ISA ADV TEMP MEAS CNTRL-2011 Advanced Temperature Measurement and Control (Second Edition).pdf
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1、Advanced TemperatureMeasurement and ControlSecond EditionAdvanced TemperatureMeasurement and ControlSecond EditionGregory K. McMillanNoticeThe information presented in this publication is for the general education of the reader. Because neither the author(s) nor the publisher has any control over th
2、e use of the information by the reader, both the author(s) and the publisher disclaim any and all liability of any kind arising out of such use. The reader is expected to exercise sound professional judgment in using any of the information presented in a particular application.Additionally, neither
3、the author(s) nor the publisher has investigated or considered the effect of any patents on the ability of the reader to use any of the information in a particular application. The reader is responsible for reviewing any possible patents that may affect any particular use of the information presente
4、d.Any references to commercial products in the work are cited as examples only. Neither the author(s) nor the publisher endorses any referenced commercial product. Any trademarks or tradenames referenced belong to the respective owner of the mark or name. Neither the author(s) nor the publisher make
5、s any representation regarding the availability of any referenced commercial product at any time. The manufacturers instructions on use of any commercial product must be followed at all times, even if in conflict with the information in this publication.Copyright 2011 International Society of Automa
6、tionAll rights reserved. 67 Alexander DriveP.O. Box 12277Research Triangle Park, NC 27709Printed in the United States of America. 10 9 8 7 6 5 4 3 2ISBN 978-1-936007-38-7No part of this work may be reproduced, stored in a retrieval system, or transmitted in any form orby any means, electronic, mecha
7、nical, photocopying, recording or otherwise, without the prior writ-ten permission of the publisher.Library of Congress Cataloging-in-Publication Data in processvContentsPreface ixChapter 1 Temperature Measurement 11-1. Introduction and Overview 11-2. Thermocouples and RTDs 121-3. Selection of a Tem
8、perature Sensor 201-4. Specifications 211-5. Setup and Calibration 231-6. Installation 231-7. Maintenance 33Exercises 35References 35Chapter 2 Measurement Error 372-1. Heat Conduction Error 372-2. Radiation Error 462-3. Dynamic Error 482-4. Velocity Error 512-5. Electronic Error 522-6. Sensor Error
9、562-7. Nonlinearity Error 612-8. Decalibration Error 632-9. Insulation Error 652-10. Leadwire Error 662-11. Error Accumulation 682-12. New Sensors 70Exercises 74References 75Chapter 3 Basic Feedback Control 793-1. Introduction 793-2. PID Modes, Structure, and Form 82vi Advanced Temperature Measureme
10、nt and Control3-3. PID Tuning 943-4. Adaptive Control 1093-5. Set-Point Response Optimization 113Exercises 119References 119Chapter 4 Process Dynamics 1214-1. Introduction 1214-2. Performance Limits 1224-3. Self-Regulating Processes 1324-4. Integrating Processes 137Exercises 141References 141Chapter
11、 5 Exchangers 1435-1. Process and Equipment Design Considerations 1435-2. Disturbances and Difficulties 1475-3. Effect of Loop Performance 1485-4 Controller Tuning 1495-5. Control Errors 1525-6. Control Strategies 156Exercises 157References 158Chapter 6 Reactors 1596-1. Process and Equipment Design
12、Considerations 1596-2. Disturbances and Difficulties 1606-3. Loop Performance 1636-4. Controller Tuning 1646-5. Control Errors 1706-6. Control Strategies 171Exercises 177References 178Chapter 7 Columns 1797-1. Process and Equipment Design Considerations 1797-2. Disturbances and Difficulties 1817-3.
13、Effect of Loop Performance 1837-4. Controller Tuning 183Contents vii7-5. Control Errors 1847-6. Control Strategies 185Exercises 191References 192Chapter 8 Vessels, Desuperheaters, Dryers, Kilns, Calciners, Crystallizers, Extruders, Chambers, and Rooms 1938-1. Process and Equipment Design Considerati
14、ons 1938-2. Disturbances and Difficulties 1958-3. Effect of Loop Performance 1968-4. Controller Tuning 1978-5. Control Strategies 197Exercises 206References 206Chapter 9 Wireless 2079-1. Introduction and Overview 2079-2. Principles 2169-3. Security and Reliability 2209-4. Communication Rules 2249-5.
15、 Process Control 2389-6. Installation of a Wireless Network 251Exercises 253References 254Appendix A Suggested Readings and Study Materials 257Appendix B Solutions to Exercises 259Appendix C Unification of Controller Tuning Relationships 271Appendix D Physical Property Data 281Appendix E Emissivitie
16、s 285Appendix F First Principle Process Gains, Dead Times, and Time Constants 287Appendix G FORTRAN Subroutine for Dynamic Simulation ofExtruders 301viii Advanced Temperature Measurement and ControlAppendix H Convective Heat Transfer Coefficients 307Appendix I Implementation Checklist for Best Perfo
17、rmance 311Index 315ixPrefaceTemperature is one of the four most common types of loops. While the other com-mon loops (flow, level, pressure) occur more often, temperature loops are gener-ally more difficult and important. It is the single most frequently stated type of loop of interest to users, and
18、 the concern for better control extends to the widest variety of industries.Temperature is a critical condition for reaction, fermentation, combustion, drying, calcination, crystallization, extrusion, or degradation rate and is an inference of a column tray concentration in the process industries. T
19、ight temperature control translates to lower defects and greater yields during seeding, crystal pulling, and rapid thermal processing of silicon wafers for the semiconductor industry.For boilers, temperature is important for water and air preheat, fuel oil viscosity, and steam superheat control. For
20、 incinerators, an optimum temperature often exists in terms of ensured destruction of hazardous compounds and minimum energy cost. For heat transfer fluids such as cooling tower, chilled water, brine, or Therminol, good temperature control minimizes upsets to the users.Temperature control in cold ro
21、oms is used to reduce the contamination and deg-radation rate in pharmaceutical, biochemical, beverage, and food research and production.Temperature control in plant growth chambers is important for studying the effects of hybridization, genetic engineering, and plant growth regulators.The great imp
22、act of temperature control on conductivity and pH loops was not widely realized until recently. For aqueous solutions of acids, bases, and salts, the inferred concentration from conductivity and the pH of the solution often changes at the rate of about twenty percent and four tenths of a pH unit, re
23、spec-tively, per ten degrees centigrade. These changes, which reflect a fundamental alteration in the solution due to different ion dissociation and mobility, should not be confused with temperature effects on the signal developed by the elec-trode, which are corrected for by conventional temperatur
24、e compensators. Thus, x Advanced Temperature Measurement and Controltemperature control can be important for raw, cooling tower, deaerator, boiler, and wastewater treatment.Good temperature control is important during the research, reaction, separation, processing, and storage of products and feeds
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