ISO 17331 AMD 1-2010 Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials a.pdf
《ISO 17331 AMD 1-2010 Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials a.pdf》由会员分享,可在线阅读,更多相关《ISO 17331 AMD 1-2010 Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials a.pdf(8页珍藏版)》请在麦多课文档分享上搜索。
1、 Reference number ISO 17331:2004/Amd.1:2010(E) ISO 2010INTERNATIONAL STANDARD ISO 17331 First edition 2004-05-15 AMENDMENT 1 2010-07-15 Surface chemical analysis Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by t
2、otal-reflection X-ray fluorescence (TXRF) spectroscopy AMENDMENT 1 Analyse chimique des surfaces Mthodes chimiques pour collecter les lments analyss de tranches de silicium comme matriaux de rfrence pour lanalyse par spectroscopie de fluorescence X en rflexion totale (TXRF) AMENDEMENT 1 ISO 17331:20
3、04/Amd.1:2010(E) PDF disclaimer This PDF file may contain embedded typefaces. In accordance with Adobes licensing policy, this file may be printed or viewed but shall not be edited unless the typefaces which are embedded are licensed to and installed on the computer performing the editing. In downlo
4、ading this file, parties accept therein the responsibility of not infringing Adobes licensing policy. The ISO Central Secretariat accepts no liability in this area. Adobe is a trademark of Adobe Systems Incorporated. Details of the software products used to create this PDF file can be found in the G
5、eneral Info relative to the file; the PDF-creation parameters were optimized for printing. Every care has been taken to ensure that the file is suitable for use by ISO member bodies. In the unlikely event that a problem relating to it is found, please inform the Central Secretariat at the address gi
6、ven below. COPYRIGHT PROTECTED DOCUMENT ISO 2010 All rights reserved. Unless otherwise specified, no part of this publication may be reproduced or utilized in any form or by any means, electronic or mechanical, including photocopying and microfilm, without permission in writing from either ISO at th
7、e address below or ISOs member body in the country of the requester. ISO copyright office Case postale 56 CH-1211 Geneva 20 Tel. + 41 22 749 01 11 Fax + 41 22 749 09 47 E-mail copyrightiso.org Web www.iso.org Published in Switzerland ii ISO 2010 All rights reservedISO 17331:2004/Amd.1:2010(E) ISO 20
8、10 All rights reserved iiiForeword ISO (the International Organization for Standardization) is a worldwide federation of national standards bodies (ISO member bodies). The work of preparing International Standards is normally carried out through ISO technical committees. Each member body interested
9、in a subject for which a technical committee has been established has the right to be represented on that committee. International organizations, governmental and non-governmental, in liaison with ISO, also take part in the work. ISO collaborates closely with the International Electrotechnical Commi
10、ssion (IEC) on all matters of electrotechnical standardization. International Standards are drafted in accordance with the rules given in the ISO/IEC Directives, Part 2. The main task of technical committees is to prepare International Standards. Draft International Standards adopted by the technica
11、l committees are circulated to the member bodies for voting. Publication as an International Standard requires approval by at least 75 % of the member bodies casting a vote. Attention is drawn to the possibility that some of the elements of this document may be the subject of patent rights. ISO shal
12、l not be held responsible for identifying any or all such patent rights. Amendment 1 to ISO 17331:2004 was prepared by Technical Committee ISO/TC 201, Surface chemical analysis. ISO 17331:2004/Amd.1:2010(E) iv ISO 2010 All rights reservedIntroduction ISO 17331 specifies methods that allow the densit
- 1.请仔细阅读文档,确保文档完整性,对于不预览、不比对内容而直接下载带来的问题本站不予受理。
- 2.下载的文档,不会出现我们的网址水印。
- 3、该文档所得收入(下载+内容+预览)归上传者、原创作者;如果您是本文档原作者,请点此认领!既往收益都归您。
下载文档到电脑,查找使用更方便
10000 积分 0人已下载
下载 | 加入VIP,交流精品资源 |
- 配套讲稿:
如PPT文件的首页显示word图标,表示该PPT已包含配套word讲稿。双击word图标可打开word文档。
- 特殊限制:
部分文档作品中含有的国旗、国徽等图片,仅作为作品整体效果示例展示,禁止商用。设计者仅对作品中独创性部分享有著作权。
- 关 键 词:
- ISO17331AMD12010SURFACECHEMICALANALYSISCHEMICALMETHODSFORTHECOLLECTIONOFELEMENTSFROMTHESURFACEOFSILICONWAFERWORKINGREFERENCEMATERIALSAPDF
链接地址:http://www.mydoc123.com/p-1251805.html