IEC TS 62622-2012 Nanotechnologies - Description and measurement of dimensional quality parameters of artificial gratings《纳米技术.人造光栅尺寸规格质量参数、测量和描述》.pdf

《IEC TS 62622-2012 Nanotechnologies - Description and measurement of dimensional quality parameters of artificial gratings《纳米技术.人造光栅尺寸规格质量参数、测量和描述》.pdf》由会员分享，可在线阅读，更多相关《IEC TS 62622-2012 Nanotechnologies - Description and measurement of dimensional quality parameters of artificial gratings《纳米技术.人造光栅尺寸规格质量参数、测量和描述》.pdf（44页珍藏版）》请在麦多课文档分享上搜索。

1、 IEC/TS 62622 Edition 1.0 2012-10 TECHNICAL SPECIFICATION Nanotechnologies Description, measurement and dimensional quality parameters of artificial gratings IEC/TS 62622:2012(E) THIS PUBLICATION IS COPYRIGHT PROTECTED Copyright 2012 IEC, Geneva, Switzerland All rights reserved. Unless otherwise spe

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8、ulary (IEV) on-line. Customer Service Centre - webstore.iec.ch/csc If you wish to give us your feedback on this publication or need further assistance, please contact the Customer Service Centre: csciec.ch. IEC/TS 62622 Edition 1.0 2012-10 TECHNICAL SPECIFICATION Nanotechnologies Description, measur

9、ement and dimensional quality parameters of artificial gratings INTERNATIONAL ELECTROTECHNICAL COMMISSION W ICS 07.030 PRICE CODE ISBN 978-2-83220-394-1 Warning! Make sure that you obtained this publication from an authorized distributor. 2 TS 62622 IEC:2012(E) CONTENTS FOREWORD . 4 INTRODUCTION . 6

10、 1 Scope . 7 2 Normative references . 7 3 Terms and definitions . 7 3.1 Basic terms . 7 3.2 Grating terms 10 3.3 Grating types . 11 3.4 Grating quality parameter terms 14 3.5 Measurement method categories for grating characterization 17 4 Symbols and abbreviated terms 18 5 Grating calibration and qu

11、ality characterization methods 18 5.1 Overview . 18 5.2 Global methods . 18 5.3 Local methods . 19 5.4 Hybrid methods . 20 5.5 Comparison of methods . 20 5.6 Other deviations of grating features . 21 5.6.1 General . 21 5.6.2 Out of axis deviations 21 5.6.3 Out of plane deviations 22 5.6.4 Other feat

12、ure deviations 22 5.7 Filter algorithms for grating quality characterization . 23 6 Reporting of grating characterization results . 23 6.1 General . 23 6.2 Grating specifications 24 6.3 Calibration procedure 24 6.4 Grating quality parameters 24 Annex A (informative) Background information and exampl

13、es 25 Annex B (informative) Bravais lattices 34 Bibliography 38 Figure 1 Example of a trapezoidal line feature on a substrate 8 Figure 2 Examples of feature patterns 9 Figure 3 Examples of 1D line gratings 12 Figure 4 Example of 2D gratings 13 Figure A.1 Result of a calibration of a 280 mm length en

14、coder system which was used as a transfer standard in an international comparison 31 27 Figure A.2 Filtered (linear profile Spline filter with c= 25 mm) results of Figure A.1 . 28 Figure A.3 Calibration of a 1D grating by a metrological SEM 30 Figure A.4 Calibration of pitch and straightness deviati

15、ons on a 2D grating by a metrological SEM 31 TS 62622 IEC:2012(E) 3 Figure A.5 Results of an international comparison on a 2D grating by different participants and types of instruments 33 Figure B.1 One-dimensional Bravais lattice 34 Figure B.2 The five fundamental two-dimensional Bravais lattices i

16、llustrating the primitive vectors a and b and the angle between them 35 Figure B.3 The 14 fundamental three-dimensional Bravais lattices . 36 Table 1 Comparison of different categories for grating characterization methods 21 Table A.1 Grating quality parameters of the grating in Figures A.1 and A.2

17、28 Table A.2 Grating quality parameters of the grating in Figure A.3. 30 Table A.3 Grating quality parameters of the grating in Figure A.4. 32 Table B.1 Bravais lattices volumes . 37 4 TS 62622 IEC:2012(E) INTERNATIONAL ELECTROTECHNICAL COMMISSION _ NANOTECHNOLOGIES DESCRIPTION, MEASUREMENT AND DIME

18、NSIONAL QUALITY PARAMETERS OF ARTIFICIAL GRATINGS FOREWORD 1) The International Electrotechnical Commission (IEC) is a worldwide organization for standardization comprising all national electrotechnical committees (IEC National Committees). The object of IEC is to promote interna- tional co-operatio

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29、rnational Standards. In excep- tional circumstances, a technical committee may propose the publication of a technical speci- fication when the required support cannot be obtained for the publication of an International Standard, despite repeated efforts, or the subject is still under technical devel

