ASHRAE OR-10-023-2010 What’s Creeping Around in Your Data Center 《是什么在您的数据中心蔓延?》.pdf
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1、2010 ASHRAE 207ABSTRACT The European Union (EU) directive 2002/95/EC “on theRestriction of the use of certain Hazardous Substances in elec-trical and electronic equipment” or RoHS was implementedin July 2006. However, this was only the first of many RoHS(-like) regulations that have been passed or a
2、re being consideredin many countries. The aim being shared by almost all RoHSlegislation is the elimination of lead in electronic products.These policies are now generally referred to as the RoHSDirective and are often referred to as “Lead-Free” legislation.A printed circuit board, or PCB, is used t
3、o mechanicallysupport and electrically connect electronic components usingconductive pathways laminated onto a non-conductivesubstrate. PCBs have conducting layers on their surface typi-cally made of thin copper foil which if left unprotected, willoxidize and deteriorate. Research has shown that pri
4、ntedcircuit boards made using lead-free materials can be moresusceptible to corrosion than their tin/lead counterparts andit was soon discovered that lead-free products with immersionsilver (ImmAg) surface finish will creep corrode in high sulfurenvironments. The majority of creep corrosion failures
5、occurred on hard disk drives (HDD), graphic cards, and moth-erboards in desktop or workstation systems (only those withImmAg PCB finish were affected).Corrosion-induced failures are frequent in electronicsproducts used in industrial environments. Now even in envi-ronments previously considered relat
6、ively benign withregards to electronics corrosion are experiencing seriousproblems as a direct result of RoHS compliance. Data centersin many urban locations have reported failures of servers andhard disk drives due to sulfur corrosion. Gaseous contami-nation can result in intermittent equipment gli
7、tches,unplanned shutdowns, or failure of critical systems that oftenresult in significant business and financial loss.Desktop and laptop computers, servers, data communi-cations (datacom) equipment and other information technol-ogy (IT) equipment are now at risk due to RoHS. There areindications tha
8、t this may even trickle down into personalcomputers and electronic devices.Manufacturers have to comply with RoHS if they want tocontinue in to do business in the EU, China, etc., and manyhave taken the ImmAg route as their path to compliance. Thishas taken care of one issue but has presented new ch
9、allengeswith regards to equipment reliability.INTRODUCTIONIn 1998, the European Union (EU) discovered that alarm-ingly large amounts of hazardous waste were being dumpedinto landfill sites. Trends also indicated that the volumes werelikely to grow 3-5 times faster than average municipal waste.This h
10、ighlighted a massive, and growing, source of environ-mental contamination. In order to address these issues, the member states of theEU decided to create the Waste Electrical and ElectronicsEquipment (WEEE, 2002/96/EC) directive, whose purposewas to:1. Improve manufacturers designs to reduce the cre
11、ation ofwaste,2. Make manufacturers responsible for certain phases ofwaste management,3. Separate collections of electronic waste (from other typesof waste), andWhats Creeping Around in Your Data Center?Chris MullerMember ASHRAEChris Muller is the Technical Director at Purafil, Inc., in Doraville, G
12、A.OR-10-023 2010, American Society of Heating, Refrigerating and Air-Conditioning Engineers, Inc. (www.ashrae.org). Published in ASHRAE Transactions 2010, Vol. 116, Part 1. For personal use only. Additional reproduction, distribution, or transmission in either print or digital form is not permitted
13、without ASHRAEs prior written permission. 208 ASHRAE Transactions4. Create systems to improve treatment, refuse, and recy-cling of WEEE.The WEEE directive laid the groundwork for additionallegislation and a proposal called EEE (Environment of Elec-trical caustic gases, such asammonia; and oxidizing
14、gases, such as ozone. Of these, theacidic gases are of particular concern. For instance, it takesonly 10 ppb (28.98 g/m3)of chlorine to inflict the sameamount of damage as 25,000 ppb (17.40 mg/m3)of ammonia.Each site may have different combinations and concen-tration levels of corrosive gaseous cont
15、aminants. Performancedegradation can occur rapidly or over many years, dependingon the specific conditions at a site. Common sources of corro-sive gases are shown in Table 1. Descriptions of commonpollutants and a discussion of their contributions to equipmentperformance degradation follow.Active Su
16、lfur Compounds. Active sulfur compoundsrefers to hydrogen sulfide (H2S), elemental sulfur (S), andorganic sulfur compounds such as the mercaptans (R-SH).When present at low ppb levels, they rapidly attack copper,silver, aluminum, and iron alloys. The presence of moistureand small amounts of inorgani
17、c chlorine compounds and/ornitrogen oxides greatly accelerate sulfide corrosion. Note,however, that attack still occurs in low relative humidity envi-ronments. Active sulfurs rank with inorganic chlorides as thepredominant cause of atmospheric corrosion.Sulfur Oxides. Oxidized forms of sulfur (SO2,
18、SO3) aregenerated as combustion products of fossil fuels and from autoemissions. Low parts per billion levels of sulfur oxides cancause reactive metals to be less reactive and thus retard corro-sion. At higher levels, however, they will attack certain typesof metals. The reaction with metals normall
19、y occurs whenthese gases dissolve in water to form sulfurous and sulfuricacid (H2SO3and H2SO4).Nitrogen Oxides (NOX). Some common sources of reac-tive gas compounds (NO, NO2, N2O4) are formed as combus-tion products of fossil fuels and have a critical role in theformation of ozone in the atmosphere.
20、 They are also believedto have a catalytic effect on corrosion of base metals by chlo-rides and sulfides. In the presence of moisture, some of thesegases form nitric acid (HNO3) that, in turn, attacks mostcommon metals.Inorganic Chlorine Compounds. This group includeschlorine (Cl2), chlorine dioxide
21、 (ClO2), hydrogen chloride(HCl), etc., and reactivity will depend upon the specific gascomposition. In the presence of moisture, these gases generatechloride ions that, in turn, attack most copper, tin, silver, andiron alloys. These reactions are significant even when thegases are present at low ppb
22、 levels. At higher concentrations,many materials are oxidized by exposure to chlorinated gases.Particular care must be given to equipment that is exposed toatmospheres which contain chlorinated contaminants.Sources of chloride ions, such as bleaching operations, seawa-ter, cooling tower vapors, and
23、cleaning compounds, etc.,should be considered when classifying industrial environ-ments. They are seldom absent in major installations.Hydrogen Fluoride (HF). This compound is a memberof the halogen family and reacts like inorganic chloridecompounds.Ammonia and Derivatives. Reduced forms of nitrogen
24、(ammonia, NH3), amines, ammonium ions (NH4+) occurmainly in fertilizer plants, agricultural applications, andchemical plants. Copper and copper alloys are particularlysusceptible to corrosion in ammonia environments.Photochemical Species. The atmosphere contains a widevariety of unstable, reactive s
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