DLA SMD-5962-96612 REV B-1997 MICROCIRCUIT DIGITAL RADIATION HARDENED CMOS BINARY RATE MULTIPLIER MONOLITHIC SILICON《抗辐射互补金属氧化物半导体二元比率乘数硅单片电路数字微电路》.pdf
《DLA SMD-5962-96612 REV B-1997 MICROCIRCUIT DIGITAL RADIATION HARDENED CMOS BINARY RATE MULTIPLIER MONOLITHIC SILICON《抗辐射互补金属氧化物半导体二元比率乘数硅单片电路数字微电路》.pdf》由会员分享,可在线阅读,更多相关《DLA SMD-5962-96612 REV B-1997 MICROCIRCUIT DIGITAL RADIATION HARDENED CMOS BINARY RATE MULTIPLIER MONOLITHIC SILICON《抗辐射互补金属氧化物半导体二元比率乘数硅单片电路数字微电路》.pdf(27页珍藏版)》请在麦多课文档分享上搜索。
1、SMD-59b2-9bbL2 REV B 99999b 0117290 8T7 (xonel (YYMMDD) 97-07-25 NOTICE OF REVISION (NOR) THIS REVISION DESCRIBED BELOW HAS BEEN AUTHORIZED FOR THE DCUMENT USTED. X (1) Wng document supplemented by the NOR may be used in manufadure. (2) Revised document must be mcdved before manufacturer may incorpo
2、rale this change. (3) Custodian of master doaiment shall make above revision and furnish revised document. ubk reporting burden for this cdlection is estimated lo average 2 hours per response, indud the Ume for reviewing add B. Revisions descripiion column; add Changes in accordance with NOR 5962-i3
3、88-97. Revieions dab cdumn; add 97-07-25. Revision level bled 5 x 10 Rads(Si)/s 5/ Dose rate latch-up 2 x lo8 Rads(Si)/s 5/ Dose rate survivability 5 x lo1 Rads(Si)/s 2 linear energy threshold, no upsets or latchup (see 4.4.4.4) . i5 MEV/p2/mg) 5/ 2. APPLICABLE DOCUMENTS 2.1 Eovermnt swcificat ion.
4、standards. bullet in. and handboo k. Unless otheruise specified, the following specification, standards, bulletin, and handbook of the issue listed in that issue of the Department of Defense Index of Specifications and Standards specified in the solicitation, form a part of this drawing to the exten
5、t specified herein. SPECiFICATION Mi LITARY MIL-1-38535 - integrated Circuits, Manufacturing, General Specification for. STANDARDS MILITARY MIL-STD-883 - Test Methods and Procedures for Microelectronics. MiL-STD-93 - Configuration Management. MIL-STD-1835 - Microcircuit Case Outlines. 1/ a u Stresse
6、s above the absolute maxim rating may cause permanent damage to the device. maxim levels may degrade performance and affect reliability. Unless otherwise specified, all voltages are referenced to Vss. The limits for the parameters specified herein shall apply over the full specified Vcc range and ca
7、se temperature range of -55C to +125“C unless otheruise noted. If device power exceeds package dissipation capabiiity, provide heat sinking or derate linearly (the derating is based on JA) at the following rate: Extended operation at the Case E . 13.7 N/“C CaseX . 8.8nM/“C Guaranteed by design or pr
8、ocess but not tested. 5962-9661 2 REVISION LEVEL SHEET STAN DARD MICROCIRCUIT DRAWING DEFENSEELECTRONICSSUPPLYCENTER DAYTON, OHIO 45444 DESC FORM 193A JUL 94 Provided by IHSNot for ResaleNo reproduction or networking permitted without license from IHS-,-,-BULLETIN SIZE A STANDARD MICROCIRCUIT DRAWIN
9、G DEFENSEELECTRONICSSUPPLYCENTER DAYTON, OHIO 45444 5962-9661 2 REVISION LEVEL SHEET 4 DESC FORM 193A JUL 94 Provided by IHSNot for ResaleNo reproduction or networking permitted without license from IHS-,-,-SMD-59b2-9bb32 m 9999976 0083553 b77 m 3.9 yerification and review for device clu . For devic
10、e class M, DESC, DESCls agent, and the acquiring activity Offshore docunentation retain the option to review the manufacturers facility and applicable required docunentation. shall be made available onshore at the option of the reviewer. M. 3.10 Microcircuit srow asSigmient for de vice class Device
11、class M devices covered by this drawing shall be in microcircuit group nunber 40 (see MIL-1-38535, appendix A)- 4. PUALITY ASSURANCE PROVISIONS 4.1 Saml ins and inswct ion. For device class M, sampling and inspection procedures shall be in accordance with MIL-STD-883 (see 3.1 herein). For device cla