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31、ich is a technical specification, has been prepared within the joint working group 2 of IEC technical committee 113 and ISO technical committee 229. TS 62622 IEC:2012(E) 5 The text of this technical specification is based on the following documents: Enquiry draft Report on voting 113/133/DTS 113/143

32、/RVC Full information on the voting for the approval of this technical specification can be found in the report on voting indicated in the above table. In ISO, the standard has been approved by 16 member bodies out of 16 having cast a vote. This publication has been drafted in accordance with the IS

33、O/IEC Directives, Part 2. The committee has decided that the contents of this publication will remain unchanged until the stability date indicated on the IEC web site under “http:/webstore.iec.ch“ in the data re- lated to the specific publication. At this date, the publication will be transformed in

34、to an International Standard, reconfirmed, withdrawn, replaced by a revised edition, or amended. A Bilingual version of this publication may be issued at a later date. IMPORTANT The “colour inside” logo on the cover page of this publication indicates that it contains colours which are considered to

35、be useful for the correct understanding of its contents. Users should therefore print this publication using a colour printer. 6 TS 62622 IEC:2012(E) INTRODUCTION Artificial gratings play an important role in the manufacturing processes of small structures at the nanoscale as well as characterizatio

36、n of nano-objects. For example, in high volume manufacturing of semiconductor integrated circuits by means of lithography techniques, grating patterns on the photomask and the silicon wafer are optically probed and the resulting optical signal is analyzed and used for relative alignment purposes of

37、mask to wafer in the different lithographic production steps in the wafer-scanner production tools. In semiconductor manufacturing as well as in other manufacturing processes requiring high positioning accuracy at the nanoscale, often length or angular encoder systems based on artificial gratings ar

38、e used to provide position feedback of moving axes. Another area of appli- cation for artificial gratings in nanotechnology is their use as calibration standards for high resolution microscopes, like scanning probe microscopes, scanning electron microscopes or transmission electron microscopes which

39、 are necessary tools for the characterization of na- noscale structures. The quality of the artificial gratings used for position feedback generally influences the achievable accuracy of alignment systems or positioning systems in manufacturing tools. This also holds for the application of artificia

40、l gratings as standards for calibration of image magni- fication of high resolution microscopes, where the quality of the grating plays an important role in the achievable calibration uncertainty of the standard and thus for the attainable measurement uncertainty of the microscope. This technical sp

41、ecification concentrates on specifying quality parameters, expressed in terms of deviations from nominal positions of grating features, and provides guidance on the appli- cation of different categories of measurement and evaluation methods to be used for calibra- tion and characterization of artifi

42、cial gratings TS 62622 IEC:2012(E) 7 NANOTECHNOLOGIES DESCRIPTION, MEASUREMENT AND DIMENSIONAL QUALITY PARAMETERS OF ARTIFICIAL GRATINGS 1 Scope This technical specification specifies the generic terminology for the global and local quality parameters of artificial gratings, interpreted in terms of

43、deviations from nominal positions of grating features, and provides guidance on the categorization of measurement and evaluation methods for their determination. This specification is intended to facilitate communication among manufacturers, users and calibration laboratories dealing with the charac

44、terization of the dimensional quality parame- ters of artificial gratings used in nanotechnology. This specification supports quality assurance in the production and use of artificial gratings in different areas of application in nanotechnology. Whilst the definitions and described methods are unive

45、rsal to a large variety of different gratings, the focus is on one-dimensional (1D) and two-dimensional (2D) gratings. 2 Normative references The following documents, in whole or in part, are normatively referenced in this document and are indispensable for its application. For dated references, onl

46、y the edition cited applies. For undated references, the latest edition of the referenced document (including any amend- ments) applies. ISO/IEC 17025, General requirements for the competence of testing and calibration laborato- ries ISO/TS 80004-1:2010, Nanotechnologies Vocabulary Part 1: Core term

47、s 3 Terms and definitions For the purposes of this document, the following terms and definitions apply. 3.1 Basic terms 3.1.1 feature region within a single continuous boundary, and referred to a reference plane, that has a de- fining physical property (parameter) that is distinct from the region ou

48、tside the boundary 8 TS 62622 IEC:2012(E) Side view Top view IEC 1791/12 Figure 1 Example of a trapezoidal line feature on a substrate EXAMPLE In Figure 1 a feature with a trapezoidal cross-section on a substrate is shown. Note 1 to entry: This definition is adapted from 1 1(SEMI P35 (5.1.5 feature

49、(lithographic). Note 2 to entry: In general, a feature is a three-dimensional object. It can also be a nano-object (defined in ISO/TS 80004-1:2010, 2.5). It can have different shape, e.g. it can be a dot, a line, a groove, etc. It might be sym- metric or nonsymmetric. It can have the same material properties as the substrate or different ones. It can be located on the surface of a substrate or within the substrate (sometimes called “buried feature”). Note 3