositionGravimetric and Oxalyldihydrazide Photomet-ric Test Method 50 %, minimum 9-17Iron by the 1,1
5、0-Phenanthroline PhotometricTest Method 0.003 to 1.25 % 18-27Lead by the Atomic Absorption Test Method0.002 to 15 % 89-99Lead by the (Ethylenedinitrilo)tetraacetic Acid(EDTA) Titrimetric Test Method 2.0 to30.0 % 28-35Nickel by the Dimethylglyoxime Extraction Pho-tometric Test Method 0.03 to 5.0 % 36
6、-45Nickel by the Dimethylglyoxime GravimetricTest Method 4 to 50 % 54-61Silver in Silver-Bearing Copper by the AtomicAbsorption Test Method 0.01 to 0.12 % 100-111Tin by the Iodatimetric Titration Test Method0.5 to 20 % 62-69Tin by the Phenylfluorone Photometric TestMethod 0.01 to 1.0 % 112-122Zinc b
7、y Atomic Spectrometry 0.2 to 2 % 78-88Zinc by the (Ethylenedinitrilo)tetraacetic Acid(EDTA) Titrimetric Test Method 2 to 40 % 46-531.3 This standard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this standard to establi
8、sh appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2. Referenced Documents2.1 ASTM Standards:E29 Practice for Using Significant Digits in Test Data toDetermine Conformance with Specifications3E50 Practices for Apparatus, Reagents, and
9、Safety Precau-tions for Chemical Analysis of Metals4E60 Practice for Photometric and SpectrophotometricMethods for Chemical Analysis of Metals4E 173 Practice for Conducting Interlaboratory Studies ofMethods for Chemical Analysis of Metals4E 255 Practice for Sampling Copper and Copper Alloys forDeter
10、mination of Chemical Composition4E 1024 Guide for Chemical Analysis of Metals and MetalBearing Ores by Flame Atomic Absorption Spectropho-tometry4E 1601 Practice for Conducting an Interlaboratory Study toEvaluate the Performance of an Analytical Method43. Significance and Use3.1 These test methods f
11、or the chemical analysis of metalsand alloys are primarily intended as referee methods to testsuch materials for compliance with compositional specifica-tions. It is assumed that all who use these methods will betrained analysts capable of performing common laboratoryprocedures skillfully and safely
12、. It is expected that work will beperformed in a properly equipped laboratory.4. Apparatus, Reagents, and Photometric Practice4.1 Apparatus and reagents required for each determinationare listed in separate sections preceding the procedure. The1These test methods are under the jurisdiction of ASTM C
13、ommittee E01 onAnalytical Chemistry for Metals, Ores and Related Materials and are the directresponsibility of Subcommittee E01.05 on Cu, Pb, Zn, Cd, Sn, Be, their Alloys andRelated Metals.Current edition approved Aug. 10, 2003. Published September 2003. Originallyapproved in 1973. Last previous edi
14、tion approved in 1996 as E 478 89a (1996).2The actual limits of application of each test method are presented in 1.2.3Annual Book of ASTM Standards, Vol 14.02.4Annual Book of ASTM Standards, Vol 03.05.1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959
15、, United States.apparatus, standard solutions, and certain other reagents usedin more than one procedure are referred to by number and shallconform to the requirements prescribed in Practices E50,except that photometers shall conform to the requirementsprescribed in Practice E60.4.2 Photometric prac
16、tice prescribed in these test methodsshall conform to Practice E60.5. Hazards5.1 Specific hazard statements are given in Section 5, Note4, and Section 106.5.2 For other precautions to be observed in the use of certainreagents in these test methods, refer to Practices E50.6. Sampling6.1 For procedure
17、s for sampling the material, refer toPractice E 255. However, this method does not supersede anysampling requirements specified in a specific ASTM materialspecification.7. Rounding Calculated Values7.1 Calculated values shall be rounded to the desired num-ber of places as directed in Practice E29.8.
18、 Interlaboratory Studies8.1 These test methods were evaluated in accordance withPractice E 173 unless otherwise noted in the precision section.E 173 has been replaced by Practice E 1601. The Reproduc-ibility Index R2corresponds to the Reproducibility Index R ofPractice E 1601. Likewise the Repeatabi
19、lity Index R1of E 173corresponds to Repeatablility Index r of Practice E 1601.COPPER BY THE COMBINEDELECTRODEPOSITION GRAVIMETRIC ANDOXALYLDIHYDRAZIDE PHOTOMETRIC TESTMETHOD9. Scope9.1 This test method covers the determination of copper inconcentrations greater than 50 %.10. Summary of Test Method10
20、.1 After dissolution of the sample in nitric and hydrof-luoric acids, the oxides of nitrogen are reduced with hydrogenperoxide, and the copper deposited electrolytically. Loss ofplatinum from the anode is minimized by the addition of lead.The copper oxalyldihydrazide complex is formed with thecopper
21、 remaining in the electrolyte. Photometric measurementis made at approximately 540 nm.11. Interferences11.1 The elements ordinarily present do not interfere if theirconcentrations are under the maximum limits shown in 1.1.12. Apparatus12.1 Polytetrafluoroethylene or Polypropylene Beakers,250-mL capa
22、city.12.2 Polytetrafluoroethylene or Polypropylene Split Covers.12.3 Electrodes for ElectroanalysisPlatinum electrodes ofthe stationary type are recommended as described in 12.3.1 and12.3.2, but strict adherence to the exact size and shape of theelectrodes is not mandatory. When agitation of the ele
23、ctrolyteis permissible in order to decrease the time of deposition, oneof the types of rotating forms of electrodes, generally available,may be employed. The surface of the platinum electrodesshould be smooth, clean and bright to promote uniformdeposition and good adherence. Sandblasting is not reco
24、m-mended.12.3.1 CathodesPlatinum cathodes may be formed eitherfrom plain or perforated sheets or from wire gauze, and may beeither open or closed cylinders. Gauze cathodes are recom-mended, and shall be made preferably from 50-mesh gauzewoven from wire approximately 0.21 mm (0.0085 in.) indiameter.
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