12、sses P and V, sampling and inspection procedures shall be in accordance uith MIL-1-38535 or as modified in the device manufacturers quality management (PM) plan. plan shall not affect form, fit, or function as described herein. The modification in the PM 4.2 Screenins . For device class M, screening
13、 shall be in accordance with method 5004 of MIL-STD-883, and shall be conducted on all devices prior to quality conformance inspection. For device classes and V, screening shall be in accordance with MIL-1-38535, and shall be conducted on all devices prior to qualification and technology conformance
14、 inspection. iteria for de vice class M. 4.2.1 &tional cr a. Burn-in test, method 1015 of MIL-STD-883. (1) Test condition A, 6, C, or D. The test circuit shall be maintained by the manufacturer under docunent revision level control and shall be made available to the preparing or acquiring activity u
15、pon request. The test circuit shall specify the inputs, outputs, biases, and power dissipation, as applicable, in accordance uith the intent specified in test method 1015. (2) TA +125“C, minim. b. Interim and final electrical test parameters shall be as specified in table IIA herein. 4.2.2 mitional
16、cr iteria fo r device classes P and v. a. lhe burn-in test duration, test condition and test temperature, or approved alternatives shall be as specified in the device manufacturers PM plan in accordance with MIL-1-38535. lhe burn-in test circuit shali be maintained under docunent revision level cont
17、rol of the device manufacturers Technology Review Board (TRB) in accordance with MIL-1-38535 and shall be made available to the acquiring or preparing activity upon request. The test circuit shall specify the inputs, outputs, biases, and power dissipation, as applicable, in accordance with the inten
18、t specified in test method 1015. b. Interim and final electrical test parameters shall be as specified in table IIA herein. c. Additional screening for device class V beyond the requirements of device class P shall be as specified in appendix 6 of MIL-1-38535 or as modified in the device manufacture
19、rs quality management (PM) plan. 4.3 ualification mwct ion for device classes Q and v. Pualification inspection for device classes P and V shall Inspections to be performed shall be those specified in MIL-1-38535 and herein for be in accordance uith MIL-1-38535. groups A, 6, C, D, ad E inspections (
20、see 4.4.1 through 4.4.4). 4.3.1 Electrostatic discha rse sensitivity (ESDS) au alification insoect ion. ESDS testing shall be performed in accordance with MIL-CTD-883, method 3015. process or design changes which may affect ESDS classification. ESDS testing shall be measured onLy for initial qualifi
21、cation and after 4.4 unformance inswction . Quality conformance inspection for device class M shall be in accordance uith MIL-STD-883 (see 3.1 herein) and as specified herein. Inspections to be performed for device class M shall be those specified in method 5005 of MIL-STD-883 and herein for groups
22、A, 6, C, D, and E inspections (see 4.4.1 through 4.4.4). Technology conformance inspection for classes P and V shall be in accordance with MIL-1-38535 or as specified in the OM plan including groups A, 8, C, D, and E inspections and as specified herein except where option 2 of MIL-1-38535 permits al
23、ternate in-line control testing. I SIZE I I 5962-9661 2 REVISION LEVEL SHEET STAN DARD MICROCIRCUIT DRAWING DEFENSE ELECTRONICS SUPPLY CENTER DAYTON, OHIO 45444 DESC FORM 193A JUL 94 Provided by IHSNot for ResaleNo reproduction or networking permitted without license from IHS-,-,-SMD-5962-96612 m 99
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